• Journal of Digital Convergence
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• v.11 no.4
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• pp.259-266
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• 2013

Binary connected-components labeling, which is widely used in the field of the pattern recognition, has been researched for a long time as one of the basic image processing techniques. Two-scan algorithm has been mainly used in the researches of the connected-components labeling. Recently, for the first scan in the two-scan algorithm, block-based labeling approaches have been used and reported as the fastest methods. In this paper, a new efficient scan mask for connected-components labeling with a block-based labeling approach is proposed. Labeling with the new pixel-based scan mask is more efficient than any other existing method. The results of the experiments show that the proposed method is faster than the existing fastest method.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.44 no.2
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• pp.127-138
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• 2007

In this paper, we propose a new X-masking scheme for utilizing logic built-in self-test The new scheme exploits the phase-shifting network which is based on the shift-and-add property of maximum length pseudorandom binary sequences(m-sequences). The phase-shifting network generates mask-patterns to multiple scan chains by appropriately shifting the m-sequence of an LFSR. The number of shifts required to generate each scan chain mask pattern can be dynamically reconfigured during a test session. An iterative simulation procedure to synthesize the phase-shifting network is proposed. Because the number of candidates for phase-shifting that can generate a scan chain mask pattern are very large, the proposed X-masking scheme reduce the hardware overhead efficiently. Experimental results demonstrate that the proposed X-masking technique requires less storage and hardware overhead with the conventional methods.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.05a
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• pp.206-206
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• 2004

평판디스플레이의 사이즈 및 그 응용범위가 확대되어 감에 따라, 기존의 근접식 노광장비로는 원하는 성능의 디스플레이소자를 생산하는데 한계에 도달하게 되었다. 최근에는 반도체웨이퍼 생산에 적용되는 투영식분할노광방식 또는 스캔방식의 노광장비가 평판디스플레이소자의 생산에 적용되는 추새인데, 이러한 방식의 노광장비의 핵심기능을 수행하는 모듈 증 마스크스테이지가 있다. 투영식노광 장비의 노광광원(조명광학계)에서 발생된 노광광은 마스크를 통과함으로써 특정패턴을 형성할 수 있는 형태로 변화되고, 투영광학계를 거쳐 피노광재에 조사 된다.(중략)

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2005.05a
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• pp.84-88
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• 2005

본 연구에서는 백색광원용 조명램프에 필요한 고밀도로 집적된 LED 어레이를 제작하기 위하여 반도체제조 공정에 필요한 포토마스크를 AutoCAD 상에서 설계하였으며 레이저 리소그래피 장비를 이용하여 포토마스크를 제작하였다. 웨이퍼상에 LED칩을 개별적으로 제작한 후 이들을 직렬 및 병렬로 금속배선하여 연결하였다. 특히 AutoCAD로 각 공정의 포토마스크 패턴을 설계 작업한 후 DWG 파일을 DXF 파일로 변환하여 레이저빔으로 스캔닝하였다. 이를 소다라임 유리판 위에 크롬을 증착한 후 각 패턴에 맞추어 식각 함으로써 포토마스크를 제작하였다. 또한 2인치 InGaN/GaN 다중 양자우물구조의 광소자용 에피박막이 증착된 사파이어 웨이퍼에 포토마스크를 활용하여 반도체 제조공정을 수행하였으며, 금속배선된 백색LED램프를 제작하였다.

• Journal of the Institute of Electronics and Information Engineers
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• v.50 no.5
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• pp.287-294
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• 2013

Binary connected-component labeling is widely used in the fields of the image processing and the computer vision. Many kinds of labeling techniques have been developed, and two-scan is known as the fastest method among them. Traditionally pixel-based scan masks have been used for the first stage of the two-scan. Recently, block-based labeling techniques were introduced by C. Grana et. al. and L. He et. al. They are faster than pixel-based labeling methods. In this paper, we propose a new binary connected-component labeling technique with block-based labels and a pixel-based scan mask. The experimental results with various images show that the proposed method is faster than the He's which is known as the fastest method currently. The amount of performance enhancement is averagely from 3.9% to 22.4% according to the sort of the images.

• Journal of the Korea Society of Computer and Information
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• v.12 no.5
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• pp.39-47
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• 2007

In this thesis, a method of generating an adaptable Region-Of-Interest(ROI) Mask for the Region-Of-Interest coding is suggested. In the method, an ROI Mask is generated using the information of the ROI designated by a user. In the existed method of ROI coding, after scanning all the pixels in order and discriminating an ROI, an ROI Mask is generated. But, in our method, after scanning a part of pixels based on the shape pattern of an ROI and discriminating a ROI by one code block unit, an ROI Mask is generated. Moreover, from the method, a pattern number, threshold of a ROI and background threshold parameter are provided. According to the result of its comparing test with the existed methods to show the usability, it is proved that our method is superior in speed to the existed ones.

• Proceedings of KOSOMES biannual meeting
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• 2005.11a
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• pp.203-208
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• 2005

The CGO (Chip on Glass) to be measured a few micro unit is captured by line scan camera for the accuracy of chip inspection. But it is very sensitive to scan speed and lighting conditions. In this paper, we propose the methods to increase the accuracy of faulty detection by image subtraction. Image subtraction is detected faultiness by subtracting the image of a ' perfect ' COG from trot of the sample under tests. For image subtraction to be successful, the two images must be pre챠sely registered The two images is registered by the area segmentation pattern matching, and the result image get by operating the gradient mask image and the image to practice subtraction. A series of experimentation showed that the proposed algorithm shows substantial improvement over the other image subtraction methods.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.43 no.8 s.350
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• pp.1-5
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• 2006

At-wavelength inspection system of extreme Ultra-violet lithography was developed and the inspection results were compared with the optical mask inspection system by cross correlation experiments. In at-wavelength EUV mask inspection system, a raster scan of focused euv light is used to illuminate euv light to mask blank and specularly and non-specularly reflected euv light are detected by photo diode and microchannel plate. The cross correlation results between at-wavelength inspection tool and optical inspection tool shows strong correlation. Far-field scattering fringe pattern from programmed phase and opqque defect, which were detected by phosphor plate and CCD camera shows that distinct diffraction fringes were observed with fringe spacing dependent on the defect size.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.10 no.2
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• pp.308-314
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• 2006

A line scan camera is applied to enhance COG(Chip On Glass) inspection accuracy to be measured a few micro unit. The foreign substance detection among various faulty factors has been the most difficult technology in the faulty automatic inspection step since COG pattern is very miniature and complexity. In this paper, we proposed two step area segmentation template matching method to increase matching speed. Futhermore to detect foreign substance(such as dust, scratch) with a few micro unit, the new method using gradient mask and AND operation was proposed. The proposed 2 step template matching method increased 0.3 - 0.4 second matching speed compared with conventional correlation coefficient. Also, the proposed foreign substance applied masks enhanced $5-8\%$ faulty detection rate compared with conventional no mask application method.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.12 no.2
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• pp.829-834
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• 2011

Exposure process is the most important technology to fabricate highly integrated circuit. Up to now, mask type lithography process has been generally used. However, it is not efficient for small quantity and/or frequently changing products. Therefore, maskless lithography technology is raised in exposure process. In this study, relations between multi-beam energy and overlay were analyzed. Exposure experiment of generating pattern was performed. It was from presented scan line by multi- beam simulation. As a result, optimal scan line distance was proposed by simulation, and micro pattern accuracy could be improved by exposure experiment using laser direct imaging system.