• Title/Summary/Keyword: $V_2O_5/TiO_2$

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Surface Characteristics and Photocatalytic Propertiy of B Doped TiO2 Layer Synthesized by Plasma Electrolytic Oxidation Process (Plasma Electrolytic Oxidation 방식으로 제조된 B Doped TiO2의 표면특성과 광촉매 특성)

  • Lee, Jong-Ho;Lee, Young-Ki;Kim, Young-Jig;Oh, Han-Jun
    • Korean Journal of Materials Research
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    • v.31 no.10
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    • pp.552-561
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    • 2021
  • For the purpose of manufacturing a high efficiency TiO2 photocatalyst, B-doped TiO2 photocatalysts are synthesized using a plasma electrolytic oxidation method in 0.5 M H2SO4 electrolyte with different concentrations of H3BO3 as additive. For the B doped TiO2 layer fabricated from sulfuric electrolyte having a higher concentration of H3BO3 additive, the main XRD peaks of (101) and (200) anatase phase shift gradually toward the lower angle direction, indicating volume expansion of the TiO2 anatase lattice by incorporation of boron, when compared with TiO2 layers formed in sulfuric acid with lower concentration of additive. Moreover, XPS results indicate that the center of the binding energy peak of B1s increases from 191.45 eV to 191.98 eV, which suggests that most of boron atoms are doped interstitially in the TiO2 layer rather than substitutionally. The B doped TiO2 catalyst fabricated in sulfuric electrolyte with 1.0 M H3BO3 exhibits enhanced photocurrent response, and high efficiency and rate constant for dye degradation, which is ascribed to the synergistic effect of the new impurity energy band induced by introducing boron to the interstitial site and the improvement of charge transfer reaction.

Evaluation of Bioactivity of Titanium Implant Treated with H2O2/HCl Solution (H2O2/HCl 처리한 Ti 임플란트의 생체활성 평가)

  • Yue J. S.;Kwon O. S.;Lee O. Y.;Lee M. H.;Song K. H.
    • Korean Journal of Materials Research
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    • v.15 no.5
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    • pp.353-360
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    • 2005
  • Surface treatment play an important role in nucleating calcium phosphate deposition on surgical Ti implant. Therefore, the purpose of this study is to examine whether the precipitation of apatite on cp-Ti and Ti alloys are affected by surface modification in HCl and $H_2O_2$ solution. Specimens were then chemically treated with a solution containing 0.1 M HCl and 8.8M $H_2O_2$ at $80^{\circ}C$ for 30 mins, and subsequently heat-treated at $400^{\circ}C$ for 1 hour. All specimens were immersed in the HBSS with pH 7.4 at $36.5^{\circ}C$ for 15 days, and the surface was examined with XRD, SEM, EDX ana XPS. Also, pure Ti, Ti-6Al-4V and Ti-6Al-7Nb alloy specimens with and without surface treatment were implanted in the abdominal connective tissue of mice for 4 weeks. All specimens chemically treated with HCl and $H_2O_2$ solution have the ability to form a apatite layer in the HBSS which has inorganic ion composition similar to human blood plasma. The average thickness of the fibrous capsule surrounding the specimens implanted in the connective tissue was $38.57\;{\mu}m,\;62.27\;{\mu}m\;and\;45.64\;{\mu}m$ in the cp-Ti, Ti-6Al-4V ana Ti-6Al-7Nb alloy specimens with the chemical treatment respectively, and $52.20\;{\mu}m,\;75.62\;{\mu}m\;and\;66.56\;{\mu}m$ in the commercial specimens of cp-Ti, Ti-6Al-4V and Ti-6Al-7Nb without any treatment respectively. The results of this evaluation indicate that the chemically treated cp-Ti, Ti-6Al-4V ana Ti-6Al-7Nb alloys have better bioactivity and biocompatibility compared to the other metals tested.

The Electrochemical Properties of Li4/3Ti5/3O4 Synthesized by Sol-Gel Process (졸-겔법에 의해 합성된 Li4/3Ti5/3O4의 전기화학적 특성)

  • Lee, Jin-Sik;Lee, Chul-Tae
    • Applied Chemistry for Engineering
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    • v.10 no.1
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    • pp.73-79
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    • 1999
  • The superstructured $Li_{4/3}Ti_{5/3}O_4$ was prepared by sol-gel process using a mixed solution of lithium acetate (LA) and titanium n-butoxide (TNB). The gel phase was obtained by adding ammonia water ($NH_4OH/TNB$ mole ratio of 0.35) and water ($H_2O/TNH$ mole ratio of 3.5) into the clear sol that was prepared after mixing TNB/LA mole ratio of 5/4 with AA/TNB mole raio of 0.125. It was found that the most suitable $Li_{4/3}Ti_{5/3}O_4$ was obtained by heat treatment of xerogel at $600^{\circ}C$ for 30 hrs. The synthesized $Li_{4/3}Ti_{5/3}O_4$ showed an initial discharge capacity of 174 mAh/g and the capacity loss of about 27.3% during 25 cycles in Li/1M $LiClO_4(in\;PC)/Li_{4/3}Ti_{5/3}O_4$ at current density of $0.15mA/cm^2$ and the voltage range of 0.5~3.0 V.

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Preparation and characterization of rutile phase TiO2 nanoparticles and their cytocompatibility with oral cancer cells

  • Vu, Phuong Dong;Nguyen, Thi Kieu Trang;Yoo, Hoon
    • International Journal of Oral Biology
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    • v.44 no.3
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    • pp.108-114
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    • 2019
  • In the present study, rutile phase titanium dioxide nanoparticles ($R-TiO_2$ NPs) were prepared by hydrolysis of titanium tetrachloride in an aqueous solution followed by calcination at $900^{\circ}C$. The composition of $R-TiO_2$ NPs was determined by the analysis of X-ray diffraction data, and the characteristic features of $R-TiO_2$ NPs such as the surface functional group, particle size, shape, surface topography, and morphological behavior were analyzed by Fourier-transform infrared spectroscopy, scanning electron microscopy and energy dispersive X-ray spectroscopy, transmission electron microscopy, dynamic light scattering, and zeta potential measurements. The average size of the prepared $R-TiO_2$ NPs was 76 nm, the surface area was $19m^2/g$, zeta potential was -20.8 mV, and average hydrodynamic diameter in dimethyl sulfoxide (DMSO)-$H_2O$ solution was 550 nm. The 3-(4,5-dimethylthiazol-2-yl)-2,5-diphenyltetrazolium bromide (MTT) assay and morphological observations revealed that $R-TiO_2$ NPs were cytocompatible with oral cancer cells, with no inhibition of cell growth and proliferation. This suggests the efficacy of $R-TiO_2$ NPs for the aesthetic white pigmentation of teeth.

Structural and electrical properties of $V_{1.8}W_{0.2}O_5$ thin films with $Ar/O_2$ Ratio ($Ar/O_2$ 비에 따른 $V_{1.8}W_{0.2}O_5$ thin film 의 구조적, 유전적 특성)

  • Lee, Seung-Hwan;Park, In-Gil;Bae, Seon-Gi;Lee, Young-Hie
    • Proceedings of the KIEE Conference
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    • 2008.07a
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    • pp.1252-1253
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    • 2008
  • The $V_{1.8}W_{0.2}O_5$ thin films deposited on $Pt/Ti/SiO_2/Si$ substrates by RF sputtering method with different $Ar/O_2$ ratio. The $V_{1.8}W_{0.2}O_5$ thin films were measured electrical and structural properties, fairly good Temperature coefficient of resistance(TCR). It was found that electrical and structural properties, TCR properties of thin films were strongly dependent upon the $Ar/O_2$ ratio. The dielectric constant of the $V_{1.8}W_{0.2}O_5$ thin films with 50/20 ratio were 93 with a dielectric loss of 0.535, respectively. Also, the TCR values of the $V_{1.8}W_{0.2}O_5$ thin films with 50/20 ratio were -3.15%/$^{\circ}C$.

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A Study on Electrical Properties of Sol-gel Derived Bi3.25La0.75Ti3O12 Thin Films by Rapid Thermal Annealing (Sol-gel법으로 제조한 강유전성 Bi3.25La0.75Ti3O12박막의 급속열처리에 따른 전기적 특성에 관한 연구)

  • 이인재;김병호
    • Journal of the Korean Ceramic Society
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    • v.40 no.12
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    • pp.1189-1196
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    • 2003
  • Ferroelectric B $i_{3.25}$L $a_{0.75}$ $Ti_3$ $O_{12}$ (BLT) solution was synthesized by sol-gel process. BLT thin films were deposited on Pt/Ti $O_2$/ $SiO_2$/Si substrates by spin-coating. In this experiments, Bi(TMHD)$_3$, La(III)2-Methoxyethoxide, and Ti(IV) i-propoxide were used as starting materials, which were dissolved in 2-Methoxyethanol. Rapid Thermal Annealing (RTA) was used to promote crystallization of BLT thin films. The thin films with RTA process were compared with those with non-RTA process on electrical properties. After RTA process, the remanent polarization value (2Pr) of BLT thin films annealed at 72$0^{\circ}C$ was 20.46 $\mu$C/$\textrm{cm}^2$ which was approximately 27% higher than that of non-RTA process at 5 V.

Preparation of Field Effect Transistor with $(Bi,La)Ti_3O_{12}$ Gate Film on $Y_2O_3/Si$ Substrate

  • Chang Ho Jung;Suh Kwang Jong;Suh Kang Mo;Park Ji Ho;Kim Yong Tae;Chang Young Chul
    • Journal of the Microelectronics and Packaging Society
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    • v.12 no.1 s.34
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    • pp.21-26
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    • 2005
  • The field effect transistors (FETs) were fabricated ell $Y_2O_3/Si(100)$ substrates by the conventional memory processes and sol-gel process using $(Bi,La)Ti_3O_{12}(BLT)$ ferroelectric gate materials. The remnant polarization ($2Pr = Pr^+-Pr^-$) int Pt/BLT/Pt/Si capacitors increased from $22 {\mu}C/cm^2$ to $30{\mu}C/ cm^2$ at 5V as the annealing temperature increased from $700^{\circ}C$ to $750^{\circ}C$. There was no drastic degradation in the polarization values after applying the retention read pulse for $10^{5.5}$ seconds. The capacitance-voltage data of $Pt/BLT/Y_2O_3/Si$ capacitors at 5V input voltage showed that the memory window voltage decreased from 1.4V to 0.6V as the annealing temperature increased from $700^{\circ}C$ to $750^{\circ}C$. The leakage current of the $Pt/BLT/Y_2O_3/Si$ capacitors annealed at $750^{\circ}C$ was about $510^{-8}A/cm^2$ at 5V. From the drain currents versus gate voltages ($V_G$) for $Pt/BLT/Y_2O_3/Si(100)$ FET devices, the memory window voltages increased from 0.3V to 0.8V with increasing tile $V_G$ from 3V to 5V.

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Preparation of Nano Titania Sols and Thin Films added with Transition Metal Elements (전이금속원소들이 첨가된 나노 티타니아 졸 및 코팅막 제조)

  • Lee K.;Lee N. H.;Shin S. H.;Lee H. G.;Kim S. J.
    • Korean Journal of Materials Research
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    • v.14 no.9
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    • pp.634-641
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    • 2004
  • The photocatalytic performance of $TiO_2$ thin films coated on porous alumina balls using various aqueous $TiOCl_2$ solutions as starting precursors, to which 1.0 $mol\%$ transition metal ($Ni^{2+},\;Cr^{3+},\;Fe^{3+},\;Nb^{3+},\;and\;V^{5+}$) chlorides had been already added, has been investigated, together with characterizations for $TiO_2$ sols synthesized simultaneously in the same autoclave through hydrothermal method. The synthesized $TiO_2$ sols were all formed with an anatase phase, and their particle size was between several nm and 30 nm showing ${\zeta}-potential$ of $-25{\sim}-35$ mV, being maintained stable for over 6 months. However, the $TiO_2$ sol added with Cr had a much lower value of -potential and larger particle sizes. The coated $TiO_2$ thin films had almost the same shape and size as those of the sol. The pure $TiO_2$ sol showed the highest optical absorption in the ultraviolet light region, and other $TiO_2$ sols containing $Cr^{3+},\;Fe^{3+}\;and\;Ni^{2+}$ showed higher optical absorption than pure sol in the visible light region. According to the experiments for removal of a gas-phase benzene, the pure $TiO_2$ film showed the highest photo dissociation rate in the ultraviolet light region, but in artificial sunlight the photo dissociation rate of $TiO_2$ coated films containing $Cr^{3+},\;Fe^{3+}\;and\;Ni^{2+}$ was measured higher together with the increase of optical absorption by doping.

Low-Temperature Chemical Sintered TiO2 Photoanodes Based on a Binary Liquid Mixture for Flexible Dye-Sensitized Solar Cells

  • Md. Mahbubur, Rahman;Hyeong Cheol, Kang;Kicheon, Yoo;Jae-Joon, Lee
    • Journal of Electrochemical Science and Technology
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    • v.13 no.4
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    • pp.453-461
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    • 2022
  • A chemically sintered and binder-free paste of TiO2 nanoparticles (NPs) was prepared using a binary-liquid mixture of 1-octanol and CCl4. The 1:1 (v/v) complex of CCl4 and 1-octanol easily interacted chemically with the TiO2 NPs and induced the formation of a highly viscous paste. The as-prepared binary-liquid paste (PBL)-based TiO2 film exhibited the complete removal of the binary-liquid and residuals with the subsequent low-temperature sintering (~150℃) and UV-O3 treatment. This facilitated the fabrication of TiO2 photoanodes for flexible dye-sensitized solar cells (f-DSSCs). For comparison purposes, pure 1-octanol-based TiO2 paste (PO) with moderate viscosity was prepared. The PBL-based TiO2 film exhibited strong adhesion and high mechanical stability with the conducting oxide coated glass and plastic substrates compared to the PO-based film. The corresponding low-temperature sintered PBL-based f-DSSC showed a power conversion efficiency (PCE) of 3.5%, while it was 2.0% for PO-based f-DSSC. The PBL-based low- and high-temperature (500℃) sintered glass-based rigid DSSCs exhibited the PCE of 6.0 and 6.3%, respectively, while this value was 7.1% for a 500℃ sintered rigid DSSC based on a commercial (or conventional) paste.

Occurrence and Chemical Composition of Ti-bearing Minerals from Drilling Core (No.04-1) at Gubong Au-Ag Deposit Area, Republic of Korea (구봉 금-은 광상일대 시추코아(04-1)에서 산출되는 함 티타늄 광물들의 산상과 화학조성)

  • Bong Chul Yoo
    • Korean Journal of Mineralogy and Petrology
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    • v.36 no.3
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    • pp.185-197
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    • 2023
  • The Gubong Au-Ag deposit consists of eight lens-shaped quartz veins. These veins have filled fractures along fault zones within Precambrian metasedimentary rock. This has been one of the largest deposits in Korea, and is geologically a mix of orogenic-type and intrusion-related types. Korea Mining Promotion Corporation drilled into a quartz vein (referred to as the No. 6 vein) with a width of 0.9 m and a grade of 27.9 g/t Au at a depth of -728 ML by drilling (No. 90-12) in the southern site of the deposit, To further investigate the potential redevelopment of the No. 6 vein, another drilling (No. 04-1) was carried out in 2004. In 2004, samples (wallrock, wallrock alteration and quartz vein) were collected from the No. 04-1 drilling core site to study the occurrence and chemical composition of Ti-bearing minerals (ilmenite, rutile). Rutile from mineralized zone at a depth of -275 ML occur minerals including K-feldspar, biotite, quartz, calcite, chlorite, pyrite in wallrock alteration zone. Ilmenite and rutile from ore vein (No. 6 vein) at a depth of -779 ML occur minerals including white mica, chlorite, apatite, zircon, quartz, calcite, pyrrhotite, pyrite in wallrock alteration zone and quartz vein. Based on mineral assemblage, rutile was formed by hydrothermal alteration (chloritization) of Ti-rich biotite in the wallrock. Chemical composition of ilmenite has maximum values of 0.09 wt.% (HfO2), 0.39 wt.% (V2O3) and 0.54 wt.% (BaO). Comparing the chemical composition of rutile at a depth -275 ML and -779 ML, Rutile at a depth of -779 ML is higher contents (WO3, FeO and BaO) than rutile at a depth of -275 ML. The substitutions of rutile at a depth of -275 ML and -779 ML are as followed : rutile at a depth of -275 ML Ba2+ + Al3+ + Hf4+ + (Nb5+, Ta5+) ↔ 3Ti4+ + Fe2+, 2V4+ + (W5+, Ta5+, Nb5+) ↔ 2Ti4+ + Al3+ + (Fe2+, Ba2+), Al3+ + V4++ (Nb5+, Ta5+) ↔ 2Ti4+ + 2Fe2+, rutile at a depth of -779 ML 2 (Fe2+, Ba2+) + Al3+ + (W5+, Nb5+, Ta5+) ↔ 2Ti4+ + (V4+, Hf4+), Fe2+ + Al3+ + Hf 4+ + (W5+, Nb5+, Ta5+) ↔ 2Ti4+ + V4+ + Ba2+, respectively. Based on these data and chemical composition of rutiles from orogenic-type deposits, rutiles from Gubong deposit was formed in a relatively oxidizing environment than the rutile from orogenictype deposits (Unsan deposit, Kori Kollo deposit, Big Bell deposit, Meguma gold-bearing quartz vein).