• 전력전자학회:학술대회논문집
• /
• 전력전자학회 2017년도 전력전자학술대회
• /
• pp.577-595
• /
• 2017

${\bullet}$ Silicon Carbide (SiC) had excellent material properties as the base material for next generation of power semiconductor. In developing SiC MOSFET, gate oxide reliability issues had to be first overcome before commercial application. Besides, a high and stable gate-source voltage threshold $V_{GS(th)}$ is also an important parameter for operation robustness. SiC MOSFET with such characteristics can directly use existing high-speed IGBT gate driver IC's. ${\bullet}$ The linear voltage drop characteristics of SiC MOSFET will bring lower conduction loss averaged over full AC cycle compared to similarly rate IGBT. Lower switching loss enable higher switching frequency. Using package with auxiliary source terminal for gate driving will further reduce switching losses. Dynamic characteristics can fully controlled by simple gate resistors. ${\bullet}$ The low switching losses characteristics of SiC MOSFET can substantially reduce power losses in high switching frequency operation. Significant power loss reduction is also possible even at low switching frequency and low switching speed. in T-type 3-level topology, SiC MOSFET solution enable three times higher switching freqeuncy at same efficiency.

• Journal of Advanced Marine Engineering and Technology
• /
• 제32권8호
• /
• pp.1263-1268
• /
• 2008

In this paper, the low noise power amplifier for GaAs FET ATF-10136 is designed and fabricated with active bias circuit and self bias circuit. To supply most suitable voltage and current, active bias circuit is designed. Active biasing offers the advantage that variations in the pinch-off voltage($V_p$) and saturated drain current($I_{DSS}$) will not necessitate a change in either the source or drain resistor value for a given bias condition. The active bias network automatically sets a gate-source voltage($V_{gs}$) for the desired drain voltage and drain current. Using resistive decoupling circuits, a signal at low frequency is dissipated by a resistor. This design method increases the stability of the LNA, suitable for input stage matching and gate source bias. The LNA is fabricated on FR-4 substrate with active and self bias circuit, and integrated in aluminum housing. As a results, the characteristics of the active and self bias circuit LNA implemented more than 13 dB and 14 dB in gain, lower than 1 dB and 1.1 dB in noise figure, 1.7 and 1.8 input VSWR at normalized frequency $1.4{\sim}1.6$, respectively.

• 전자공학회논문지
• /
• 제53권2호
• /
• pp.117-122
• /
• 2016

최근 환경, 의료분야에서 실시가 검출 및 인체 삽입형 pH 센서에 대한 요구가 증가하고 있다. 이에 본 연구에서는 생체적 합성이 우수한 그래핀을 이용하여 실시간 pH 검출이 가능한 센서를 개발하였다. Polyethylene terephthalate(PET) 기판에 전사된 그래핀 표면에 이온 용액속에서 동작하는 전계효과 트랜지스터(solution-gated field-effect transistors; SGFETs)를 제작하였으며 이를 이용하여 이온 용액의 pH를 검출하였다. 제작한 트랜지스터의 게이트 채널 길이는 $500{\mu}m$, 게이트 채널 폭은 8mm이다. 이온 용액속에서 트랜지스터 동작특성 및 pH 감도를 평가하기 위하여 드레인-소스 전압($V_{DS}$)에 따른 드레인-소스 전류($I_{DS}$) 및 게이트-소스 전압($V_{GS}$)에 따른 드레인-소스 전류($I_{DS}$)를 측정하였다. PET기판에 전사된 그래핀 위에 제작한 그래핀 SGFETs의 전류-전압 특성은 이온 용액내에서 매우 안정적으로 동작하였으며 그래핀 SGFETs의 Dirac point는 이온 용액의 pH값이 증가함에 따라 양의 방향으로 19.32 mV/pH씩 증가하였다.

• 한국정보통신학회논문지
• /
• 제18권5호
• /
• pp.1149-1154
• /
• 2014

본 연구는 산화물반도체트랜지스터의 터널링 현상을 살펴보기 위해서 게이트 절연막으로서 SiOC 박막을 사용하고 채널층으로 IGZO를 이용하여 트랜지스터를 제작 하였다. SiOC 박막은 분극이 작아질수록 비정질특성이 우수해지면서 절연특성이 좋아진다. SiOC 게이트 절연막과 채널 층 사이의 계면에 존재하는 접합특성은 SiOC의 분극특성에 따라서 달려졌다. 드레인소스 전류($I_{DS}$)와 게이트소스 전압($V_{GS}$)의 전달특성은 분극이 낮은 SiOC를 사용할 경우 양방향성 전달특성이 나타나고 분극이 높은 SiOC 게이트 절연막을 사용할 경우 단방향성 전달 특성이 나타났다. 터널링에 의한 양방향성 트랜지스터의 경우 바이어스 인가 전압이 낮은 ${\pm}1V$의 영역에서 쇼키접합을 나타냈었지만 트래핑효과에 의한 단방향성 트랜지스터의 경우 오믹접합 특성을 나타내었다. 특히 양방향성 트랜지스터의 경우 터널링 현상에 의하여 on/off 스위칭 특성이 개선되었다.

• 센서학회지
• /
• 제20권3호
• /
• pp.156-161
• /
• 2011

We fabricated a schottky barrier metal oxide semiconductor field effect transistor(SB-MOSFET) by applying indium-tin-oxide(ITO) to the source/drain on a highly resistive GaN layer grown on a silicon substrate. The MOSFET, with 10 ${\mu}M$ gate length and 100 ${\mu}M$ gate width, exhibits a threshold gate voltage of 2.7 V, and has a sub-threshold slope of 240 mV/dec taken from the $I_{DS}-V_{GS}$ characteristics at a low drain voltage of 0.05 V. The maximum drain current is 18 mA/mm and the maximum transconductance is 6 mS/mm at $V_{DS}$=3 V. We observed that the spectral photo-response characterization exhibits that the cutoff wavelength was 365 nm, and the UV/visible rejection ratio was about 130 at $V_{DS}$ = 5 V. The MOSFET-type UV detector using ITO, has a high UV photo-responsivity and so is highly applicable to the UV image sensors.

• Journal of Electrical Engineering and Technology
• /
• 제11권6호
• /
• pp.1763-1768
• /
• 2016

This paper presents the electrical characteristics of the gallium nitride (GaN) current aperture vertical electron transistor (CAVET) by using two-dimensional (2-D) technology computer-aided design (TCAD) simulations. The CAVETs are considered as the alternative device due to their high breakdown voltage and high integration density in the high-power applications. The optimized design for the CAVET focused on the electrical performances according to the different gate-source length ($L_{GS}$) and aperture length ($L_{AP}$). We analyze DC and RF parameters inducing on-state current ($I_{on}$), threshold voltage ($V_t$), breakdown voltage ($V_B$), transconductance ($g_m$), gate capacitance ($C_{gg}$), cut-off frequency ($f_T$), and maximum oscillation frequency ($f_{max}$).

• 대한전자공학회논문지SD
• /
• 제37권12호
• /
• pp.1-9
• /
• 2000

미세구조 N-채널 MOSFET의 게이트-소스 전압에 의존하는 유효 채널 캐리어 이동도와 소스 및 드레인 기생저항의 정확한 분리 추출을 위해서 새로운 ERM-방법을 제안하였다. ERM-방법은 선형영역에서 동작하는 게이트 길이가 다른 두개의 소자($W_m/L_m=30{\mu}m/0.6{\mu}m, 30{\mu}m/1{mu}m$)에 적용되었고 유효 채널 캐리어 이동도를 모델링하고 추출하는 과정에서 게이트-소스 전압에 의존하는 소스 및 드레인 기생저항의 영향을 고려하였다. ERM-방법으로 추출된 특성변수들을 사용한 해석적 모델식과 소자의 측정데이터를 비교해본 결과 오차가 거의 없이 일치하는 것을 확인하였다. 따라서, ERM-방법을 사용하면 대칭구조 및 비대칭구조 소자의 유효 채널 캐리어 이동도, 소스 및 드레인 기생저항과 다른 특성변수들을 정확하고 효율적으로 추출할 수 있을 것으로 기대된다.

• 한국전기전자재료학회논문지
• /
• 제26권9호
• /
• pp.707-711
• /
• 2013

Carbon nanotubes(CNT) has strength and chemical stability, greatly conductivity characteristics. In particular, MWCNT (multi-walled carbon nanotubes) show rapidly resistance sensitive for changes in the ambient gas, and therefore they are ideal materials to gas sensor. So, we fabricated NOx gas sensors structured MOS-FET using MWCNT (multi-walled carbon nanotubes) material. We investigate the change resistance of NOx gas sensors based on MOS-FET with ultra lean NOx gas concentrations absorption. And NOx gas sensors show sensitivity on the change of gate-source voltage ($V_{gs}=0[V]$ or $V_{gs}=3.5[V]$). The gas sensors show the increase of sensitivity with increasing the temperature (largest value at $40^{\circ}C$). On the other hand, the sensitivity of sensors decreased with increasing of NOx gas concentration. In addition, We obtained the adsorption energy($U_a$), $U_a$ = 0.06714[eV] at the NOx gas concentration of 8[ppm], $U_a$ = 0.06769[eV] at 16[ppm], $U_a$ = 0.06847[eV] at 24[ppm] and $U_a$ = 0.06842[eV] at 32[ppm], of NOx gas molecules concentration on the MWCNT gas sensors surface with using the Arrhenius plots. As a result, the saturation phenomena is occurred by NOx gas injection of concentration for 32[ppm].

• Journal of electromagnetic engineering and science
• /
• 제1권1호
• /
• pp.73-77
• /
• 2001

We studied the fabrication of GaAs-based pseudomorphic high electron mobility transistors(PHEMT`s) for the purpose of millimeter- wave applications. To fabricate the high performance GaAs-based PHEMT`s, we performed the simulation to analyze the designed epitaxial-structures. Each unit processes, such as 0.1 m$\mu$$\Gamma$-gate lithography, silicon nitride passivation and air-bridge process were developed to achieve high performance device characteristics. The DC characteristics of the PHEMT`s were measured at a 70 $\mu$m unit gate width of 2 gate fingers, and showed a good pinch-off property ($V_p$= -1.75 V) and a drain-source saturation current density ($I_{dss}$) of 450 mA/mm. Maximum extrinsic transconductance $(g_m)$ was 363.6 mS/mm at $V_{gs}$ = -0.7 V, $V_{ds}$ = 1.5 V, and $I_{ds}$ =0.5 $I_{dss}$. The RF measurements were performed in the frequency range of 1.0~50 GHz. For this measurement, the drain and gate voltage were 1.5 V and -0.7 V, respectively. At 50 GHz, 9.2 dB of maximum stable gain (MSG) and 3.2 dB of $S_{21}$ gain were obtained, respectively. A current gain cut-off frequency $(f_T)$ of 106 GHz and a maximum frequency of oscillation $(f_{max})$ of 160 GHz were achieved from the fabricated PHEMT\\`s of 0.1 m$\mu$ gate length.h.