• 한국표면공학회지
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• 제50권5호
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• pp.339-344
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• 2017

Highly corrosion resistance performance of CrAlSiN coatings were obtained by applying ultrathin $Al_2O_3$ thin films using atomic layer deposition (ALD) method. CrAlSiN coatings were prepared on Cr adhesion layer/SUS304 substrates by a hybrid coating system of arc ion plating and high power impulse magnetron sputtering (HiPIMS) method. And, ultrathin $Al_2O_3$ passivation layer was deposited on the CrAlSiN/Cr adhesion layer/SUS304 sample to protect CrAlSiN coatings by encapsulating the whole surface defects of coating using ALD. Here, the high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) and energy dispersive X-ray spectrometry (EDX) analysis revealed that the ALD $Al_2O_3$ thin films uniformly covered the inner and outer surface of CrAlSiN coatings. Also, the potentiodynamic and potentiostatic polarization test revealed that the corrosion protection properties of CrAlSiN coatings/Cr/SUS304 sample was greatly improved by ALD encapsulation with 50 nm-thick $Al_2O_3$ thin films, which implies that ALD-$Al_2O_3$ passivation layer can be used as an effect barrier layer of corrosion.

• Transactions on Electrical and Electronic Materials
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• 제11권4호
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• pp.182-185
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• 2010

$Pb_{0.99}[(Zr_{0.6}Sn_{0.4})_{0.9}Ti_{0.1}]_{0.98}Nb_{0.02}O_3$ (PNZST) thin films were deposited by radio frequency magnetron sputtering on a $(La_{0.5}Sr_{0.5})CoO_3$ (LSCO)/Pt/Ti/$SiO_2$/Si substrate using a PNZST target with an excess PbO of 10 mole%. The thin films deposited at the substrate temperature of $500^{\circ}C$ crystallized to a perovskite phase after rapid thermal annealing (RTA). The thin films, which annealed at $650^{\circ}C$ for 10 seconds in air, exhibited good crystal structures and ferroelectric properties. The remanent polarization and coercive field of the fabricated PNZST capacitor were approximately $20uC/cm^2$ and 50 kV/cm, respectively. The reduction of the polarization after $2.2\;{\times}\;10^9$ switching cycles was less than 10%.

• 한국지구과학회지
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• 제32권7호
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• pp.707-718
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• 2011

보성-화순지역 하상퇴적물에 대한 지질집단별 자연배경치와 지구화학적 특성에 대해 연구하였다. 이를 위해 1차 수계를 따라 하상퇴적물시료 186개를 채취하였고, 실험실에서 자연건조 시킨 후, XRF, ICP-AES, NAA분석을 실시하였다. 하상퇴적물의 지질집단별 자연배경치와 지구화학적 특성을 알기 위해, 시료를 화강암질편마암(GGn)지역과 반상변정질편마암(PGn)지역으로 분리하였다. 화강암질편마암지역의 주성분원소 함량은 $SiO_2$ 45.5-73.09 wt.%, $Al_2O_3$ 12-20.76 wt.%, $Fe_2O_3$(T) 3.72-8.85 wt.%, $K_2O$ 2.38-4.2 wt.%, MgO 0.75-2.77 wt.%, $Na_2O$ 0.78-1.88 wt.%, CaO 0.27-2.1 wt.%, $TiO_2$ 0.56-1.72 wt.%, $P_2O_5$ 0.06-0.73 wt.% and MnO 0.03-0.95 wt.%이고 반상변정질편마암지역의 주성분원소 함량은 $SiO_2$ 43.74-70.71 wt.%, $Al_2O_3$ 11.54-25.05 wt.%, $Fe_2O_3$(T) 3.44-13.46 wt.%, $K_2O$ 2.08-3.86 wt.%, MgO 0.65-2.99 wt.%, $Na_2O$ 0.63-1.7 wt.%, CaO 0.35-2.07 wt.%, $TiO_2$ 0.68-4.17wt.%, $P_2O_5$ 0.1-0.31 wt.% and MnO 0.07-0.33 wt.%이다. 화강암질편마암지역 하상퇴적물의 위해원소 함량은 크롬 41.7-242 ppm, 코발트 7.6-25.1 ppm, 니켈 12-61 ppm, 구리 10-47 ppm, 아연 48.5-412 ppm, 납 17-215 ppm이고 반상변정질편마암지역은 크롬 29.6-454 ppm, 코발트 5.9-53.7 ppm, 니켈 8.7-287 ppm, 구리 6.4-134 ppm, 아연 43.6-370 ppm, 납 15-37 ppm이다. 화강암질편마암지역에서 크롬은 MgO와 코발트는 $Al_2O_3$, $Fe_2O_3$(T), MgO와 니켈은 $Fe_2O_3$(T), CaO, MgO와 높은 상관성을 가지나, 구리, 아연, 납은 비교적 낮은 상관성을 보였다. 반상변정질편마암지역에서 일반적으로 크롬, 코발트, 니켈, 구리는 주성분원소와 대부분 높은 상관성을 보였으나, 아연과 납은 낮은 상관성을 보였다.

• 한국재료학회지
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• 제17권4호
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• pp.222-226
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• 2007

[ $SiO_2$ ]thin films containing Si-nanocrystals and $Er^{3+}$ were fabricated by the RF-sputtering method. Intense emission of $Er^{3+}$ was observed at 1530 nm region after the annealing of the film at $1050^{circ}C$ for 5 min. Channel waveguides were fabricated using such films for the core. The films containing Si higher than 2.4 at% exhibited the change in stress from compression to tension after annealing, which induced the fatal loss-increase in waveguide. The optical gain might be attained by the Er-doped waveguide with Si lower than 2.4 at% by a visible-light-excitation.

• 한국염색가공학회지
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• 제30권3호
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• pp.190-198
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• 2018

We fabricated high transmission and high scattering poly(ethylene-co-vinyl acetate)(EVA) films embedding $SiO_2$ nanoparticles to improve outcoupling efficiency in organic display. The 800nm diameter $SiO_2$ nanoparticles aggregated and formed $1.56{\mu}m$ (with ${\pm}0.853{\mu}m$ standard deviation) diameter microparticles in EVA. The total transmission of scattering film was 83.3% on Polyethylene terephthalate(PET), which was higher than reference 82.8% PET substrate. The diffuse transmission and haze of the $SiO_2$ embedded EVA film were 76.1% and 91.4%, respectively. The optimized condition was 1:1 weight ratio of $SiO_2$ nanoparticles to EVA in Tetrahydrofuran(THF) solution. When the ratio of $SiO_2$ was larger than 1, the total transmission decreased by the increase in backscattering of light due to high scattering. With the optimized condition, we could succeed to fabricate a large scale film(35m in length) with a roll-to-roll process.

• 한국재료학회지
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• 제3권5호
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• pp.459-465
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• 1993

SOG박막 밑에 층간 절연박으로 사용하는 PECVD산화막을 Si rich산화막으로 만들어 줌으로써 실리콘 dangling bond가 수소원자나 수분과 결합하여 SOG박막으로 부터 침투되는 수소원자나 수분의 확산을 억제하므로서 소작 열화되는 것을 방지한다. 이러한 Si rich산화막의 기본 특성을 알아보기 위하여 LF/HF power비와 $SiH_4/N_2O$ gas유량비를 변화시켜서 박막 특성을 조사하였다. 저주파 power만 변화시킨 경우, 증착속도가 감소하고 굴절율과 압축응력에 증가하며 FTIR에서 3300$\textrm{cm}^{-1}$~3800$\textrm{cm}^{-1}$영역의 수분에 의한 peak이 감소하는 것으로 보아 박막이 치밀해짐을 알 수 있고, $SiH_{4}$기체유량을 증가시킨 경우엔 증착속도, 굴절율, 식각속도는 증가하나 압축응력은 감소한다. FTIR에서 Si-O-Si peak의 세기가 감소하고 낮은 파수영역으로 이동하며, AES분석 결과에서 일반적인 oxide(Si:0=1:1.98)에서 보다 Si:O비가 1:1.23으로 낮아 PECVD산화 막내의 Si danling bond가 증가했음을 알 수 있었다.

• 한국표면공학회지
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• 제29권6호
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• pp.809-815
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• 1996

$Y_2O_3$-based metal-insulator-semiconductor (MIS) structure on p-Si(100) has been studied. Films were prepared by UHV reactive ionized cluster beam deposition (r-ICBD) system. The base pressure of the system was about $1 \times 10^{-9}$ -9/ Torr and the process pressure $2 \times 10^{-5}$ Torr in oxygen ambience. Glancing X-ray diffraction(GXRD) and in-situ reflection high energy electron diffracton(RHEED) analyses were performed to investigate the crystallinity of the films. The results show phase change from amorphous state to crystalline one with increasingqr acceleration voltage and substrate temperature. It is also found that the phase transformation from $Y_2O_3$(111)//Si(100) to $Y_2O_3$(110)//Si(100) in growing directions takes place between $500^{\circ}C$ and $700^{\circ}C$. Especially as acceleration voltage is increased, preferentially oriented crystallinity was increased. Finally under the condition of above substrate temperature $700^{\circ}C$ and acceleration voltage 5kV, the $Y_2O_3$films are found to be grown epitaxially in direction of $Y_2O_3$(1l0)//Si(100) by observation of transmission electron microscope(TEM). Capacitance-voltage and current-voltage measurements were conducted to characterize Al/$Y_2O_3$/Si MIS structure with varying acceleration voltage and substrate temperature. Deposited $Y_2O_3$ films of thickness of nearly 300$\AA$ show that the breakdown field increases to 7~8MV /cm at the same conditon of epitaxial growing. These results also coincide with XPS spectra which indicate better stoichiometric characteristic in the condition of better crystalline one. After oxidation the breakdown field increases to 13MV /cm because the MIS structure contains interface silicon oxide of about 30$\AA$. In this case the dielectric constant of only $Y_2O_3$ layer is found to be $\in$15.6. These results have demonstrated the potential of using yttrium oxide for future VLSI/ULSI gate insulator applications.

• 암석학회지
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• 제27권1호
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• pp.37-47
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• 2018

백두산에서 역사시대에 분화한 화산재의 시료에 대하여 다양한 방법으로 주성분과 미량성분을 분석하였다. 화산재의 주성분 원소 함량은 $SiO_2$ 58.8~71.1 wt.%, $Al_2O_3$ 9.6~16.8 wt.%, ${Fe_2O_3}^T$ 4.5~6.9 wt.%, MgO 0.1~1.7 wt.%, CaO 0.3~1.6 wt.%, $Na_2O$ 5.2~6.3 wt.%, $K_2O$ 4.3~5.9 wt.% 그리고 $TiO_2$ 1.2 wt.%이하로 분석되었다. Ba, Cu, Cr. Co, Ni, Sr, V, Zn와 Zr을 포함하는 32개 미량원소가 분석되었는데, 이들 화산재는 일부 미량원소와 경희토류 원소의 부화정도에 따라 두 그룹(그룹 A, 그룹 B)으로 구분되며, 그룹 A에는 1천년 전의 밀레니엄 분화물, 1668년과 1903년 분화물이, 그룹 B에는 1702년 분화물이 해당된다. 중금속원소인 Cu, Co, Zn, Mn 등은 소량 함유되어 나타난다. 백두산 화산재는, 섭입대 기원의 일본 사쿠라지마 화산의 화산재와 비교하여, 미량성분원소 중 Y, Nb, Pb, U, Sc, V, Ni 그리고 Cu 함량은 낮게 나타나며, Zr, Ba, Hf, Cr, Co, Zn 그리고 희토류(Eu제외) 등은 높은 함량을 나타낸다.

• 한국세라믹학회지
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• 제47권4호
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• pp.325-328
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• 2010

Varying quantities of a high-thermal-expansion glass, 50CaO-20ZnO-$20B_2O_3-10SiO_2$ (CZBS), were added to alumina and sintered at $875^{\circ}C$ for 2 h for low temperature co-firing ceramic (LTCC) applications. As the amount of glass addition increased from 40 wt% to 70 wt%, the apparent density of the sintered product increased from 88.8% to 91.5%, which was also qualitatively confirmed by microstructural observation. When the glass addition was very high, e.g., 70 wt%, an apparent formation of secondary phases such as $CaZn_2AlZnSiAlO_7$, $Ca_2Al(AlSi)O_7$, $Ca_2Al_2SiO_7$, $Ca_2ZnSi_2O_7$ and ZnO, was observed. Both the dielectric constant and the coefficient of thermal expansion increased with the glass addition, which was qualitatively consistent with the analytical models, while the experimental values were lower than the predicted ones due to the presence of pores and secondary phases.

• 한국세라믹학회지
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• 제52권3호
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• pp.215-220
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• 2015

Phase evolution, microstructure, and microwave dielectric properties of $Li_2O$ and $Al_2O_3$ doped $Zn_{1.9}Si_{1.05}O_4$, i.e., $Zn_{1.9-2x}Li_xAl_x-Si_{1.05}O_4$, ceramics (x = 0.02 ~ 0.10) were investigated. The ceramics were densified by $SiO_2$-rich liquid phase composed of the Li-Al-Si-O system, indicating that doped Li and Al contributed to the formation of the liquid. As the secondary phase, ${\beta}$-spodumene solid solution with the composition of $LiAlSi_3O_8$ was precipitated from the liquid during the cooling process. The dense ceramics were obtained for the specimens of $$x{\geq_-}0.06$$ showing the rapid densification above $1000^{\circ}C$, implying that a certain amount of liquid is necessary to densify. The specimen of x = 0.06 sintered at $1050^{\circ}C$ exhibited good microwave dielectric properties; the dielectric constant and the quality factor ($Q{\times}f_0$) were 6.4 and 11,213 GHz, respectively.