• Journal of the Korean Society of Industry Convergence
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• v.25 no.6_2
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• pp.1063-1069
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• 2022

In modern industry, vacuum has grown into an indispensable industrial field. The performance of the vacuum pump in the degasser system among mud treatment system facilities was verified by a numerical analysis method. The degasser system is an equipment for removing the gas contained in the mud, and it is a work process that requires a vacuum. This study analyzed the vacuum pump performance of the degasser used in drilling for resource development of onshore and offshore plants. The vacuum pump used in the degasser system was designed with a discharge rate of 0.099kg/s. The DM(Design Modeler) program of ansys workbench 17.2 was used to modify the model of the vacuum pump used in the degasser system. And for performance analysis, CFX, which is known to be suitable for rotating system analysis, was used. Finally the performance analysis results of the vacuum pump and the prototype performance test results were compared and analyzed.

• International journal of advanced smart convergence
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• v.7 no.4
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• pp.84-91
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• 2018

In this paper, we simulated three different HV systems and analyzed of each vacuum characteristics by VacCAD modelling. In each of modelled vacuum systems, selection of chamber materials, combination of rough pump with high vacuum pump and conductance of roughing line (diameter and length) were proposed as system variables. In the modelling of chamber materials, the pumping times to ultimate pressures of different chamber materials (stainless steel, aluminum) were compared by the variations of chamber volume. In this model, the effects of outgassing dependent on the chamber materials was also simulated and aluminum was estimated to optimum chamber materials. It was also obtained that modelling of vane and roots pump with diffusion pump and diameter, length of $50{\times}250$ [mm]roughing line were characterized as optimum variables to reach the ultimate pressure of 10E-7 [mbar] most effectively. Optimum design factors for vacuum characteristics of modelled vacuum system were achieved by VacCAD simulations. Feasibility of VacCAD as vacuum simulator was verified and applications of VacCAD expected to be increased to fields in vacuum needed.

• Journal of the Korean Vacuum Society
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• v.16 no.5
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• pp.383-387
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• 2007

In this paper the design of the discharge cleaning system for KSTAR vacuum vessel is described. We first discuss about the parameters which are related the efficiency of discharge cleaning. The RG(RF-assisted Glow) discharge which has the ignition and sustain pressure lower than those in the case of DC discharge, thus has the higher efficiency of discharge cleaning. So we adopt the RG discharge, in practical design, for KSTAR discharge cleaning system. For uniformity of the cleaning effect, we plan to install two discharge cleaning systems in A- and I-port of the KSTAR vacuum vessel. The designed system will be adapted for the study of the fuel recycling and of the boronization as well as the discharge cleaning of the KSTAR vacuum vessel.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.24 no.6
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• pp.449-457
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• 2011

Effect of pump combinations on the vacuum characteristics of vacuum system was simulated for optimum design of system. In this investigation, the feasibility of modelling mechanism for VacSimMulti simulator was proposed. Simulation results of various pumping combinations showed the possibilities and reliabilities of simulation for the performance of vacuum system in specific semiconductor processing. Simulation of roughing pump presented the expected pumping behaviors based on commercial specifications of employed pumps. Application of booster pump exhibited the high pumping efficiency for middle vacuum range. Combinations of optimum backing pump for diffusion and turbo vacuum system were obtained. And, the predictable characteristics of process application of both simulated systems were also acquired.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.33 no.11
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• pp.886-893
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• 2009

To develop glass panel vacuum lift system for the post process in module line of FPD(Flat panel display) such as LCD and PDP, new vacuum adsorption parts of this system are proposed. These parts are composed of variable geometry configurations utilizing ceramic porous medium for variable size of glass panels. In order to design this device, detail understanding of flow phenomena in the flow path of vacuum adsorption system is essential. Thus, CFD analysis and designs are performed for several configurations in terms of pressure drop and balancing force at the adsorption side. From the result, new configuration is recommended for optimum design and manufacturing purpose.

• Transactions on Electrical and Electronic Materials
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• v.14 no.6
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• pp.334-338
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• 2013

In this study, the outgassing effects of selected vacuum materials on the vacuum characteristics were simulated by the $VacSim^{Multi}$ simulation tool. This investigation examined the feasibility of reliably simulating the outgassing characteristics of common vacuum chamber materials (aluminum, copper, stainless steel, nickel plated steel, Viton A). The optimum design factors for these vacuum systems were suggested based on the simulation results. The baking-out effects of the modeled systems and materials on the performance of the vacuum system were also analyzed. The simulation predicted that the overall outgassing effect was more significant in the turbomolecular pump system than in the diffusion pump system and that the utilization of a booster pump has a greater effect on the evacuation time than on the ultimate pressure.

• Proceedings of the KIEE Conference
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• 2005.07d
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• pp.2652-2654
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• 2005

A vacuum chamber temperature control system of Pohang Accelerator Laboratory (PAL) storage ring is a subsystem upgraded PAL control system, which is based upon Experimental Physics and Industrial Control System (EPICS) [1]. There are two control components, data acquisition system (SA120 data logger), development control system IOC (Input/Output Controller) at the storage ring of PAL. There are 240 vacuum chamber at the storage ring. It was a very important problem to solve how to monitor such a large number of vacuum chamber temperature distributed around the ring. The IOC connect MODBUS/JBUS field network to asynchronous serial ports for communication with serial device. It can simultaneously control up to 4 data acquisition systems. Upon receiving a command from a IOC running under Windows2k through the network, the IOC communicate through the slave serial interface ports to SA120. We added some software components on the top of EPICS toolkit. The design of the vacuum control system is discussed. This paper describes the development vacuum chamber temperature control system and how the design of this system.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.33-33
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• 1999

The design of a vacuum pumping system for the KOMAC (Korea Multipurpose Accelerator Complex) RFQ(Radio-Frequency Quadrupole) linac is described. [Fig] Resulted from the lost proton beam, gas streaming from the LEBT (Low Energy Beam Transport) and out-gassing from the surfaces of the RFQ cavity and vacuum plumbing, the total gas load will be on the order of 7.2$\times$10-4 Torr-liters/sec, consisting mainly of hydrogen. The system designed to pump on a continual basis with redundancy to ensure that the minimal operating vacuum level of 1.0$\times$10-6 Torr is maintained even under abnormal conditions. Details of the design, performance analysis and the preliminary test results of the cryogenic pumps are presented.

• Journal of the Semiconductor & Display Technology
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• v.8 no.1
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• pp.7-12
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• 2009

The outgassing effects of selected vacuum materials on the vacuum characteristics were simulated by the $VacSim^{Multi}$ simulation tool. This investigation examined the feasibility of reliably simulating the outgassing characteristics of common vacuum chamber materials (aluminum, copper, stainless steel, nickel plated steel, Viton A). The optimum design factors for these vacuum systems were suggested based on the simulation results. The baking-out effects of the modeled systems and materials on the performance of the vacuum system were also analyzed. The simulation predicted that the overall outgassing effect was more significant in the TMP system than in the DP system and that the utilization of a booster pump has a greater effect on the evacuation time than on the ultimate pressure.

• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.11
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• pp.1658-1665
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• 1989

Reactor design considerations over several critical parameters for a planar type reactive ion etcher are given. The etch uniformity is taken as a principal design constraint. The characteristics of economicaly available vacuum pumping system are taken as practical design constraints. A set of theoretical conditions on the chamber geometry and on the gas delivery and vacuum system, that satisfy the design constraints, are derived from basic properties of RF glow discharge and gas dynamics. The theoretical results are applied to decide design parameters of a practical single-wafer-per-chamber planar type reactive ion etching machine.