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http://dx.doi.org/10.4313/JKEM.2011.24.6.449

Simulation of Vacuum Characteristics in Semiconductor Processing Vacuum System by the Combination of Vacuum Pumps  

Kim, Hyung-Taek (Department of Advanced Materials Engineering, University of Incheon)
Kim, Dae-Yeon (Department of Advanced Materials Engineering, University of Incheon)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.24, no.6, 2011 , pp. 449-457 More about this Journal
Abstract
Effect of pump combinations on the vacuum characteristics of vacuum system was simulated for optimum design of system. In this investigation, the feasibility of modelling mechanism for VacSimMulti simulator was proposed. Simulation results of various pumping combinations showed the possibilities and reliabilities of simulation for the performance of vacuum system in specific semiconductor processing. Simulation of roughing pump presented the expected pumping behaviors based on commercial specifications of employed pumps. Application of booster pump exhibited the high pumping efficiency for middle vacuum range. Combinations of optimum backing pump for diffusion and turbo vacuum system were obtained. And, the predictable characteristics of process application of both simulated systems were also acquired.
Keywords
Vacuum characteristics; Vacuum system; Vacuum pump; Simulation;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
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