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http://dx.doi.org/10.7236/IJASC.2018.7.4.84

Simulation of Vacuum Characteristics of High Vacuum System Modelled by VacCAD  

Kim, Hyungtaek (Department of Advanced Materials Engineering Incheon National University)
Park, Junhyung (Department of Advanced Materials Engineering Incheon National University)
Yun, Gyeongah (Department of Advanced Materials Engineering Incheon National University)
Publication Information
International journal of advanced smart convergence / v.7, no.4, 2018 , pp. 84-91 More about this Journal
Abstract
In this paper, we simulated three different HV systems and analyzed of each vacuum characteristics by VacCAD modelling. In each of modelled vacuum systems, selection of chamber materials, combination of rough pump with high vacuum pump and conductance of roughing line (diameter and length) were proposed as system variables. In the modelling of chamber materials, the pumping times to ultimate pressures of different chamber materials (stainless steel, aluminum) were compared by the variations of chamber volume. In this model, the effects of outgassing dependent on the chamber materials was also simulated and aluminum was estimated to optimum chamber materials. It was also obtained that modelling of vane and roots pump with diffusion pump and diameter, length of $50{\times}250$ [mm]roughing line were characterized as optimum variables to reach the ultimate pressure of 10E-7 [mbar] most effectively. Optimum design factors for vacuum characteristics of modelled vacuum system were achieved by VacCAD simulations. Feasibility of VacCAD as vacuum simulator was verified and applications of VacCAD expected to be increased to fields in vacuum needed.
Keywords
VacCAD; Simulation; Vacuum system modeling; Vacuum characteristics; Optimum design factor;
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  • Reference
1 VacCAD Operation Manual
2 VECOR, http://www.vecorus.com
3 Hyungtaek Kim, " Analysis of high vacuum system based on vacuum materials", Transactions on electrical & electronic materials Vol. 14, No. 6, pp. 334-338, December 25, 2013   DOI
4 Technology Sources Ltd., User's Guide of VacSim[Multi] Simulator (manual), 2001.
5 Joo, Jang Hun, "Vacuum Technology for EUV Lithography", Vacuum Magazine Volume 1, Issue3, pp.14-20, 2014   DOI
6 B. Andrew Guthrie. Vacuum technology. John Wiley and Sons; 2008
7 B. Hyunwhe Kim, Introduction to basic vacuum engineering for semiconductor and display processing, neaha, 2007
8 B. J. M. Lafferty. Foundations of vacuum science and technology. John Wiley and Sons; 1998.
9 B. Janghun Jo, practical vacuum technology, Hongneung Science, 2004
10 B. Jousten Karl, Nakhosteen C. Benjamin. Handbook of vacuum technology, Wiley-VCH Verlag GmbH; 2008.