• Journal of the Institute of Electronics Engineers of Korea SD
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• v.46 no.12
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• pp.80-86
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• 2009

In this paper, we present a new charge pump circuit feasible for the implementation with standard twin-well CMOS process technology. The proposed charge pump employs PMOS-switching dual charge-transfer paths and a simple two-phase clock. Since charge transfer switches are fully turned on during each half of clock cycle, they transfer charges completely from the present stage to the next stage without suffering threshold voltage drop. During one clock cycle, the pump transfers charges twice through two pumping paths which are operating alternately. The performance comparison by simulations and measurements demonstrates that the proposed charge pump exhibits the higher output voltage, the larger output current and a better power efficiency over the traditional twin-well charge pumps.

• Proceedings of the KIEE Conference
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• 1997.07d
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• pp.1270-1273
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• 1997

We have investigated the latchup characteristics of BL/BILLI retrograde twin well CMOS that has the high energy ion implanted buried layer to intend for more improvement of latchup compare to conventional retrograde well and BILLI structures. We explored the dependence of various latchup characteristics such as n+ trigger latchup and p+ trigger latchup on the buried layer implant doses. We show various DC latchup characteristics that allow us to evaluate each technology and suggest guidelines for the reduction of latchup susceptibility.

• Journal of Electrical Engineering and information Science
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• v.2 no.4
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• pp.8-13
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• 1997

This paper describes a scalable systolic synchronous memory for digital signal processing and packet switching. The systolic synchronous memory consists of the 2-D array of small memory blocks which are fully pipelined and communicated in three directions with adjacent blocks. The maximum delay of a small memory block becomes the operation speed of the chip. The array configuration is scalable for the entire memory size requested by an application. it has the initial latency of N+3 cycles with NxN array configuration. We designed an experimental 200 MHz 4Kb static RAM chip with the 4x4 array configuration of 256 SRAM blocks. It was fabricated is 0.8$\mu\textrm{m}$ twin-well single-poly double-metal CMOS technology.

• Proceedings of the IEEK Conference
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• summer
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• pp.74-76
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• 2004

A Half-VDD Voltage(VHDD) Generator using PMOS pull-up transistor and NMOS pull-down transistor was newly proposed for low-voltage DRAMs. The driving current was increased and the power-on settling time was reduced in the new circuit. The newly proposed VHDD generator worked successfully at VDD at 1.5V and fabricated using 0.18um CMOS twin-well technology.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.12 no.6
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• pp.304-310
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• 2002

Novel charge trap type memory devices with reoxidized oxynitride gate dielectrics made by NO annealing and reoxidation process of initial oxide on substrate have been fabricated using 0.35 $\mu \textrm{m}$ retrograde twin well CMOS process. The feasibility for application as NVSM memory device and characteristics of traps have been investigated. For the fabrication of gate dielectric, initial oxide layer was grown by wet oxidation at $800^{\circ}C$ and it was reoxidized by wet oxidation at $800^{\circ}C$ after NO annealing to form the nitride layer for charge trap region for 30 minutes at $850^{\circ}C$. The programming conditions are possible in 11 V, 500 $\mu \textrm{s}$ for program and -13 V, 1ms for erase operation. The maximum memory window is 2.28 V. The retention is over 20 years in program state and about 28 hours in erase state, and the endurance is over $3 \times 10^3$P/E cycles. The lateral distributions of interface trap density and memory trap density have been determined by the single junction charge pumping technique. The maximum interface trap density and memory trap density are $4.5 \times 10^{10} \textrm{cm}^2$ and $3.7\times 10^{18}/\textrm{cm}^3$ respectively. After $10^3$ P/E cycles, interlace trap density increases to $2.3\times 10^{12} \textrm{cm}^2$ but memory charges decreases.