• Title/Summary/Keyword: thermal vapor deposition

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Effect of Torch Speed and Solid Layer Thickness on Heat Transfer and Particle Deposition During modified Chemical Vapor Deposition Process (수정된 화학증착과정에서 토치이송과 고체층이 열전달과 입자부착에 미치는 영향)

  • 박경순;최만수
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.18 no.5
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    • pp.1301-1309
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    • 1994
  • A study of heat transfer and thermophoretic particle deposition has been carried out for the Modified Chemical Vapor Deposition(MCVD) process. A new concept utilizing two torches is suggested to simulate the heating effects from repeated traversing torches. Calculation results for the wall temperatures and deposition efficiency are in good agreement with experimental data. The effects of variable properties are included and heat flux boundary condition is used to simulate the moving torch heating. A conjugate heat transfer which includes heat conduction through solid layer and heat teansfer in a gas in a tube is analyzed. Of particular interests are the effects of torch speeds and solid layer thicknesses on the deposition efficiency, rate and the tapered entry length.

Various Shape of Carbon Layer on Ga2O3 Thin Film by Controlling Methane Fraction in Radio Frequency Plasma Chemical Vapor Deposition (Ga2O3박막 상에서의 RF 플라즈마 화학기상증착법의 메테인 분율 조절에 의한 탄소층의 다양한 형상 제어 연구)

  • Seo, Ji-Yeon;Shin, Yun-Ji;Jeong, Seong-Min;Kim, Tae-Gyu;Bae, Si-Young
    • Journal of the Korean Society for Heat Treatment
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    • v.35 no.2
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    • pp.51-56
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    • 2022
  • In this study, we controlled the shape of a carbon layer on gallium oxide templates. Gallium oxide layers were deposited on sapphire substrates using mist chemical vapor deposition. Subsequently, carbon layers were formed using radio frequency plasma chemical vapor deposition. Various shapes of carbon structures appeared according to the fraction of methane gas, used as a precursor. As methane gas concentration was adjusted from 1 to 100%, The shapes of carbon structures varied to diamonds, nanowalls, and spheres. The growth of carbon isotope structures on Ga2O3 templates will give rise to improving the electrical and thermal properties in the next-generation electronic applications.

Effects of Inner Jet Injection on Particle Deposition in the Annular Modified Chemical Vapor Deposition Process Using Concentric Tubes (환상형원관을 사용하는 수정된 화학증착(MCVD)방법에서 내부 제트분사가 입자부착에 미치는 영향)

  • 최만수;박경순
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.18 no.1
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    • pp.212-222
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    • 1994
  • In the annular Modified Chemical Vapor Deposition process using two concentric tubes, the inner tube is heated to maintain high temperature gradients to have high thermophoretic force which can increase particle deposition efficiency. However, higher axial velocity in a narrow gap between inner and outer tubes can result in a longer tapered entry length. In the present paper, a new concept using an annular jet from the inner tube is presented and shown to significantly reduce the tapered entry length with maintaining high efficiency. Effects of a jet injection on heat transfer, fluid flow and particle deposition have been studied. Of particular interests are the effects of jet velocity, jet location and temperature on the deposition efficiency and tapered length . Torch heating effects from both the previous and present passes are included and the effect of surface radiation between inner and outer tubes is also considered.

Numerical study on heat transfer and densification for SiC composites during thermal gradient chemical vapour infiltration process

  • Ramadan, Zaher;Im, Ik-Tae
    • Carbon letters
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    • v.25
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    • pp.25-32
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    • 2018
  • In this study, a thermal-gradient chemical vapor infiltration (TG-CVI) process was numerically studied in order to enhance the deposition uniformity within the preform. The computational fluid dynamics technique was used to solve the governing equations for heat transfer and gas flow during the TG-CVI process for two- and three-dimensional (2-D and 3-D) models. The temperature profiles in the 2-D and 3-D models showed good agreement with each other and with the experimental results. The densification process was investigated in a 2-D axisymmetric model. Computation results showed the distribution of the SiC deposition rate within the preform. The results also showed that using two-zone heater gave better deposition uniformity.

Influence of Mg Vapor Pressure on the $MgB_2$/Carbon Fiber Fabricated by Physical Vapor Deposition method

  • Li, Xiang;Ha, Hong-Soo;Kim, Cheol-Jin
    • Progress in Superconductivity and Cryogenics
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    • v.13 no.4
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    • pp.5-9
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    • 2011
  • We have fabricated the superconducting $MgB_2$/carbon fiber by physical vapor deposition method. Mg (Magnesium) and B (Boron) were simultaneously deposited on the carbon fiber using the RF-sputtering and thermal evaporation, respectively. To ensure the relatively high vapor pressure of Mg at the growth region and the subsequent phase stability of $MgB_2$ at the deposition temperature, inverted funnel-like guide made of Mg-foil was employed while one side of the guide were open for the sputtered B flux. Mg vapor pressure should be controlled precisely to secure the complete reaction. The $MgB_2$/carbon fiber showed a uniformly deposited thin layer with dense and well-formed grains. The $MgB_2$/carbon fibers in this study showed $T_c$~37.5K, $J_c$ ~ $2{\times}10^4\;A/cm^2$ in the 20K, 0T.

Thermal Durability of 4YSZ Thermal Barrier Coating Deposited by Electron Beam PVD (전자빔을 이용한 물리기상증착법으로 제조된 열차폐용 4 mol% YSZ 코팅의 내열특성)

  • Park, Chanyoung;Yang, Younghwan;Kim, Seongwon;Lee, Sungmin;Kim, Hyungtae;Lim, Daesoon;Jang, Byungkoog;Oh, Yoonsuk
    • Journal of Powder Materials
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    • v.20 no.6
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    • pp.460-466
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    • 2013
  • 4 mol% Yttria-stabilized zirconia (4YSZ) coatings with $200{\mu}m$ thick are fabricated by Electron Beam Physical Vapor Deposition (EB-PVD) for thermal barrier coating (TBC). $150{\mu}m$ of NiCrAlY based bond coat is prepared by conventional APS (Air Plasma Spray) method on the NiCrCoAl alloy substrate before deposition of top coating. 4 mol% YSZ top coating shows typical tetragonal phase and columnar structure due to vapor phase deposition process. The adhesion strength of coating is measured about 40 MPa. There is no delamination or cracking of coatings after thermal cyclic fatigue and shock test at $850^{\circ}C$.

Growth of Amorphous SiOx Nanowires by Thermal Chemical Vapor Deposition Method (열화학 기상 증착법에 의한 비정질 SiOx 나노와이어의 성장)

  • Kim, Ki-Chul
    • Journal of Convergence for Information Technology
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    • v.7 no.5
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    • pp.123-128
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    • 2017
  • Nanostructured materials have received attention due to their unique electronic, optical, optoelectrical, and magnetic properties as a results of their large surface-to-volume ratio and quantum confinement effects. Thermal chemical vapor deposition process has attracted much attention due to the synthesis capability of various structured nanomaterials during the growth of nanostructures. In this study, silicon oxide nanowires were grown on Si\$SiO_2$(300 nm)\Pt(5~40 nm) substrates by two-zone thermal chemical vapor deposition with the source material $TiO_2$ powder via vapor-liquid-solid process. The morphology and crystallographic properties of the grown silicon oxide nanowires were characterized by field-emission scanning electron microscope and transmission electron microscope. As results of analysis, the morphology, diameter and length, of the grown silicon oxide nanowires are depend on the thickness of the catalyst films. The grown silicon oxide nanowires exhibit amorphous phase.

Thermal Decomposition of Tetrakis(ethylmethylamido) Titanium for Chemical Vapor Deposition of Titanium Nitride

  • Kim, Seong-Jae;Kim, Bo-Hye;Woo, Hee-Gweon;Kim, Su-Kyung;Kim, Do-Heyoung
    • Bulletin of the Korean Chemical Society
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    • v.27 no.2
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    • pp.219-223
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    • 2006
  • The thermal decomposition of tetrakis(ethylmethylamido) titanium (TEMAT) has been investigated in Ar and $H_2$ gas atmospheres at gas temperatures of 100-400 ${^{\circ}C}$ by using Fourier Transform infrared spectroscopy (FTIR) as a fundamental study for the chemical vapor deposition (CVD) of titanium nitride (TiN) thin film. The activation energy for the decomposition of TEMAT was estimated to be 10.92 kcal/mol and the reaction order was determined to be the first order. The decomposition behavior of TEMAT was affected by ambient gases. TEMAT was decomposed into the intermediate forms of imine (C=N) compounds in Ar and $H_2$ atmosphere, but additional nitrile (RC$\equiv$N) compound was observed only in $H_2$ atmosphere. The decomposition rate of TEMAT under $H_2$ atmosphere was slower than that in Ar atmosphere, which resulted in the extension of the regime of the surface reaction control in the CVD TiN process.