• Proceedings of the IEEK Conference
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• 1998.06a
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• pp.409-412
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• 1998

BCl/sub 3/ 및 Cl/sub 2/ 반응가스를 사용하여 RIE 장치로 GaN의 건식식각을 연구하였다. RF 전력, 반응가스의 유량 및 반응가스의 혼합비 등의 변화에 따른 최적의 식각공정 조건 및 결합특성을 연구하였다. RF 전력에 따른 GaN의 식각율은 챔버압력 25mTorr, BCl/sub 3/ 유량 40 sccm의 조건에서 RF 전력이 100W일때 17nm/min을 얻었다. BCl/sub 3/의 유량에 따른 식각율은 RF 전력 100W 챔버압력 20mTorr, Cl/sub 2/ 유량 5sccm의 조건에서 BCl/sub 3/ 유량이 40 sccm일때 65nm/min을 얻었다. Cl/sub 2//BCl/sub 3/ 혼합가스 비율에 따른 식각율은 Cl/sub 2/ 유량을 5sccm으로 고정하고 BCl/sub 3/ 유량을 변화시켰을때 RF 전력 100W 및 챔버압력 20mTorr의 조건에서 혼합비가 0.25일때 50nm/min을 얻었다. RF 전력에 따른 PR의 식각율은 챔버압력 25mTorr, Cl/sub 2/ 유량 0 sccm 및 BCl/sub 3/ 유량 40 sccm의 조건에서 RF 전려이 100W일때 15nm/min을 얻었다. 또한, 챔버압력 20mTorr, Cl/sub 2/ 유량 5 sccm 및 BCl/sub 3/ 유량 20sccm의 조건에서 RF 전력이 100W 일때 82nm/min을 얻었다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.04b
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• pp.180-183
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• 2000

Beginning with a brief introduction on near 100 nm or below CMOS devices, this paper addresses novel devices for future sub-100 nm CMOS. First, key issues such as gate materials, gate dielectric, source/drain, and channel in Si bulk CMOS devices are considered. CMOS devices with different channel doping and structure are introduced by explaining a figure of merit. Finally, novel device structures such as SOI, SiGe, and double-gate devices will be discussed for possible candidates for sub-100 nm CMOS.

• JSTS:Journal of Semiconductor Technology and Science
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• v.6 no.1
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• pp.38-42
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• 2006

We report 1/f noise PSD(Power Spectrum Density) of sub-100 nm MOSFETs as a function of various parameters such as HCS (Hot Carrier Stress), bias condition, temperature, device size and types of MOSFETs. The noise spectra of sub-100 nm devices showed Lorentzian-like noise spectra. We could check roughly the position of a dominant noise source by changing $V_{DS}$. With increasing measurement temperature, the 1/f noise PSD of 50 nm PMOS device decreases, but there is no decrease in the noise of NMOS device. RTN (Random Telegraph Noise) was measured from the device that shows clearly a Lorentzian-like noise spectrum in 1/f noise spectrum.

• Journal of the Korean institute of surface engineering
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• v.56 no.3
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• pp.201-207
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• 2023

Eu³⁺-doped SnO² (SnO²:Eu³⁺) phosphor thin films were grown on quartz substrates by radio-frequency magnetron sputtering. The deposition temperature was varied from 100 to 400 ℃. The X-ray diffraction patterns showed that all the thin films had two mixed phases of SnO₂ and Eu₂Sn₂O₇. The 880 nmthick SnO²:Eu³⁺ thin film grown at 100 ℃ exhibited numerous pebble-shaped particles. The excitation spectra of SnO²:Eu³⁺ thin films consisted of a strong and broad peak at 312 nm in the vicinity from 250 to 350 nm owing to the O^2--Eu3+ charge transfer band, irrespective of deposition temperature. Upon 312 nm excitation, the SnO²:Eu³⁺ thin films showed a main emission peak at 592 nm arising from the ⁵D₀→⁷F₁ transition and a weak 615 nm red band originating from the ⁵D₀→⁷F₂ transition of Eu³⁺. As the deposition temperature increased, the emission intensities of two bands increased rapidly, approached a maximum at 100 ℃, and then decreased slowly at 400 ℃. The thin film deposited at 200 ℃ exhibited a band gap energy of 3.81 eV and an average transmittance of 73.7% in the wavelength range of 500-1100 nm. These results indicate that the luminescent intensity of SnO²:Eu³⁺ thin films can be controlled by changing the deposition temperature.

• Journal of the Korean Ceramic Society
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• v.40 no.7
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• pp.709-714
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• 2003

Eu doped $Y_2$ $O_3$ nanoparticles were prepared with the solvothermal synthesis using the ethyleneglycol solvent at 20$0^{\circ}C$ for 3-5 h and then annealed in air at 1000-140$0^{\circ}C$ for 2-4 h. The X-ray diffraction pattern of annealed crystals at 100$0^{\circ}C$ for 2 h could be indexed as pure cubic cell of $Y_2$ $O_3$ phase with lattice parameters a=10.5856 $\AA$ which is very close to the reported data (JCPDS Card File, 41-1105 a=10.6041 $\AA$). Average size of prepared phosphor particles have about 100 nm, which were spherical morphology. The phosphor particle sizes decreased and the emission intensity increased at the annealing temperature. Though PL spectrum analysis, the 3% Eu doped $Y_{2-x}$ $O_3$:E $u_{x}$ $^{3+}$(x=0.06) phosphor showed the excitation spectrum at 250 nm wavelength and the maximum emission spectrum at 611 nm wavelength.

• Journal of the Korean institute of surface engineering
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• v.55 no.6
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• pp.353-362
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• 2022

Recently, transmittance of photomasks for ultra-violet (UV) region is getting more important, as the light source wavelength of an exposure process is shortened due to the demand for technologies about high integration and miniaturization of devices. Meanwhile, such problems can occur as damages or the reduction of yield of photomask as electrostatic damage (ESD) occurs in the weak parts due to the accumulation of static electricity and the electric charge on chromium metal layers which are light shielding layers, caused by the repeated contacts and the peeling off between the photomask and the substrate during the exposure process. Accordingly, there have been studies to improve transmittance and antistatic performance through various functional coatings on the photomask surface. In the present study, we manufactured antireflection films of Nb₂O₅, | SiO₂ structure and antistatic films of ITO designed on 100 × 100 × 3 mmt sodalime glass by DC magnetron sputtering system so that photomask can maintain high transmittance at I-line (365 nm). ITO thin film deposited using In/Sn (10 wt.%) on sodalime glass was optimized to be 10 nm-thick, 3.0 × 103 𝛺/☐ sheet resistance, and about 80% transmittance, which was relatively low transmittance because of the absorption properties of ITO thin film. High average transmittance of 91.45% was obtained from a double side antireflection and antistatic thin films structure of Nb₂O₅ 64 nm | SiO₂ 41 nm | sodalime glass | ITO 10 nm | Nb₂O₅ 64 nm | SiO₂ 41 nm.

• Journal of the Korean Magnetics Society
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• v.17 no.6
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• pp.221-225
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• 2007

The effects of $Ga^+$ ion irradiation on the magnetic properties of the $Co_{73}Pt_{27}-TiO_2$ perpendicular magnetic recording media were investigated. As $Ga^+$ ion dose increased from $1\times10^{15}ions/cm^2\;to\;30\times10^{15}ions/cm^2$, the perpendicular magnetic anisotropy was degraded and no longer observed above $20\times10^{15}ions/cm^2$ dose. The deterioration of the perpendicular magnetic anisotropy and ferromagnetic properties can be attributed to the concentration profile change due to Ga+ ion implantation. The magnetic islands of $70\times70nm^2\;and\;100\times100nm^2$ size were successfully fabricated with $Ga^+$ ion irradiation.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.28 no.2
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• pp.69-73
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• 2018

Crystal growth of ${\alpha}-Fe_2O_3$ nanosized particles of 80~90 nm in size, which were hydrothermally prepared from 0.03 M $FeCl_3$ solution at $100^{\circ}C$, was investigated in Pb-containing and Pb-free frit. By heating ${\alpha}-Fe_2O_3$ nanosized particles in two frits at $800^{\circ}C$, the average diameter of particles in frits was increased to 200~210 nm and 150~160 nm, respectively, and the crystal growth due to the aggregation and sintering of several ${\alpha}-Fe_2O_3$ particles was observed. Formation ratios of larger particles over 100 nm in diameter were 54 % in Pb-free frit and 85 % in Pb-containing frit. After heating ${\alpha}-Fe_2O_3$ particles in frits at $800^{\circ}C$, 7~9 nm in average diameter of pores were formed in particles. Theses pores were derived from the porous structure of original ${\alpha}-Fe_2O_3$ particles and confined in particles during sintering.

• Korean Journal of Materials Research
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• v.30 no.7
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• pp.338-342
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• 2020

Tin oxide (SnO₂) nanocrystals are synthesized by a thermal evaporation method using a mixture of SnO₂ and Mg powders. The synthesis process is performed in air at atmospheric pressure, which makes the process very simple. Nanocrystals with a belt shape start to form at 900 ℃ lower than the melting point of SnO₂. As the synthesis temperature increases to 1,100 ℃, the quantity of nanocrystals increases. The size of the nanocrystals did not change with increasing temperature. When SnO₂ powder without Mg powder is used as the source material, no nanocrystals are synthesized even at 1,100 ℃, indicating that Mg plays an important role in the formation of the SnO₂ nanocrystals at temperatures as low as 900 ℃. X-ray diffraction analysis shows that the SnO₂ nanocrystals have a rutile crystal structure. The belt-shaped SnO₂ nanocrystals have a width of 300~800 nm, a thickness of 50 nm, and a length of several tens of micrometers. A strong blue emission peak centered at 410 nm is observed in the cathodoluminescence spectra of the belt-shaped SnO₂ nanocrystals.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.1
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• pp.33-36
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• 2012

In this study, the thickness effects of $Al_2O_3$ layer on the sensing properties of $SiO_2/Al_2O_3$ (OA) stacked membrane were investigated using electrolyte-insulator-semiconductor (EIS) structure for high quality pH sensor. The $Al_2O_3$ layers with a respective thickness of 5 nm, 15 nm, 23 nm, 50 nm, and 100 nm were deposited on the 5-nm-thick $SiO_2$ layers. The electrical characteristics and sensing properties of each OA membranes were investigated using metal-insulator-semiconductor (MIS) and EIS devices, respectively. As a result, the OA stacked membrane with 23-nm-thick $Al_2O_3$ layer shows the excellent characteristics as a sensing membrane of EIS sensor, which can enhance the signal to noise ratio.