• 전기전자학회논문지
• /
• 제15권4호
• /
• pp.299-304
• /
• 2011

본 논문에서는 Ka-대역에서 원형편파기, 임피던스 변환기, 직선 구조 모드변환기가 결합된 원형편파 도관관안테나를 설계 및 제작하였다. 원형 편파기는 유전체를 $45^{\circ}$ 형태로 삽입하는 형태와 타원형상의 단면을 갖는 도파관구조의 두가지 모델을 설계하여 전기적인 주요특성을 비교하였다. 또한, 직선구조 모드변환기는 계단구조의 임피던스 변환구조(stepped impedance transition)를 가지며 도파관을 진행하는 TE 모드의 전력신호를 동축선의 TEM 모드로 변환시키며, 직선모드 변환기의 입력부에 위치한 Feed-through를 통하여, 안테나를 능동모듈에 직접 연결할 수 있도록 설계하였다. 제작된 안테나는 측정결과 30.085~30.885GHz의 주파수대역에서 VSWR < 1.5, Axial ratio < 1.0dB 이하의 광대역특성을 가지며, 동일한 주파수 대역 내에서 6.7 ~ 7.0 dBi의 안테나 이득을 갖는다.

• 한국재료학회지
• /
• 제19권12호
• /
• pp.637-643
• /
• 2009

In this study, we analyzed the effect of silicon oxynitride matrix on the optical properties of Au nanoparticles dispersed on composite film and explored the effectiveness of the silicon in fine tuning the refractive index of the composite film for applications in optical waveguide devices. The atomic fraction of nitrogen in $SiO_xN_y$ films was controlled by varying the relative flow ratio of nitrogen gas in reactive sputtering and was evaluated optically using an effective medium theory with Bruggeman geometry consisting of a random mixture between $SiO_2$ and $Si_3N_4$. The Au nanoparticles were embedded in the $SiO_xN_y$ matrix by employing the alternating deposition technique and clearly showed an absorption peak due to the excitation of surface plasmon. With increasing nitrogen atomic fraction in the matrix, the surface plasmon resonance wavelength shifted to a longer wavelength (a red-shift) with an enhanced resonance absorption. These characteristics were interpreted using the Maxwell-Garnett effective medium theory. The formation of a guided mode in a slab waveguide consisting of 3 $\mu$m thick Au:$SiO_xN_y$ nanocomposite film was confirmed at the telecommunication wavelength of 1550 nm by prism coupler method and compared with the case of using $SiO_2$ matrix. The use of $SiO_xN_y$ matrix provides an effective way of controlling the mode confinement while maintaining or even enhancing the surface plasmon resonance properties.

• 한국광학회지
• /
• 제18권3호
• /
• pp.185-189
• /
• 2007

평판형 AWG(Arrayed Waveguide Grating) 기술을 이용한 새로운 CWDM(Coarse Wavelength Division Multiplexer) 소자의 제작기술을 제안한다. 슬랩 도파로 입력단에 나팔형태를 갖는 도파로에 대하여 광전파방법(BPM)에 의한 전산모사 결과와 투과대역이 평탄화된 20 nm 간격의 CWDM 소자의 제작 결과를 보고한다. $0.75{\triangle}%$의 박막을 사용하였으며, 소자의 삽입손실은 가우시안 형태에 대하여 3.5 dB와 평탄화된 형태에 대하여 4.8 dB를 각각 얻었으며, 3 dB 대역폭은 각각 10 nm 및 13 nm 이상의 결과를 얻었다.

• 한국통신학회논문지
• /
• 제8권4호
• /
• pp.164-171
• /
• 1983

본 논문에서는 비교적 짧은 계단형 멀티모우드 광섬유를 이용하여 여러 정보의 채널을 전송하는 광멀티플렉싱 기술인 각도분할방식(ADM: Angular Division Multiplexing)에 대해 논하였다. 평면파 입력에 대한 광섬유 내의 모우드 결합과 출력 파워 분포가 계산되었으며 시스템의 혼신도 결정이 제시되었다. 모우드 결합 하에서 광섬유의 길이와 입력조건에 따른 펄스폭이 평면 도파판과 광섬유에 대해 비교, 계산되었다. NA(Numerical Aperture)아래의 입력각에 대한 각도폭은 입력각이 클수록 줄어들었으며 출력은 입력각에 파워가 집중된 환형으로 나타났으며 이는 ADM시스템의 중요한 요인이 되었다.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
• /
• pp.976-979
• /
• 2002

A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control' writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm), To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and $0.5{\times}0.5mm^2$ area, respectively, This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolpution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

• 한국광학회:학술대회논문집
• /
• 한국광학회 2000년도 하계학술발표회
• /
• pp.28-29
• /
• 2000

Optical power splitters and/or couplers are important components for optical signal distribution between channels both in wavelength division multiplexing(WDM) systems and photonic integrated circuits(PICs). Since polarization is usually not known after propagation in an optical fiber, passive WDM components have to be polarization insensitivity, Compared to alternatives such as directional couplers or Y-junction splitters, splitters based on multimode interference(MMI) have found a growing interest in recent yens because of their desirable characteristics, such as compact size, low excess loss, wide bandwidth, polarization independence, and relaxed fabrication tolerances$^{(1)}$ . These devices have been fabricated in polymers, silica, or III-V semiconductor materials. A1 $\times$ 4 MMI power splitter on InP materials that were suitable for application in the 1.55-${\mu}{\textrm}{m}$ region$^{(2)}$ . However, the fabrication process of the structure is too complicated and the photolithography tolerance is very tight. Also, a 1 $\times$ 16 InGaAsP/InP MMI power splitter with an excess loss of 2.2dB and a splitting ratio of 1.5dB was demonstrated by using deep etching$^{(3)}$ . The deep etching of the sidewalls through the entire guide layer of the slab waveguide resulted in a number of drawbacks$^{(4)}$ . (omitted)

• Transactions on Electrical and Electronic Materials
• /
• 제3권1호
• /
• pp.30-37
• /
• 2002

A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control'writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm). To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and 0.5 $\times$ 0.5 mm$^2$area, respectively. This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.