Korean Journal of Optics and Photonics (한국광학회지)

Optical Society of Korea (한국광학회)
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Performance of CWDM Fabricated by the PLC-AWG Technology

평판형 AWG 기술을 이용한 광대역 파장다중화/역다중화 소자의 제작 및 특성

  • Moon, H.M. (Photonics Planar Integration Technology Inc.) ;
  • Kwak, S.C. (Photonics Planar Integration Technology Inc.) ;
  • Hong, J.Y. (Photonics Planar Integration Technology Inc.) ;
  • Lee, K.H. (Photonics Planar Integration Technology Inc.) ;
  • Kim, D.H. (Photonics Planar Integration Technology Inc.) ;
  • Kim, J.J. (Photonics Planar Integration Technology Inc.) ;
  • Choi, S.Y. (Photonics Planar Integration Technology Inc.) ;
  • Lee, J.G. (Photonics Planar Integration Technology Inc.) ;
  • Lee, J.H. (Photonics Planar Integration Technology Inc.) ;
  • Lim, K.G. (Department of Phusics, Channam National University) ;
  • Kim, J.B. (Faculty of Applied Chemical Engineering, Channam National University)
  • Published : 2007.06.25
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Abstract

A novel technology for CWDM (Coarse Wavelength Division Multiplexer) utilizing a PLC (Planar Lightwave Circuit)-AWG (Arrayed Waveguide Grating) fabrication process is proposed. BPM (Beam Propagation Method) Simulation results on the employed parabolic-horn-type input slab waveguide of AWG and the performance of the 20 nm-channel spacing CWDM with flattened passband are presented. Waveguides of $0.75{\triangle}%$ have been used in this experiment and the insertion loss at the peak wavelength is 3.5 dB for a Gaussian spectrum and is 4.8 dB for a flat-top spectrum. The bandwidth at 3 dB is better than 10 nm and 13 nm for Gaussian and flat-top spectra, respectively.

평판형 AWG(Arrayed Waveguide Grating) 기술을 이용한 새로운 CWDM(Coarse Wavelength Division Multiplexer) 소자의 제작기술을 제안한다. 슬랩 도파로 입력단에 나팔형태를 갖는 도파로에 대하여 광전파방법(BPM)에 의한 전산모사 결과와 투과대역이 평탄화된 20 nm 간격의 CWDM 소자의 제작 결과를 보고한다. $0.75{\triangle}%$의 박막을 사용하였으며, 소자의 삽입손실은 가우시안 형태에 대하여 3.5 dB와 평탄화된 형태에 대하여 4.8 dB를 각각 얻었으며, 3 dB 대역폭은 각각 10 nm 및 13 nm 이상의 결과를 얻었다.

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References

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