The Properties of Atomic Layer Deposited Al-Doped ZnO Films Using H2O and O3 As Oxidants (H2O, O3 반응기체로 원자층 증착된 Al-doped ZnO 박막의 특성)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.28 no.10
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- pp.652-657
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- 2015