• Title/Summary/Keyword: resist development

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Development of Analytical Model to Predict The Inelastic Behavior of Reinforced Concrete And Masonry Structures (RC 및 조적조구조물의 비탄성 거동예측을 위한 해석적 모델개발)

  • 홍원기;이호범;변근주
    • Proceedings of the Korea Concrete Institute Conference
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    • 1993.04a
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    • pp.160-167
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    • 1993
  • In earthquake structural engineering towards a better understanding of both the earthquake ground motion and structural response, the design of concrete structures to resist strong ground input motions is not a simple matter, and analytical models for such structures must be developed from a design perspective that accounts for the complexities of the structural responses. The primary objective earthquake structural engineering research is to ensure the safety of structures by understanding and improving a design menthodology. Ideally, this would require the development of an analytical model related to a design methodology that ensures a dectile performance. For the accurate assessment of the adequacy of analytically developed model, experiments conducted to study the inplane inelastic cyclic behavior of structures should verify the analytical approach. The paper is to demonstrate experimentally verified analytical method that provide the adequate degree of safety and confidience in the behavior of R.C. structural components and further attempts to extend the developed modeling technique for use by practicing structural engineers.

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Development and Performance Evaluation of Floor Level Joint System (다목적 바닥 레벨조인트 공법의 개발 및 성능평가에 관한 연구)

  • 최윤철;서수연;지남용;이리형
    • Proceedings of the Korea Concrete Institute Conference
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    • 2002.05a
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    • pp.953-958
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    • 2002
  • The finishing method of concrete floor using automatic surface finisher is one of new technologies in concrete floor construction. The development of high technologies in construction will increase in order to satisfy the demand to construct high quality building. Using this method, it is possible to increase the quality of building as well as to reduce the labor work in site. In this paper, a system which can be used to finish the concrete floor using automatic surface finisher, is presented and its structural capacities are evaluated. The system is composed of rail which guides the surface vibrator and absorbs the volume change of concrete, and a device supporting the rail. From the experimental work for these devices, it was shown that the support and rail had suitable strength to resist the automatic surface finisher. For design purpose, also, effective span of supports was tabulated.

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Fabrication of wide-head T-gate with 0.2 ${\mu}{\textrm}{m}$ gate length using E-beam lithography for MIMIC applications. (전자선 묘화를 이용한 0.2 ${\mu}{\textrm}{m}$의 게이트 길이를 갖는 MIMIC용 Wide-Head T-gate 제작)

  • 전병철;박덕수;신재완;양성환;박현창;이진구
    • Proceedings of the IEEK Conference
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    • 1999.11a
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    • pp.187-190
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    • 1999
  • We have developed fabrication processes that form a wide-head T-gate with a 0.2 ${\mu}{\textrm}{m}$ gate length using the combination of thickness of each PMMA layer, line doses and development times for applications in millimeter- and micro-waves monolithic integrated circuits. The three-layer resist structure (PMMA/P(MMA-MAA)/PMMA = 1800 $\AA$/5800 A/1900$\AA$), 4nC/cm and over development were used for fabrication of a wide-head T-gate by the conventional double E-beam exposure technology. The experimented results show that the cross sectional area of T-gate fabricated by the proposed method is easily enlarged without additional processes.

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Biochemical and Drug Susceptibility Test of Pseudomonas aeruginosa Isolated from Diseased Chicken (병계(病鷄)로부터 분리(分離)한 Pseudomonas aeruginosa의 생화학적(生化學的) 성상(性狀)과 항균성(抗菌性) 약제내성(藥劑耐性))

  • Kim, Ki-Seuk;Namgoong, Sun;Mo, In-Pil;Park, Keun-Sik;Oh, Kyoung-Rok
    • Korean Journal of Veterinary Research
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    • v.22 no.2
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    • pp.161-165
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    • 1982
  • Biochemical and antimicrobial susceptibility tests were conducted on 40 strains of Pseudomonas aeruginosa originated from diseased chicken submitted for diagnosis to this Institute during 1978-80. An extensive study of the biochemical properties revealed that the tested strains can be identified with Pseudomonas aeruginosa. Antibiogram showed that all the strains were susceptible to gentamicin, colistin and amikacin but resist to nitrofurantoin, trimethoprim+sulfamethoxazole, ampicillin, methicillin and kanamycin, and had varing degreed of resistance to other antimicrobials including carbenicillin, sulfomamides, neomycin, streptomycin, tetracycline and chloramphenicol. Three of the most frequent resitance patterns observed were FM SXT AM ME KM CM TC SM NE SSS Pattern, FM SXT AM ME KM CM TC SM NE SSS CB Pattern and FM SXT AM EKM CM TC SM Pattern, and these resistance patterns contained 72.5% of the tested strains.

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Termite Resistance of Impregnated Jabon Wood (Anthocephalus Cadamba Miq.) with Combined Impregnant Agents

  • Arsyad, Wa Ode Muliastuty;Basri, Efrida;Hendra, Djeni;Trisatya, Deazy Rachmi
    • Journal of the Korean Wood Science and Technology
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    • v.47 no.4
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    • pp.451-458
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    • 2019
  • Jabon (Anthocephalus cadamba Miq.) is a fast-growing species that exhibits a lower natural resistance than that exhibited by the timber sourced from natural forests. Jabon's resistance to termite attack can be improved by impregnating its wood structure with poisonous organic materials. This study examined jabon's resistance to termite attack when impregnated with wood vinegar and an animal adhesive. The wood specimens were impregnated using sengon wood vinegar and an animal adhesive (8% and 10%, respectively) using a vacuum pressure machine. The specimens were tested for their resistance to subterranean and dry-wood termites according to Indonesian National Standard (SNI 7207-2014). The results denoted that jabon impregnated with wood vinegar and an animal adhesive concentration of at least 8% with the addition of 4% borate was effective to resist termite attacks. The impregnated jabon exhibited a lower weight loss and higher termite mortality when compared with those exhibited by the control specimens. Thus, the resistance class improved from class IV to class I.

Development of Schottky Diode for THz Applications using Heterogeneous Resist Patterning (이종 레지스트 패터닝을 이용한 테라헤르츠용 쇼트키 다이오드 개발)

  • Han, Min;Choi, Seok-Gyu;Lee, Sang-Jin;Baek, Tae-Jong;Ko, Dong-Sik;Kim, Jung-Il;Kim, Geun-Ju;Jeon, Seok-Gy;Yoon, Jin-Seob;Rhee, Jin-Koo
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.49 no.8
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    • pp.47-54
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    • 2012
  • In this paper, we have fabricated the Schottky diode for THz applications by heterogeneous resist patterning method. The Schottky diode was developed using electron beam lithography and photolithography to connect the anode and the anode pad for a simple process. The measured performance of developed Schottky diode are $11.2{\Omega}$ of series resistance, 25.96 fF of junction capacitance, 1.25 of ideality factor and 547.6 GHz of cut-off frequency.

Micropatterning by Low-Energy Focused ton Beam Lithography(FIBL) (저에너지 집속이온빔리소그라피(FIBL)에 의한 미세패턴 형성)

  • 이현용;김민수;정홍배
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1995.11a
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    • pp.224-227
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    • 1995
  • The micro-patterning by a Bow energy FIB whish has been conventionally utilized far mask-repairing was investigated. Amorphous Se$\_$75/Gee$\_$25/ resist irradiated by 9[keV]-defocused Ga$\^$+/ ion beam(∼10$\^$15/[ions/$\textrm{cm}^2$]) resulted in increasing the optical absorption, which was also observed also in the film exposed by an optical dose of 4.5${\times}$10$\^$20/[photons/$\textrm{cm}^2$]. The ∼0.3[eV] edge shift for ion-irradiated film was about twice to that obtained for photo-exposed. These large shift could be estimated as due to an increase in disorder from the decrease in the sloop of the Urbach tail. For Ga$\^$+/ FIB irradiation with a relatively low energy, 30[keV] and above the amount of dose of 1.4${\times}$10$\^$16/[ions/$\textrm{cm}^2$], the irradiated region in a-Se$\_$75/Ge$\_$25/ resist was perfectly etched in acid solution for 10[sec], which is relatively a short development time. A contrast was about 2.5. In spite of the relatively low incident energy,∼0.225[$\mu\textrm{m}$] pattern was clearly obtained by the irradiation of a dose 6.5${\times}$10$\^$16/[ions/$\textrm{cm}^2$] and a scan diameter 0.2[$\mu\textrm{m}$], from which excellent results were expected fur incident energies above 50[keV] which was conventionally used in FIBL.

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Fabrication of Sub-Micron Size $Al-AlO_x-Al$ Tunnel Junction using Electron-Beam Lithography and Double-Angle Shadow Evaporation Technique (전자빔 패터닝과 double-angle 그림자 증착법을 이용한 sub-micron 크기의 $Al-AlO_x-Al$ 터널접합 제작공정개발)

  • Rehmana, M.;Choi, J.W.;Ryu, S.J.;Park, J.H.;Ryu, S.W.;Khim, Z.G.;Song, W.;Chong, Y.
    • Progress in Superconductivity
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    • v.10 no.2
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    • pp.99-102
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    • 2009
  • We report our development of the fabrication process of sub-micron scale $Al-AlO_x-Al$ tunnel junction by using electron-beam lithography and double-angle shadow evaporation technique. We used double-layer resist to construct a suspended bridge structure, and double-angle electron-beam evaporation to form a sub-micron scale overlapped junction. We adopted an e-beam insensitive resist as a bottom sacrificing layer. Tunnel barrier was formed by oxidation of the bottom aluminum layer between the bottom and top electrode deposition, which was done in a separate load-lock chamber. The junction resistance is designed and controlled to be 50 $\Omega$ to match the impedance of the transmission line. The junctions will be used in the broadband shot noise thermometry experiment, which will serve as a link between the electrical unit and the thermodynamic unit.

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The role of the People's Liberation Army during the Korean War and Prospect of China's Role in the event of Contingency in North Korea (6.25 전쟁 시 중공군의 역할과 북한 유사시 중국의 역할 전망)

  • Choi, Kyung-Sik
    • Journal of National Security and Military Science
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    • s.8
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    • pp.169-238
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    • 2010
  • The year 2010 is the 60th anniversary commemorating the Korean War. China intervened in the Korean War with the logics such as "To Resist the U.S.'s Aggression and Aid North Korea," "Save Endangered Home & defend Nation," and "If the Lips Are Gone, the Teeth Will Be Exposed to the Cold or If One of Them Falls, the Other is in Danger." However, China had a deep and long connection with North Korea through 1st Chinese Civil War, war against Japan imperialism, and 2nd Chinese Civil War. China has consulted with Kim Il-sung on his invasion of South Korea at the initial stage of development and played a casting vote role in the execution of the invasion plan. During the Korean War, the PLA supported the North Korea's regime by its action, and made the Korea Peninsula divide into two semi-permanently. Even after the war, China continues to maintain relations with North Korea by helping North Korea build the Kim Il-sung's Kingdom. Currently, whenever any issue related to North Korea rises in the international society, China definitely gets involved in those issues and exercises its power. Conditionally 'either armed aggression or, and wartime' in North Korea, China would follow the "Clause of Military Auto Intervention." In addition, China is very likely to establish refugee camps for North Koreans in the Northeastern-Three-Province and to provide rear bases or guerrilla camps for pro-Chinese sects. Furthermore, voluntarily playing a role as spokesman of North Korean Regime in the international society, China will exercise enormous influence on the reunification of the Korean Peninsula.

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Analysis of issues in gate recess etching in the InAlAs/InGaAs HEMT manufacturing process

  • Byoung-Gue Min;Jong-Min Lee;Hyung Sup Yoon;Woo-Jin Chang;Jong-Yul Park;Dong Min Kang;Sung-Jae Chang;Hyun-Wook Jung
    • ETRI Journal
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    • v.45 no.1
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    • pp.171-179
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    • 2023
  • We have developed an InAlAs/InGaAs metamorphic high electron mobility transistor device fabrication process where the gate length can be tuned within the range of 0.13㎛-0.16㎛ to suit the intended application. The core processes are a two-step electron-beam lithography process using a three-layer resist and gate recess etching process using citric acid. An electron-beam lithography process was developed to fabricate a T-shaped gate electrode with a fine gate foot and a relatively large gate head. This was realized through the use of three-layered resist and two-step electron beam exposure and development. Citric acid-based gate recess etching is a wet etching, so it is very important to secure etching uniformity and process reproducibility. The device layout was designed by considering the electrochemical reaction involved in recess etching, and a reproducible gate recess etching process was developed by finding optimized etching conditions. Using the developed gate electrode process technology, we were able to successfully manufacture various monolithic microwave integrated circuits, including low noise amplifiers that can be used in the 28 GHz to 94 GHz frequency range.