• Title/Summary/Keyword: projected range

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Analysis on Subthreshold Swing of Asymmetric Junctionless Double Gate MOSFET for Parameters for Gaussian Function (가우스 함수의 파라미터에 따른 비대칭형 무접합 이중 게이트 MOSFET의 문턱전압 이하 스윙 분석)

  • Jung, Hakkee
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.35 no.3
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    • pp.255-263
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    • 2022
  • The subthreshold swing (SS) of an asymmetric junctionless double gate (AJLDG) MOSFET is analyzed by the use of Gaussian function. In the asymmetric structure, the thickness of the top/bottom oxide film and the flat-band voltages of top gate (Vfbf) and bottom gate (Vfbb) could be made differently, so the change in the SS for these factors is analyzed with the projected range and standard projected deviation which are parameters for the Gaussian function. An analytical subthreshold swing model is presented from the Poisson's equation, and it is shown that this model is in a good agreement with the numerical model. As a result, the SS changes linearly according to the geometric mean of the top and bottom oxide film thicknesses, and if the projected range is less than half of the silicon thickness, the SS decreases as the top gate oxide film is smaller. Conversely, if the projected range is bigger than a half of the silicon thickness, the SS decreases as the bottom gate oxide film is smaller. In addition, the SS decreases as Vfbb-Vfbf increases when the projected range is near the top gate, and the SS decreases as Vfbb-Vfbf decreases when the projected range is near the bottom gate. It is necessary that one should pay attention to the selection of the top/bottom oxide thickness and the gate metal in order to reduce the SS when designing an AJLDG MOSFET.

The Analysis of Breakdown Voltage for the Double-gate MOSFET Using the Gaussian Doping Distribution

  • Jung, Hak-Kee
    • Journal of information and communication convergence engineering
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    • v.10 no.2
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    • pp.200-204
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    • 2012
  • This study has presented the analysis of breakdown voltage for a double-gate metal-oxide semiconductor field-effect transistor (MOSFET) based on the doping distribution of the Gaussian function. The double-gate MOSFET is a next generation transistor that shrinks the short channel effects of the nano-scaled CMOSFET. The degradation of breakdown voltage is a highly important short channel effect with threshold voltage roll-off and an increase in subthreshold swings. The analytical potential distribution derived from Poisson's equation and the Fulop's avalanche breakdown condition have been used to calculate the breakdown voltage of a double-gate MOSFET for the shape of the Gaussian doping distribution. This analytical potential model is in good agreement with the numerical model. Using this model, the breakdown voltage has been analyzed for channel length and doping concentration with parameters such as projected range and standard projected deviation of Gaussian function. As a result, since the breakdown voltage is greatly changed for the shape of the Gaussian function, the channel doping distribution of a double-gate MOSFET has to be carefully designed.

Threshold Voltage Shift for Doping Profile of Asymmetric Double Gate MOSFET (도핑분포함수에 따른 비대칭 이중게이트 MOSFET의 문턱전압이동현상)

  • Jung, Hakkee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.19 no.4
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    • pp.903-908
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    • 2015
  • This paper has analyzed threshold voltage shift for doping profile of asymmetric double gate(DG) MOSFET. Ion implantation is usually used in process of doping for semiconductor device and doping profile becomes Gaussian distribution. Gaussian distribution function is changed for projected range and standard projected deviation, and influenced on transport characteristics. Therefore, doping profile in channel of asymmetric DGMOSFET is affected in threshold voltage. Threshold voltage is minimum gate voltage to operate transistor, and defined as top gate voltage when drain current is $0.1{\mu}A$ per unit width. The analytical potential distribution of series form is derived from Poisson's equation to obtain threshold voltage. As a result, threshold voltage is greatly changed by doping profile in high doping range, and the shift of threshold voltage due to projected range and standard projected deviation significantly appears for bottom gate voltage in the region of high doping concentration.

Conduction Path Dependent Threshold Voltage for the Ratio of Top and Bottom Oxide Thickness of Asymmetric Double Gate MOSFET (비대칭 이중게이트 MOSFET의 상하단 산화막 두께비에 따른 전도중심에 대한 문턱전압 의존성)

  • Jung, Hakkee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.18 no.11
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    • pp.2709-2714
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    • 2014
  • This paper has analyzed the change of threshold voltage and conduction path for the ratio of top and bottom gate oxide thickness of asymmetric double gate MOSFET. The asymmetric double gate MOSFET has the advantage that the factor to be able to control the current in the subthreshold region increases. The analytical potential distribution is derived from Poisson's equation to analyze the threshold voltage and conduction path for the ratio of top and bottom gate oxide thickness. The Gaussian distribution function is used as charge distribution. This analytical potential distribution is used to derive off-current and subthreshold swing. By observing the results of threshold voltage and conduction path with parameters of bottom gate voltage, channel length and thickness, projected range and standard projected deviation, the threshold voltage greatly changed for the ratio of top and bottom gate oxide thickness. The threshold voltage changed for the ratio of channel length and thickness, not the absolute values of those, and it increased when conduction path moved toward top gate. The threshold voltage and conduction path changed more greatly for projected range than standard projected deviation.

3D Range Measurement using Infrared Light and a Camera (적외선 조명 및 단일카메라를 이용한 입체거리 센서의 개발)

  • Kim, In-Cheol;Lee, Soo-Yong
    • Journal of Institute of Control, Robotics and Systems
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    • v.14 no.10
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    • pp.1005-1013
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    • 2008
  • This paper describes a new sensor system for 3D range measurement using the structured infrared light. Environment and obstacle sensing is the key issue for mobile robot localization and navigation. Laser scanners and infrared scanners cover $180^{\circ}$ and are accurate but too expensive. Those sensors use rotating light beams so that the range measurements are constrained on a plane. 3D measurements are much more useful in many ways for obstacle detection, map building and localization. Stereo vision is very common way of getting the depth information of 3D environment. However, it requires that the correspondence should be clearly identified and it also heavily depends on the light condition of the environment. Instead of using stereo camera, monocular camera and the projected infrared light are used in order to reduce the effects of the ambient light while getting 3D depth map. Modeling of the projected light pattern enabled precise estimation of the range. Identification of the cells from the pattern is the key issue in the proposed method. Several methods of correctly identifying the cells are discussed and verified with experiments.

An analysis of the ion penetration phenomena in amorphous $Se_{75}Ge_{25}$ thin film (비정질 $Se_{75}Ge_{25}$박막으로의 이온침투 현상 해석)

  • 이현용;정홍배
    • Electrical & Electronic Materials
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    • v.7 no.5
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    • pp.389-396
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    • 1994
  • The bilayer film of Ag/a-S $e_{75.G}$ $e_{25}$ and the monolayer film of a-S $e_{75.G}$ $e_{25}$ act as a negative-type and a positive-type resist in focused ion beam lithography, respectively. Using a model which takes into account the ion stopping power, the ion projected range, the ion concentration implanted into resists and the ion transmission coefficient, etc., the ion resist parameters are calculated for a broad range of ion energies and implanted doses. Ion sources of A $r^{+}$, S $i^{++}$ and G $a^{+}$ are used to expose resists. As the calculated results, the energy loss per unit distance by Ga'$^{+}$ ion is about 10$^{3}$[keV/.mu.M] and nearly constant for all energy range. Especially, the projected range and struggling for 80[keV] G $a^{+}$ ion energy are 0.0425[.mu.m] and 0.020[.mu.m], , respectively and the resist thickness of a-S $e_{75}$ G $e_{25}$ to minimize the ion penetration rate into a substrate is 0.118[.mu.m].u.m]..u.m].

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Analysis of Subthreshold Swing for Oxide Thickness and Doping Distribution in DGMOSFET (산화막두께 및 도핑분포에 대한 DGMOSFET의 문턱전압이하 스윙분석)

  • Jung, Hak-Kee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.15 no.10
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    • pp.2217-2222
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    • 2011
  • In this paper, the relationship of potential and charge distribution in channel for double gate(DG) MOSFET has been derived from Poisson's equation using Gaussian function. The relationship of subthreshold swing and oxide thickness has been investigated according to variables of doping distribution using Gaussian function, i.e. projected range and standard projected deviation, The analytical potential distribution model has been derived from Poisson's equation, and subthreshold swing has been obtained from this model for the change of oxide thickness. The subthreshold swing has been defined as the derivative of gate voltage to drain current and is theoretically minimum of 60 mS/dec, and very important factor in digital application. Those results of this potential model are compared with those of numerical simulation to verify this model. As a result, since potential model presented in this paper is good agreement with numerical model, the relationship of subthreshold swing and oxide thickness have been analyzed according to the shape of doping distribution.

Interaction between Oxygens and Secondary Defects Induced in Silicon by High Energy $B^+$Ion Implantation and Two-Step Annealing

  • Yoon, Sahng-Hyun;Jeon, Joon-Hyung;Kim, Kwang-Tea;Kim, Hyun-Hoo;Park, Chul-Hyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.185-186
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    • 2005
  • Intrinsic gettering is usually used to improve wafer quality which is an important factor for reliable ULSI devices. The two-step annealing method was adopted in order to investigate interactions between oxygens and secondary defects during oxygen precipitation process in lightly and heavily boron doped silicon wafers with high energy $^{11}B^+$ ion implantation. Secondary defects were inspected nearby the projected range by high resolution transmission electron microscopy. Oxygen pileup was measured in the vicinity of the projected range by secondary ion mass spectrometry for heavily boron doped silicon wafers.

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3D Environment Perception using Stereo Infrared Light Sources and a Camera (스테레오 적외선 조명 및 단일카메라를 이용한 3차원 환경인지)

  • Lee, Soo-Yong;Song, Jae-Bok
    • Journal of Institute of Control, Robotics and Systems
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    • v.15 no.5
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    • pp.519-524
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    • 2009
  • This paper describes a new sensor system for 3D environment perception using stereo structured infrared light sources and a camera. Environment and obstacle sensing is the key issue for mobile robot localization and navigation. Laser scanners and infrared scanners cover $180^{\circ}$ and are accurate but too expensive. Those sensors use rotating light beams so that the range measurements are constrained on a plane. 3D measurements are much more useful in many ways for obstacle detection, map building and localization. Stereo vision is very common way of getting the depth information of 3D environment. However, it requires that the correspondence should be clearly identified and it also heavily depends on the light condition of the environment. Instead of using stereo camera, monocular camera and two projected infrared light sources are used in order to reduce the effects of the ambient light while getting 3D depth map. Modeling of the projected light pattern enabled precise estimation of the range. Two successive captures of the image with left and right infrared light projection provide several benefits, which include wider area of depth measurement, higher spatial resolution and the visibility perception.

An Efficient Processing of Continuous Range Queries on High-Dimensional Spatial Data (고차원 공간 데이터를 위한 연속 범위 질의의 효율적인 처리)

  • Jang, Su-Min;Yoo, Jae-Soo
    • Journal of KIISE:Computing Practices and Letters
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    • v.13 no.6
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    • pp.397-401
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    • 2007
  • Recent applications on continuous queries on moving objects are extended quickly to various parts. These applications need not only 2-dimensional space data but also high-dimensional space data. If we use previous index for overlapped continuous range queries on high-dimensional space data, as the number of continuous range queries on a large number of moving objects becomes larger, their performance degrades significantly. We focus on stationary queries, non-exponential increase of storage cost and efficient processing time for large data sets. In this paper, to solve these problems, we present a novel query indexing method, denoted as PAB(Projected Attribute Bit)-based query index. We transfer information of high-dimensional continuous range query on each axis into one-dimensional bit lists by projecting technique. Also proposed query index supports incremental update for efficient query processing. Through various experiments, we show that our method outperforms the CES(containment-encoded squares)-based indexing method which is one of the most recent research.