• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 추계학술대회 논문집 학회본부
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• pp.438-440
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• 1995

The impedance characteristics and plasma parameters were experimentally studied in a weakly magnetized planar type, inductively coupled plasma (ICP) system. Compared with non-magnetized for system higher power transfer efficiency, stable impedance matching, enhancement of plasma density and higher electron temperature can be obtained. Such improvements are mainly due to the excitation of deeply penetrating electromagnetic wave and reduction of radial loss of electrons. In particulary, $SF_6$ (sulfur hexafluride) plasma shows unstable impedance matching in non-magnetized ICP because electronegativity of $SF_6$ effects on plasma characteristics. But, magnetized inductively coupled $SF_6$ plasma shows enough impedance matching stability to be applicable to the polysilicon etching in semiconductor process.

• 대한전기학회논문지
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• 제39권11호
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• pp.1219-1226
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• 1990

This paper is to report the results on the design and construction of a thermal plasma generator with high current DC source. Also, this paper presents the methods to stabilize plasma and to find effects of process variables on plasma characteristics. For this purpose, the reaction chamber, vacuum system, plasma generating torch, magnetic field generating coil with power supply, high current DC source and the other parts have been designed. Fundamental properties of the thermal plasma under various conditions have been measured and analyzed. Magnetic Reynolds Number has been introduced to explain the relationship between plasma and external magnetic field. Through this number, the effect of magnetic field on the plasma has been explained under various flow rates and pressure. A sudden increase in the plasma voltage has been observed with the increase of magnetic field. From this, fundamental changes in plasma flow are believed to occur at the nozzle, and an effort to explain the phenomenon has been tried.

• 전자공학회논문지A
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• 제33A권11호
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• pp.44-51
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• 1996

The radiation characteristics of a slot antenna in a plane conductor covered with a miving isotropic plasma layer are analyzed. The radiation null which causes distortion in radiation pattern is explainted by the zero of integrand in an asymptotic integral for radiation fields as a function of the plasma parameter and the plasma velocity. Numerical resutls for a radiation null calculated from various plasma and velocity parameters correspond to the results of two-dimensional problem.

• Journal of Magnetics
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• 제21권2호
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• pp.222-228
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• 2016

Correlation between coil configurations and the discharge characteristics such as plasma density and the electron temperature in a newly designed magnetized inductively coupled plasma (M-ICP) etcher were investigated. Radial and axial magnetic flux density distributions as well as the magnetic flux density on the center of the substrate holder were controllable by placing multiple circular coils around the etcher. The plasma density increased up to 60.7% by arranging coils (or optimizing magnetic flux density distributions inside the etcher) properly although the magnetic flux density on the center of the substrate holder was fixed at 7 Gauss.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 춘계학술대회
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• pp.1736-1741
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• 2003

The characteristics plasma flow of an atmospheric plasma torch used for thermal plasma processing is studied. In general, it is produced by the arc-gas interactions between a cathode tip and an anode nozzle. The performance of non-transferred plasma torch is significantly dependent on jet flow characteristics out of the nozzle. In this work, the distribution of gas flow that goes out to the atmosphere through a plenum chamber and nozzle is analyzed to evaluate the performance of atmospheric plasma torch. Numerical analysis is carried out with various angles of an inlet flow which can create different swirl flow fields. Moreover, the size of plasma plume is experimentally depicted.

• 한국표면공학회지
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• 제37권6호
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• pp.313-318
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• 2004

Vertically-aligned and uniformly-distributed CuO nanowires were formed on copper-coated Si substrates by wet chemical process, immersing them in a hot alkaline solution. The effects of hydrogen plasma treatment on the field emission characteristics of CuO nanowires were investigated. It was found that hydrogen plasma treatment enhanced the field emission properties of CuO nanowires by showing a decrease in turn-on voltage, and an increase in emission current density, and stability of current-voltage curves. However, the excessive hydrogen plasma treatment made the I-V curves unstable. It was confirmed by XPS (X-ray Photoelectron Spectroscopy) analysis that hydrogen plasma treatment deoxidized CuO nanowires, thereby the work function of the nanowires decreased from 4.35 eV (CuO) to 4.1 eV (Cu). It is thought that the decrease in the work function enhanced the field emission characteristics. It is well-known that the lower the work function, the better the field emission characteristics. The results suggest that the hydrogen plasma treatment is very effective in achieving enhanced field emission properties of the CuO nanowires, and there may exist an optimal hydrogen plasma treatment condition.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1997년도 하계학술대회 논문집 C
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• pp.1270-1273
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• 1997

We have investigated the latchup characteristics of BL/BILLI retrograde twin well CMOS that has the high energy ion implanted buried layer to intend for more improvement of latchup compare to conventional retrograde well and BILLI structures. We explored the dependence of various latchup characteristics such as n+ trigger latchup and p+ trigger latchup on the buried layer implant doses. We show various DC latchup characteristics that allow us to evaluate each technology and suggest guidelines for the reduction of latchup susceptibility.

• 전기의세계
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• 제21권4호
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• pp.27-38
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• 1972

This paper discusses the characteristics about the ignition of D.C. main discharge is a plasma jet generator, manufactured for trial as non-transferred type, when the electrical energy appropriate to the ignition is supplied to the gap between the electrodes by using advance discharge of attenuating high frequency voltage generated by a high frequency oscillator with mercury spark gap. These characteristics are under the influences of (a) the length of mercury gap in high frequency oscillator and the quantity of hydrogen flow supplied to it, (b) the condenser capacity of the high frequency oscillator circuit, (c) the length of plasma jet torch in D.C. main discharge circuit and the quantity of argon flow supplied to it, (d) the circuit constants of D.C. main discharge circuit. The results for these characteristics, obtained by this research, are considered to be helpful to the designs for the ignition of a plasma jet as well as the welding arc stabilizer by high frequency discharge and the high frequency arc welder.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2000년도 하계종합학술대회 논문집(2)
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• pp.302-305
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• 2000

It is important to control the electron energy distribution to have high quality plasma process. A conventional inductively coupled plasma(ICP) source with 13.56MHz power is not adequate for low damage sub-half micron patterning process due to higher electron temperature. Only the pulsed plasma technique seems to provide low electron temperature, and thus low process damage. Recently, a novel method proposed by us, named as ‘Enhanced-ICP’, which uses periodic weak axial magnetic field added to a normal ICP source, has shown great improvement in etch characteristics. changes of plasma characteristics according to the frequency of time-varying axial magnetic field have been observed by probe-time-averaged Langmuir probe.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.324-325
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• 2008

In this Study, We fabricated a plasma discharge cluster with external electrodes which can be applied to flexible backlight in a polymer substrate and investigated the discharge characteristics. The Sealing process was progressed in vacuum chamber, which enable to fabricate plasma discharge cluster. The results of discharge characteristics show that the static memory margin of plasma discharge cluster was increased, as Ne/Xe(5%) gas pressure was increased. also, When gas pressure was 100torr at 600um of electrode gap, we have obtained high luminance of a plasma discharge cluster.