Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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The Properties of Weakly Magnetized Planar Type Inductively Coupled $SF_6$ Plasma

자화된 평판형 유도 결합 $SF_6$ 플라즈마의 특성

  • Yoon, Cha-Keun (Plasma Lab., Electrical Engineering Dep., Seoul National University) ;
  • Doh, Hyun-Ho (Plasma Lab., Electrical Engineering Dep., Seoul National University) ;
  • Whang, Ki-Woong (Plasma Lab., Electrical Engineering Dep., Seoul National University)
  • Published : 1995.11.18
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Abstract

The impedance characteristics and plasma parameters were experimentally studied in a weakly magnetized planar type, inductively coupled plasma (ICP) system. Compared with non-magnetized for system higher power transfer efficiency, stable impedance matching, enhancement of plasma density and higher electron temperature can be obtained. Such improvements are mainly due to the excitation of deeply penetrating electromagnetic wave and reduction of radial loss of electrons. In particulary, $SF_6$ (sulfur hexafluride) plasma shows unstable impedance matching in non-magnetized ICP because electronegativity of $SF_6$ effects on plasma characteristics. But, magnetized inductively coupled $SF_6$ plasma shows enough impedance matching stability to be applicable to the polysilicon etching in semiconductor process.

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