• 제목/요약/키워드: p-Type semiconductor

검색결과 420건 처리시간 0.03초

초음파 합성 적용 Cu2O-TiO2 (P-N 타입) 반도체 나노물질의 가시광 활성 평가 (Evaluation of Visible-light activation of Cu2O-TiO2 (P-N type) Semiconductor Nanomaterials prepared by Ultrasonic-assisted Synthesis)

  • 신승호;최정학;김지훈;이준엽
    • 한국환경과학회지
    • /
    • 제28권11호
    • /
    • pp.971-981
    • /
    • 2019
  • This study evaluated the photocatalytic oxidation efficiency of volatile organic compounds by $Cu_2O-TiO_2$ under visible-light irradiation. $Cu_2O-TiO_2$ was synthesized by an ultrasonic-assisted method. The XRD result indicated successful p-n type photocatalysts. However, no diffraction peaks belonging to $TiO_2$ were observed for the $Cu_2O-TiO_2$. The Uv-vis spectra result revealed that the synthesized $Cu_2O-TiO_2$ can be activated under visible-light irradiation. The FE-TEM/EDS result showed the formation of synthesized nanocomposites in the commercial P25 $TiO_2$, the undoped $TiO_2$, and $Cu_2O-TiO_2$ and componential analysis in the undoped $TiO_2$ and $Cu_2O-TiO_2$. The photocatalytic oxidation efficiencies of benzene, toluene, ethylbenzene, and o-xylene with $Cu_2O-TiO_2$ were higher than those of P25 $TiO_2$ and undoped $TiO_2$. These results indicate that the prepared $Cu_2O-TiO_2$ photocatalyst can be applied effectively to control gaseous BTEX.

N형 고분자 반도체의 전하주입 특성 향상을 통한 저전압 유기전계효과트랜지스터 특성 연구 (Low-Voltage Operating N-type Organic Field-Effect Transistors by Charge Injection Engineering of Polymer Semiconductors and Bi-Layered Gate Dielectrics)

  • 문지훈;백강준
    • 한국전기전자재료학회논문지
    • /
    • 제30권10호
    • /
    • pp.665-671
    • /
    • 2017
  • Herein, we report the fabrication of low-voltage N-type organic field-effect transistors by using high capacitance fluorinated polymer gate dielectrics such as P(VDF-TrFE), P(VDF-TrFE-CTFE), and P(VDF-TrFE-CFE). Electron-withdrawing functional groups in PVDF-based polymers typically cause the depletion of negative charge carriers and a high contact resistance in N-channel organic semiconductors. Therefore, we incorporated intermediate layers of a low-k polymerto prevent the formation of a direct interface between PVDF-based gate insulators and the semiconducting active layer. Consequently, electron depletion is inhibited, and the high charge resistance between the semiconductor and source/drain electrodes is remarkably improved by the in corporation of solution-processed charge injection layers.

용액 공정 기반 NiO/ZnO계 자외선 센서용 재료 특성 연구 (A Study on the Material Characteristics of the NiO/ZnO Ultraviolet Sensor Based on Solution Process)

  • 문성철;이지선;노경재;양성주;이성의
    • 한국전기전자재료학회논문지
    • /
    • 제30권8호
    • /
    • pp.508-513
    • /
    • 2017
  • Ultraviolet (UV) photodetectors are used in various industries and fields of research, including optical communication, flame sensing, missile plume detection, astronomical studies, biological sensors, and environmental research. However, general UV detectors that employ Schottky junction diodes and p-n junctions have high fabrication cost and low quantum efficiency. In this study, we investigated the characteristics of materials used to manufacture UV photodetectors in a low-cost solution process that requires easy fabrication of flexible substrates. We fabricated p-type NiO and n-type ZnO substrates with wide band gap by the sol-gel method and compared the characteristics of substrates prepared under different spin-coating and heat-treatment conditions.

Power Enhancement of ZnO-Based Piezoelectric Nanogenerators Via Native Defects Control

  • Kim, Dohwan;Kim, Sang-Woo
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
    • /
    • pp.297.2-297.2
    • /
    • 2013
  • Scavenging electricity from wasteful energy resources is currently an important issue and piezoelectric nanogenerators (NGs) based on zinc oxide (ZnO) are promising energy harvesters that can be adapted to various portable, wearable, self-powered electronic devices. Although ZnO has several advantages for NGs, the piezoelectric semiconductor material ZnO generate an intrinsic piezoelectric potential of a few volts as a result of its mechanical deformation. As grown, ZnO is usually n-type, a property that was historically ascribed to native defects. Oxygen vacancies (Vo) that work as donors exist in ZnO thin film and usually screen some parts of the piezoelectric potential. Consequently, the ZnO NGs' piezoelectric power cannot reach to its theoretical value, and thus decreasing the effect from Vo is essential. In the present study, c-axis oriented insulator-like sputtered ZnO thin films were grown in various temperatures to fabricate an optimized nanogenerator (NGs). The purity and crystalinity of ZnO were investigated with photoluminescence (PL). Moreover, by introducing a p-type polymer usually used in organic solar cell, it was discussed how piezoelectric passivation effect works in ZnO thin films having different types of defects. Prepared ZnO thin films have both Zn vacancies (accepter like) and oxygen vacancies (donor like). It generates output voltage 20 time lager than n-type dominant semiconducting ZnO thin film without p-type polymer conjugating. The enhancement is due to the internal accepter like point defects, zinc vacancies (VZn). When the more VZn concentration increases, the more chances to prevent piezoelectric potential screening effects are occurred, consequently, the output voltage is enhanced. Moreover, by passivating remained effective oxygen vacancies by p-type polymers, we demonstrated further power enhancement.

  • PDF

플라즈마 표면 처리를 이용한 TiO2 MOS 커패시터의 특성 개선 (Improvement in Capacitor Characteristics of Titanium Dioxide Film with Surface Plasma Treatment)

  • 신동혁;조혜림;박세란;오훈정;고대홍
    • 반도체디스플레이기술학회지
    • /
    • 제18권1호
    • /
    • pp.32-37
    • /
    • 2019
  • Titanium dioxide ($TiO_2$) is a promising dielectric material in the semiconductor industry for its high dielectric constant. However, for utilization on Si substrate, $TiO_2$ film meets with a difficulty due to the large leakage currents caused by its small conduction band energy offset from Si substrate. In this study, we propose an in-situ plasma oxidation process in plasma-enhanced atomic layer deposition (PE-ALD) system to form an oxide barrier layer which can reduce the leakage currents from Si substrate to $TiO_2$ film. $TiO_2$ film depositions were followed by the plasma oxidation process using tetrakis(dimethylamino)titanium (TDMAT) as a Ti precursor. In our result, $SiO_2$ layer was successfully introduced by the plasma oxidation process and was used as a barrier layer between the Si substrate and $TiO_2$ film. Metal-oxide-semiconductor ($TiN/TiO_2/P-type$ Si substrate) capacitor with plasma oxidation barrier layer showed improved C-V and I-V characteristics compared to that without the plasma oxidation barrier layer.

Die to Wafer Hybrid Bonding을 위한 Flexure 적용 Bond head 개발 (Development of Flexure Applied Bond head for Die to Wafer Hybrid Bonding)

  • 장우제;정용진;이학준
    • 반도체디스플레이기술학회지
    • /
    • 제20권4호
    • /
    • pp.171-176
    • /
    • 2021
  • Die-to-wafer (D2W) hybrid bonding in the multilayer semiconductor manufacturing process is one of wafer direct bonding, and various studies are being conducted around the world. A noteworthy point in the current die-to-wafer process is that a lot of voids occur on the bonding surface of the die during bonding. In this study, as a suggested method for removing voids generated during the D2W hybrid bonding process, a flexible mechanism for implementing convex for die bonding to be applied to the bond head is proposed. In addition, modeling of flexible mechanisms, analysis/design/control/evaluation of static/dynamics properties are performed. The proposed system was controlled by capacitive sensor (lion precision, CPL 290), piezo actuator (P-888,91), and dSpace. This flexure mechanism implemented a working range of 200 ㎛, resolution(3σ) of 7.276nm, Inposition(3σ) of 3.503nm, settling time(2%) of 500.133ms by applying a reverse bridge type mechanism and leaf spring guide, and at the same time realized a maximum step difference of 6 ㎛ between die edge and center. The results of this study are applied to the D2W hybrid bonding process and are expected to bring about an effect of increasing semiconductor yield through void removal. In addition, it is expected that it can be utilized as a system that meets the convex variable amount required for each device by adjusting the elongation amount of the piezo actuator coupled to the flexible mechanism in a precise unit.

2.5V 10-bit 300MSPS 고성능 CMOS D/A 변환기의 설계 (Design of a 2.5V 10-bit 300MSPS CMOS D/A Converter)

  • 권대훈;송민규
    • 대한전자공학회논문지SD
    • /
    • 제39권7호
    • /
    • pp.57-65
    • /
    • 2002
  • 본 논문에서는 CMOS로 구현된 2.5v 10-bit 300MSPS의 D/A 변환기를 제안하였다. 이를 위해 전체구조는 고속동작에 유리한 전류구동 방식의 8+2 분할 타입으로 상위 8-bit은 Thermometer Code 기법을 이용한 전류셀 매트릭스(Current Cell Matrix)로, 하위 2-bit은 이진 가중 전류열(Binary Weighted Current Array)로 설계하였다. 우수한 다이내믹 특성 및 고속 동작을 만족시키기 위해 낮은 글리치 에너지를 갖는 새로운 전류셀과 BDD(Binary Decision Diagram)에 의한 논리합성 기법을 활용한 새로운 역 Thermometer Decoder를 제안하였다. 제안된 DAC는 $0.25{\mu}m$, 1-Poly, 5-Metal, n-well CMOS 공정으로 제작되었으며, 유효 칩 면적은 $1.56mm^2$이고, 2.5V의 전원전압에서 84mW의 전력소모를 나타내었다. 모의실험 및 측정을 통해 최대 글리치 에너지는 0.9pVsec@fs=100MHz, 15pVsec@fs=300MHz로 나타났다. 또한 출력 주파수가 1MHz, 샘플링 주파수가 300MHz에서의 INL과 DNL은 약 ${\pm}$1.5LSB 이내로, SFDR은 45dB로 측정되었다.

MoO3 기반 실리콘 이종접합 IR 영역 광검출기 개발 (MoO3/p-Si Heterojunction for Infrared Photodetector)

  • 박왕희;김준동;최인혁
    • 한국전기전자재료학회논문지
    • /
    • 제30권8호
    • /
    • pp.525-529
    • /
    • 2017
  • Molybdenum oxide ($MoO_3$) offers pivotal advantages for high optical transparency and low light reflection. Considering device fabrication, n-type $MoO_3$ semiconductor can spontaneously establish a junction with p-type Si. Since the energy bandgap of Si is 1.12 eV, a maximum photon wavelength of around 1,100 nm is required to initiate effective photoelectric reaction. However, the utilization of infrared photons is very limited for Si photonics. Hence, to enhance the Si photoelectric devices, we applied the wide energy bandgap $MoO_3$ (3.7 eV) top-layer onto Si. Using a large-scale production method, a wafer-scale $MoO_3$ device was fabricated with a highly crystalline structure. The $MoO_3/p-Si$ heterojunction device provides distinct photoresponses for long wavelength photons at 900 nm and 1,100 nm with extremely fast response times: rise time of 65.69 ms and fall time of 71.82 ms. We demonstrate the high-performing $MoO_3/p-Si$ infrared photodetector and provide a design scheme for the extension of Si for the utilization of long-wavelength light.

MnGeP2 박막의 자기수송 특성 (Magnetotransport Properties of MnGeP2 Films)

  • 김윤기;조성래
    • 한국자기학회지
    • /
    • 제19권4호
    • /
    • pp.133-137
    • /
    • 2009
  • GaAs 기판 위에 증착된 $MnGeP_2$ 박막이 상온에서 강자성을 보임을 자기화 및 자기저항 측정을 통해 확인하였다. 강자성-상자성 전이 온도는 320 K 정도였고, 항자력장은 5, 250, 300 K에서 각각 3870, 1380, 155 Oe 정도였다. 전하 운반자가 스핀 편극되어 있음을 암시하는 비정상 홀 효과를 관측하였다. 자기장에 따른 자기저항과 홀 저항을 측정할 때 이력곡선이 나타남을 확인하였다. $MnGeP_2$ 박막과 n-형 GaAs 기판 사이에 I-V 측정을 통해 전형적인 p-n 다이오드 특성을 보임을 확인하였다.

광전음극 소자용 GaAs/AlGaAs 구조의 LPE 성장 (Growth of GaAs/AlGaAs structure for photoelectric cathode)

  • 배숭근;전인준;김경화
    • 한국결정성장학회지
    • /
    • 제27권6호
    • /
    • pp.282-288
    • /
    • 2017
  • 본 논문에서는 광전 음극 이미지 센서로 사용될 수 있는 광소자용 재료로 III-V 족 화합물 반도체인 GaAs/AlGaAs 다층 구조를 LPE(Liquid Phase Epitaxy) 방법에 의해 성장하였다. n형 GaAs 기판 위에 수십 nm의 GaAs 완충층을 형성 한 후 Zn가 도핑된 p-AlGaAs 에칭 정지 층(etching stop layer)과 Zn가 도핑된 p-GaAs 층 그리고 Zn가 도핑된 p-AlGaAs 층을 성장하였다. 성장된 시료의 특성을 조사하기 위하여 주사전자현미경(SEM)과 이차이온질량분석기(SIMS) 그리고 홀(Hall) 측정 장치 등을 이용하여 GaAs/AlGaAs 다층 구조를 분석하였다. 그 결과 $1.25mm{\times}25mm$의 성장 기판에서 거울면(mirror surface)을 가지는 p-AlGaAs/p-GaAs/p-AlGaAs 다층 구조를 확인할 수 있었으며, Al 조성은 80 %로 측정 되었다. 또한 p-GaAs층의 캐리어 농도는 $8{\times}10^{18}/cm^2$ 범위까지 조절할 수 있음을 확인하였다. 이 결과로부터 LPE 방법에 의해 성장된 p-AlGaAs/p-GaAs/AlGaAs 다층 구조는 광전 음극 이미지 센서의 소자로서 이용될 수 있을 것으로 기대한다.