• The Journal of Korean Institute of Communications and Information Sciences
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• v.33 no.5B
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• pp.253-259
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• 2008

Because a sensor node in wireless sensor networks is battery operated and energy constrained, reducing energy consumption of each node is one of important issues. The clustering technique can make network topology be hierarchical and reduce energy consumption of each sensor node. In this paper, we propose an efficient clustering mechanism considering overlap avoidance in wireless sensor networks. The proposed method consists of three parts. The first is to elect cluster heads considering each node's energy. Then clusters are formed by using signal strength in the second phase. Finally we can reduce the cluster overlap problem derived from two or more clusters. In addition, this paper includes performance evaluation of our algorithm. Simulation results show that network lifetime was extended up to 75 percents than LEACH and overlapped clusters are decreased down to nearly zero percents.

• 한국전산유체공학회:학술대회논문집
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• 2011.05a
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• pp.441-446
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• 2011

To investigate aerodynamic performance of high-lift devices, 2D design is the base of the success of high-lift system design for transport aircraft, which can shorten the periods of three-dimensional design and analysis. For the simulation coupled viscous and inviscous euler method (MSES) is used. In this parametric study, Gap and Overlap which can define position of flap is used as design variables and we investigale relation between angle of attack and flap position for lift enhancement.

• Proceedings of the IEEK Conference
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• 2004.08c
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• pp.784-786
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• 2004

Overlap errors and side-lobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the side-lobes and to get additional pattern fidelity at the same time.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.34D no.4
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• pp.33-39
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• 1997

The crystallization temperature of an amorphous silicon (a-Si) can be lowered down to 400.deg. C by a new method : Double-metal induced lateral crystallization (DMILC). The a-Si film was laterally crystallized from Ni and Pd deposited area, and its lateral crystallization rate reaches up to 0.2.mu.m/hour at that temperature and depends on the overlap length of Ni and Pd films; the shorter the overlap length, the faster the rate. Poly-Silicon thin film transistors (poly-Si TFT's) fabricated by DMILC at 400.deg. C show a field effect mobility of 38.5cm$^{3}$/Vs, a minimum leakage current of 1pA/.mu.m, and a slope of 1.4V/dec. The overlap length does not affect the characteristics of the poly-Si TFT's, but determines the lateral crystallization rate.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2001.10a
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• pp.84-88
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• 2001

Security and degradation by broadcast is the most important part that must handle in LAN. Virtual LAN can improve LAN's degradation by method to form and manages network group logically. MAC Address VLAN algorithm that propose in this research give overlap special qualify to VLAN adding extension VID field and VID connection extent table to FDB, manage overlap extent dynamically. VLAN that apply this proposal algorithm can share information and resource in network without additional equipment. Application is possible switch or Bridge that this algorithm achieves Layer 2 functions.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2004.05a
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• pp.159-162
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• 2004

Problems of overlap errors and sidelobe printing by the design rule reduction in the lithography process using attenuated phase-shifting masks(attPSM) have been serious. Overlap errors and sidelobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the sidelobes and to get additional pattern fidelity at the same time.

• Bulletin of the Korean Chemical Society
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• v.6 no.1
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• pp.3-7
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• 1985

The general formulas for SCF atomic orbitals |5s > and |6p > have been derived separately by expressing the spherical harmonics part in terms of the coordinate($r_1,\;$r_2$) of the reference point, and by translating the exponential part, $r^4\;exp\;(-{\beta}r)$), in terms of $r_1,\;and\;r_2$ and the modified Bessel functions. Master formulas for overlap and dipole moment matrix elements are derived. The computed values of overlap and dipole moment matrix elements for hypothetical NO molecule are exactly in agreement with those for the previous methods.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.39 no.10
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• pp.1-8
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• 2002

C- V method is a means to determine the effective channel length for miniaturized MOSFET's. This method achieves L$_{eff}$ by extracting a unique channel length independent extrinsic overlap length($\Delta$L) at a critical gate bias point. In this paper, we conducted an experiment on two different C-V methods. L$_{eff}$ extracted from experiment is compared with L$_{eff}$ simulated from a two-dimensional (2-D) device simulator, and the accuracy of C-V method for L$_{eff}$ extraction is analyzed.

• Proceedings of the IEEK Conference
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• summer
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• pp.447-450
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• 2004

This paper proposes remotely sensed image classification method by fuzzy c-means clustering algorithm using average intra-cluster distance. The average intra-cluster distance acquires an average of the vector set belong to each cluster and proportionates to its size and density. We perform classification according to pixel's membership grade by cluster center of fuzzy c-means clustering using the mean-values of training data about each class. Fuzzy c-means algorithm considered membership degree for inter-cluster of each class. And then, we validate degree of overlap between clusters. A pixel which has a high degree of overlap applies to the maximum likelihood classification method. Finally, we decide category by comparing with fuzzy membership degree and likelihood rate. The proposed method is applied to IKONOS remote sensing satellite image for the verifying test.

• Journal of the Korea Computer Industry Society
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• v.3 no.5
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• pp.575-584
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• 2002

On-line handwritten character recognition be achieved successful results since effectively neural networks divided the letter which is the time ordering of strokes and stroke position. But off-line handwritten character recognition is in difficulty of incomplete preprocessing because has not information of motion or time and has frequently overlap of the letter and many noise occurrence. consequently off-line handwritten character recognition needs study of various methods. This paper apply watershed algorithm to preprocessing for off-line handwritten hangul character recognition. This paper presents effective method in four steps in watershed algorithm as consider execution time of watershed algorithm and quality of result image. As apply watershed algorithm with effective structure to preprocessing, can get to the good result of image enhancement and binarization. In this experiment, this paper is estimate the previous method with this paper method for execution time and quality in image. Average execution time on the previous method is 2.16 second and Average execution time on this paper method is 1.72 second. While this paper method is remove noise effectively with overlap stroke, the previous method does not seem to be remove noise effectively with overlap stroke.