• 제목/요약/키워드: nanohardness

검색결과 15건 처리시간 0.018초

Atomistic simulation and investigation of nanoindentation, contact pressure and nanohardness

  • Chen, Chuin-Shan;Wang, Chien-Kai;Chang, Shu-Wei
    • Interaction and multiscale mechanics
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    • 제1권4호
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    • pp.411-422
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    • 2008
  • Atomistic simulation of nanoindentation with spherical indenters was carried out to study dislocation structures, mean contact pressure, and nanohardness of Au and Al thin films. Slip vectors and atomic stresses were used to characterize the dislocation processes. Two different characteristics were found in the induced dislocation structures: wide-spread slip activities in Al, and confined and intact structures in Au. For both samples, the mean contact pressure varied significantly during the early stages of indentation but reached a steady value soon after the first apparent load drop. This indicates that the nanohardness of Al and Au is not affected by the indentation depth for spherical indenters, even at the atomistic scale.

스퍼터링법으로 TiN 및 ZrN 피막 코팅된 STD 61의 표면특성 (Surface Characteristics of TiN and ZrN Film Coated STD 61 by Sputtering)

  • 은상원;최한철
    • 한국표면공학회지
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    • 제43권6호
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    • pp.260-265
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    • 2010
  • STD 61 steel has been widely used for tools, metallic mold and die for press working because of its favorable mechanical properties such as high toughness, and creep strength as well as excellent oxidation resistance. The STD 61 tool steel coated with TiN and ZrN by sputtering results in improvement of wear and corrosion resistance. In this study, surface characteristics of TiN and ZrN film coated STD 61 by sputtering were studied by using FE-SEM, EDS, XRD, and XRR and nanoindentation tests. From the results of surface characteristics of coated specimen, the ZrN coated surface showed finer granular than that of TiN coated surface. The coated layer structures of ZrN and TiN were grown to (111) and (200) preferred orientation. From the results of XRR test for surface roughness, density and growth rate of coating film, surface roughness and growth rate of ZrN coated film revealed lower values those of TiN coated film, whereas density of ZrN coated film showed higher values than that of TiN coated film. From the nanohardness and elastic modulus test, nanohardness value and elastic modulus of ZrN coated film became higher than those of TiN coated film.

유도결합 플라즈마 파워변화에 따른 초경도 나노결정질 TiN 코팅막의 물성변화 (Effect of Inductively Coupled Plasma (ICP) Power on the Properties of Ultra Hard Nanocrystalline TiN Coatings)

  • 전성용
    • 한국세라믹학회지
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    • 제50권3호
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    • pp.212-217
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    • 2013
  • Ultra hard TiN coatings were fabricated by DC and ICP (inductively coupled plasma) magnetron sputtering techniques. The effects of ICP power, ranging from 0 to 300 W, on the coating microstructure, crystallographic, and mechanical properties were systematically investigated with FE-SEM, AFM, HR-XRD and nanoindentation. The results show that ICP power has a significant influence on the coating microstructure and mechanical properties of TiN coatings. With an increasing ICP power, the film microstructure evolves from an apparent columnar structure to a highly dense one. Grain sizes of TiN coatings decreased from 12.6 nm to 8.7 nm with an increase of the ICP power. A maximum nanohardness of 67.6 GPa was obtained for the coatings deposited at an ICP power of 300 W. The crystal structure and preferred orientation in the TiN coatings also varied with the ICP power, exerting an effective influence on film nanohardness.

DC 스퍼터법과 유도결합 플라즈마 마그네트론 스퍼터법으로 증착된 수퍼하드 TiN 코팅막의 물성 비교연구 (A Comparative Study of Superhard TiN Coatings Deposited by DC and Inductively Coupled Plasma Magnetron Sputtering)

  • 전성용
    • 한국표면공학회지
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    • 제46권2호
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    • pp.55-60
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    • 2013
  • Superhard TiN coatings were fabricated by DC and ICP (inductively coupled plasma) assisted magnetron sputtering techniques. The effect of ICP power, ranging from 0 to 300 W, on coating microstructure, preferred orientation mechanical properties were systematically investigated with HR-XRD, SEM, AFM and nanoindentation. The results show that ICP power has a significant influence on coating microstructure and mechanical properties of TiN coatings. With the increasing of ICP power, coating microstructure evolves from the columnar structure of DC process to a highly dense one. Grain sizes of TiN coatings were decreased from 12.6 nm to 8.7 nm with increase of ICP power. The maximum nanohardness of 67.6 GPa was obtained for the coatings deposited at ICP power of 300 W. Preferred orientation in TiN coatings also vary with ICP power, exerting an effective influence on film nanohardness.

DC 스퍼터법과 유도결합 플라즈마 마그네트론 스퍼터법으로 증착된 CrN 코팅막의 물성 비교연구 (A Comparative Study of CrN Coatings Deposited by DC and Inductively Coupled Plasma Magnetron Sputtering)

  • 서대한;전성용
    • 한국표면공학회지
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    • 제45권3호
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    • pp.123-129
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    • 2012
  • Nanocrystalline CrN coatings were fabricated by DC and ICP (inductively coupled plasma) assisted magnetron sputtering techniques. The effect of ICP power, ranging from 0 to 500 W, on coating microstructure, preferred orientation mechanical properties were systematically investigated with HR-XRD, SEM, AFM and nanoindentation. The results show that ICP power has an significant influence on coating microstructure and mechanical properties of CrN coatings. With the increasing of ICP power, coating microstructure evolves from the columnar structure of DC process to a highly dense one. Grain size of CrN coatings were decreased from 11.7 nm to 6.6 nm with increase of ICP power. The maximum nanohardness of 23.0 GPa was obtained for the coatings deposited at ICP power of 500 W. Preferred orientation in CrN coatings also vary with ICP power, exerting an effective influence on film nanohardness.

DED 적층 제조된 Stellite 6 조성합금의 열간등방압성형 후처리 (Effect of Hot Isostatic Pressing on the Stellite 6 Alloy prepared by Directed Energy Deposition)

  • 서주원;고재현;천영범;김영도;장진성;강석훈;한흥남
    • 한국분말재료학회지
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    • 제31권2호
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    • pp.152-162
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    • 2024
  • The directed energy deposited (DED) alloys show higher hardness values than the welded alloys due to the finer microstructure following the high cooling rate. However, defects such as microcracks, pores, and the residual stress are remained within the DED alloy. These defects deteriorate the wear behavior so post-processing such as heat treatment and hot isostatic pressing (HIP) are applied to DED alloys to reduce the defects. HIP was chosen in this study because the high pressure and temperature uniformly reduced the defects. The HIP is processed at 1150℃ under 100 MPa for 4 hours. After HIP, microcracks are disappeared and porosity is reduced by 86.9%. Carbides are spherodized due to the interdiffusion of Cr and C between the dendrite and interdendrite region. After HIP, the nanohardness (GPa) of carbides increased from 11.1 to 12, and the Co matrix decreased from 8.8 to 7.9. Vickers hardness (HV) decreased by 18.9 % after HIP. The dislocation density (10-2/m2) decreased from 7.34 to 0.34 and the residual stress (MPa) changed from tensile 79 to a compressive -246 by HIP. This study indicates that HIP is effective in reducing defects, and the HIP DED Stellite 6 exhibits a higher HV than welded Stellite 6.

Deposition and evaluation of MoNx films deposited by magnetron sputtering

  • Ma, Yajun;Li, Shenghua;Jin, Yuansheng;Pan, Guoshun;Wang, Yucong;Tung, Simon C.
    • 한국윤활학회:학술대회논문집
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    • 한국윤활학회 2002년도 proceedings of the second asia international conference on tribology
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    • pp.135-136
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    • 2002
  • Molybdenum Nitrided (MoNx) films were deposited by DC planar magnetron sputtering. Silicon wafers and real nitrided stainless steel piston rings are employed as substrates. 12 different combinations of nitrogen and argon partial pressure, from 1:7 to 7:1, were applied to deposit MoNx films. X-ray diffraction (XRD) was used to determine the phase structures of films. When nitrogen vs. argon partial pressure is 1:7, the film is mainly $Mo_2N$ phase. With increase of nitrogen partial pressure, MoN phase emerges, but $Mo_2N$ phase still exists. Composition analysis with atomic emission spectrometry (AES) also agreed with this. The films have very high nanohardness (max 2400Hv) and good adhesion to the substrates.

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Structural and Mechanical Properties of Multilayered CVD TiC/TiCN Coatings with Variations of Multilayer Period

  • Park, Geun-Woo;Kwon, Hyuck-Sang
    • 한국분말야금학회:학술대회논문집
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    • 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part 1
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    • pp.638-639
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    • 2006
  • Multilayered coatings on tungsten carbide cutting tools are widely used for enhancing cutting performance. In this paper, we review the CVD TiC/TiCN multilayer as a function of the multilayer period. The TiC/TiCN multilayers in initial stage show preferred (220) orientation but shifts to (200) orientation with decreasing multilayer period. The nanohardness of TiC/TiCN multilayers were found to increase with decreasing multilayer period and shows a maximum of 23.8 GPa at a period = 33.5 nm.

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하이브리드 코팅 시스템에 의해 합성된 Zr-Al-N 박막의 미세구조와 기계적 특성, 산화 특성, 부식특성 (Microstructure, Mechanical, Oxidation and Corrosion Properties of Zr-Al-N Coatings Synthesized by the Hybrid Coating System)

  • 최하송;장재호;안은솔;김광호
    • 한국표면공학회지
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    • 제46권6호
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    • pp.242-247
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    • 2013
  • Zr-Al-N coatings were synthesized by the hybrid coating system combining arc ion plating and DC magnetron sputtering from a Zr and an Al target in argon-nitrogen atmosphere, respectively. By changing the power applied on the Al cathodes, the Zr-Al-N coatings with various Al contents were deposited. The microstructure and chemical compositions of the Zr-Al-N coatings were studied by X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM). With increasing of Al content in the coatings, the solid solution (Zr, Al)N crystallites were observed in the Zr-Al-N coatings. The nanohardness of the Zr-Al-N coatings exhibited a maximum value of 42 GPa for the Zr-Al (7.9 at.%)-N, and decreased with further increase in Al content in the coatings. The oxidation and corrosion behavior of the Zr-Al-N coatings revealed better properties compared than those of ZrN coatings due to the formation of a solid solution.

Study of Chromium thin films deposited by DC magnetron sputtering under glancing angle deposition at low working pressure

  • Bae, Kwang-Jin;Ju, Jae-Hoon;Cho, Young-Rae
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.181.2-181.2
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    • 2015
  • Sputtering is one of the most popular physical deposition methods due to their versatility and reproducibility. Synthesis of Cr thin films by DC magnetron sputtering using glancing angle deposition (GLAD) has been reported. Chromium thin films have been prepared at two different working pressure($2.0{\times}10-2$, 30, $3.3{\times}10-3torr$) on Si-wafer substrate using magnetron sputtering with glancing angle deposition (GLAD) technique. The thickness of Cr thin films on the substrate was adjusted about 1 mm. The electrical property was measured by four-point probe method. For the measurement of density in the films, an X-ray reflectivity (XRR) was carried out. The sheet resistance and column angle increased with the increase of glancing angle. However, nanohardness and density of Cr thin films decreased as the glancing angle increased. The measured density for the Cr thin films decreased from 6.1 to 3.8 g/cc as the glancing angle increased from $0^{\circ}$ to $90^{\circ}$ degree. The low density of Cr thin films is resulted from the isolated columnar structure of samples. The evolution of the isolated columnar structure was enhanced at the conditions of low sputter pressure and high glancing angle. This GLAD technique can be potentially applied to the synthesis of thin films requiring porous and uniform coating such as thin film catalysts or gas sensors.

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