한국윤활학회:학술대회논문집 (Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference)

한국트라이볼로지학회 (Korean Tribology Society)
권호 표지

Deposition and evaluation of MoNx films deposited by magnetron sputtering

  • Ma, Yajun (State Key Laboratory of Tribology, Tsinghua University) ;
  • Li, Shenghua (State Key Laboratory of Tribology, Tsinghua University) ;
  • Jin, Yuansheng (State Key Laboratory of Tribology, Tsinghua University) ;
  • Pan, Guoshun (State Key Laboratory of Tribology, Tsinghua University) ;
  • Wang, Yucong (Gernal Motors Corporation) ;
  • Tung, Simon C. (Gernal Motors Corporation)
  • 발행 : 2002.10.21
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초록

Molybdenum Nitrided (MoNx) films were deposited by DC planar magnetron sputtering. Silicon wafers and real nitrided stainless steel piston rings are employed as substrates. 12 different combinations of nitrogen and argon partial pressure, from 1:7 to 7:1, were applied to deposit MoNx films. X-ray diffraction (XRD) was used to determine the phase structures of films. When nitrogen vs. argon partial pressure is 1:7, the film is mainly $Mo_2N$ phase. With increase of nitrogen partial pressure, MoN phase emerges, but $Mo_2N$ phase still exists. Composition analysis with atomic emission spectrometry (AES) also agreed with this. The films have very high nanohardness (max 2400Hv) and good adhesion to the substrates.

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