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A Comparative Study of CrN Coatings Deposited by DC and Inductively Coupled Plasma Magnetron Sputtering

DC 스퍼터법과 유도결합 플라즈마 마그네트론 스퍼터법으로 증착된 CrN 코팅막의 물성 비교연구

  • Seo, Dae-Han (Department of Advanced Materials Science and Engineering, Mokpo National University) ;
  • Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University)
  • 서대한 (목포대학교 신소재공학과) ;
  • 전성용 (목포대학교 신소재공학과)
  • Received : 2012.06.04
  • Accepted : 2012.06.28
  • Published : 2012.06.30

Abstract

Nanocrystalline CrN coatings were fabricated by DC and ICP (inductively coupled plasma) assisted magnetron sputtering techniques. The effect of ICP power, ranging from 0 to 500 W, on coating microstructure, preferred orientation mechanical properties were systematically investigated with HR-XRD, SEM, AFM and nanoindentation. The results show that ICP power has an significant influence on coating microstructure and mechanical properties of CrN coatings. With the increasing of ICP power, coating microstructure evolves from the columnar structure of DC process to a highly dense one. Grain size of CrN coatings were decreased from 11.7 nm to 6.6 nm with increase of ICP power. The maximum nanohardness of 23.0 GPa was obtained for the coatings deposited at ICP power of 500 W. Preferred orientation in CrN coatings also vary with ICP power, exerting an effective influence on film nanohardness.

Keywords

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