Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2015.08a
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- Pages.181.2-181.2
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- 2015
Study of Chromium thin films deposited by DC magnetron sputtering under glancing angle deposition at low working pressure
- Bae, Kwang-Jin (Busan National University) ;
- Ju, Jae-Hoon (Busan National University) ;
- Cho, Young-Rae (Busan National University)
- Published : 2015.08.24
Abstract
Sputtering is one of the most popular physical deposition methods due to their versatility and reproducibility. Synthesis of Cr thin films by DC magnetron sputtering using glancing angle deposition (GLAD) has been reported. Chromium thin films have been prepared at two different working pressure(