• International Journal of Precision Engineering and Manufacturing
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• v.9 no.1
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• pp.25-29
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• 2008

We introduce a new fabrication process for antireflective structured surfaces. A 4-inch silicon wafer was dipped in a suspension of 300-nm-diameter silica particles dispersed in a toluene solution. When the wafer was drawn out of the suspension, a hexagonally packed monolayer structure of particles self-assembled on almost the complete wafer surface. Due to the simple process, this could be applied to micro- and nano-patterning. The self-assembled silica particles worked as a mask for the subsequent reactive ion etching. An array of nanometer-sized pits could be fabricated since the regions that correspond to the small gaps between particles were selectively etched off. As etching progressed, the pits became deeper and combined with neighboring pits due to side-etching to produce an array of cone-like structures. We investigated the effect of etching conditions on antireflection properties, and the optimum shape was a nano-cone with height and spacing of 500 nm and 300 nm, respectively. This nano-structured surface was prepared on a $30\;{\times}\;10-mm$ area. The reflectivity of the surface was reduced 97% for wavelengths in the range 400-700 nm.

• Journal of the Optical Society of Korea
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• v.17 no.6
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• pp.513-517
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• 2013

Recently, maskless lithography (ML) systems have become popular in digital manufacturing technologies. To achieve high-throughput manufacturing processes, digital micromirror devices (DMD) in ML systems must be driven to their operational limits, often in harsh conditions. We propose an instrument and algorithm to detect DMD malfunctions to ensure perfect mask image transfer to the photoresist in ML systems. DMD malfunctions are caused by either bad DMD pixels or data transfer errors. We detect bad DMD pixels with $20{\times}20$ pixel by white and black image tests. To analyze data transfer errors at high frame rates, we monitor changes in the frame rate of a target DMD pixel driven by the input data with a set frame rate of up to 28000 frames per second (fps). For our data transfer error detection method, we verified that there are no data transfer errors in the test by confirming the agreement between the input frame rate and the output frame rate within the measurement accuracy of 1 fps.

• Korean Journal of Optics and Photonics
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• v.34 no.6
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• pp.276-282
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• 2023

In this paper, we designed a lighting optical system using a freeform lens as a substitute for expensive gobo lighting. Unlike gobo lighting, freeform lens lighting does not use an image mask, and it can form and project an image directly on the lens surface using only a single lens, thus reducing the cost compared to gobo lighting. In order to verify the performance of freeform lens lighting with these advantages, we conducted an illuminance simulation. As a result, it was confirmed that it can replace gobo lighting because it has an illuminance distribution similar to the image we want to irradiate and a light efficiency of 47% similar to the performance of gobo lighting.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.502-502
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• 2007

Current thin film process using memory device fabrication process use expensive processes such as manufacturing of photo mask, coating of photo resist, exposure, development, and etching. However, direct printing technology has the merits about simple and cost effective processes because inks are directly injective without mask. And also, this technology has the advantage about fabrication of fine pattern line on various substrates such as PCB, FCPB, glass, polymer and so on. In this work, we have fabricated the fine and thick metal pattern line for the electronic circuit board using metal ink contains Ag nano-particles. Metal lines are fabricated by two types of printing methods. One is a conventional printing method which is able to quick fabrication of fine pattern line, but has various difficulties about thick and high resolution DPI(Dot per Inch) pattern lines because of bulge and piling up phenomenon. Another(Second) methods is sequential printing method which has a various merits of fabrication for fine, thick and high resolution pattern lines without bulge. In this work, conductivities of metal pattern line are investigated with respect to printing methods and pattern thickness. As a result, conductivity of thick pattern is about several un.

• Korean Journal of Metals and Materials
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• v.56 no.11
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• pp.835-843
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• 2018

In this work, we report a delta rosette strain sensor based on highly stretchable silver nanowire (AgNW) percolation piezoresistors. The proposed rosette strain sensors were easily prepared by a facile two-step fabrication route. First, three identical AgNW piezoresistive electrodes were patterned in a simple and precise manner on a donor film using a solution-processed drop-coating of the AgNWs in conjunction with a tape-type shadow mask. The patterned AgNW electrodes were then entirely transferred to an elastomeric substrate while embedding them in the polymer matrix. The fabricated stretchable AgNW piezoresistors could be operated at up to 20% strain without electrical or mechanical failure, showing a maximum gauge factor as high as 5.3, low hysteresis, and high linearity ($r^2{\approx}0.996$). Moreover, the sensor responses were also found to be highly stable and reversible even under repeated strain loading/unloading for up to 1000 cycles at a maximum tensile strain of 20%, mainly due to the mechanical stability of the AgNW/elastomer composites. In addition, both the magnitude and direction of the principal strain could be precisely characterized by configuring three identical AgNW piezoresistors in a delta rosette form, representing the potential for employing the devices as a multidimensional strain sensor in various practical applications.

• Journal of the Korea Society of Computer and Information
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• v.29 no.8
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• pp.43-51
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• 2024

This paper proposes a method for acquiring and analyzing ocular data using a special-purpose diver mask targeted at divers who primarily engage in underwater activities. This involves tracking the user's gaze with the help of a custom-built ocular dataset and a YOLOv8-nano model developed for this purpose. The model achieved an average processing time of 45.52ms per frame and successfully recognized states of eyes being open or closed with 99% accuracy. Based on the analysis of the ocular data, a gaze tracking algorithm was developed that can map to real-world coordinates. The validation of this algorithm showed an average error rate of about 1% on the x-axis and about 6% on the y-axis.

• Korean Journal of Materials Research
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• v.21 no.5
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• pp.273-276
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• 2011

Ultraviolet (UV) light emitting diodes (LEDs) were grown on a patterned n-type GaN substrate (PNS) with 200 nm silicon-di-oxide (SiO2) nano pattern diameter to improve the light output efficiency of the diodes. Wet etched self assembled indium tin oxide (ITO) nano clusters serve as a dry etching mask for converting the SiO2 layer grown on the n-GaN template into SiO2 nano patterns by inductively coupled plasma etching. PNS is obtained by n-GaN regrowth on the SiO2 nano patterns and UV-LEDs were fabricated using PNS as a template. Two UV-LEDs, a reference LED without PNS and a 200 nm PNS UV-LEDs were fabricated. Scanning Electron microscopy (SEM), Transmission Electron Microscopy (TEM), X-Ray Diffraction (XRD), Photoluminescence (PL) and Light output intensity- Input current- Voltage (L-I-V) characteristics were used to evaluate the ITO-$SiO_2$ nanopattern surface morphology, threading dislocation propagation, PNS crystalline property, PNS optical property and UVLED device performance respectively. The light out put intensity was enhanced by 1.6times@100mA for the LED grown on PNS compared to the reference LED with out PNS.

• Journal of the Korean Vacuum Society
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• v.19 no.4
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• pp.300-306
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• 2010

Superhydrophobic micro-nano hybrid structures were fabricated by reactive ion etching of hydrophobic polymer micro patterns using gold nanoparticles as etch masks. Micro structures of perfluoropolyether bisurethane methacrylate (PFPE) were prepared by soft-lithographic technique using polydimethylsiloxane (PDMS) molds. Water contact angles on the surfaces of various PFPE micro structures and corresponding micro-nano hybrid structures were compared to examine the effects of micro patterning and nanostructure formation in the manifestation of superhydrophobicity. The PFPE micro-nano hybrid structures exhibited a very stable superhydrophobicity, while the micro-only structures could not reach the superhydrophobicity but only showed the unstable hydrophobicity.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.922-925
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• 2003

The interest of self-organization materials that have uniform and regular structure in nano scale has been grown due to their utilization in various fields of nanotechnology. An attractive candidate among these materials is anodic aluminum oxide film, which are formed by anodization of aluminum in an appropriate acid solution. The anodic aluminum oxide film has a highly ordered porous structure with very uniform and nearly parallel pores that can be organized in an almost precise close-packed hexagonal structure. In this study, we attempt to make Au dot arrays, which were fabricated using anodic aluminum oxide film as an evaporation mask. The Au dot arrays have a uniform sized dots and spacing to its neighbors and the average diameter of Au dots is about 60 nm corresponding to them of the mask.

• Journal of the Korean institute of surface engineering
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• v.56 no.2
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• pp.115-124
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• 2023

Anodization is an electrochemical process that electrochemically converts a metal surface into an oxide layer, resulting in enhanced corrosion resistance, wear resistance, and improved aesthetic appearance. Local anodization, also known as selective anodization, is a modified process that enables specific regions or patterns on the metal surface to undergo anodization instead of the entire surface. Several methods have been attempted to produce oxide layers via localized anodic oxidation, such as using a mask or pre-patterned substrate. However, these methods are often intricate, time-consuming, and costly. Conversely, the direct writing or patterning approach is a more straightforward and efficient way to fabricate the oxide layers. This review paper intends to enhance our comprehension of local anodization and its potential applications in various fields, including the development of nanotechnologies. The application of anodization is promising in surface engineering, where the anodic oxide layer serves as a protective coating for metals or modifies the surface properties of materials. Furthermore, anodic oxidation can create micro- and nano-scale patterns on metal surfaces. Overall, the development of efficient and cost-effective anodic oxidation methods is essential for the advancement of various industries and technologies.