• Title/Summary/Keyword: nano hole

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A Study on the Fabrication of Nano-Pattern Mold Using Anodic Aluminum Oxide Membrane (양극산화 알루미늄막을 이용한 나노패턴 성형용 금형제작에 대한 연구)

  • Oh, J.G.;Kim, J.S.;Kang, J.J.;Kim, J.D.;Yoon, K.H.;Hwang, C.J.
    • Transactions of Materials Processing
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    • v.19 no.2
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    • pp.73-78
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    • 2010
  • Recently, many researches on the development of super-hydrophobic surface have been concentrated on the fabrication of nano-patterned products. Nano-patterned mold is a key to replicate nano-patterned products by mass production process such as injection molding and UV molding. The present paper proposes the new fabricating method of nano-patterned mold at low cost. The nano-patterned mold was fabricated by electroforming the anodic aluminum oxide membrane filled with UV curable resin in nano-hole by capillary phenomenon. As a result, the final mold with nano-patterns which have the holes with the diameter of 100~200 nm was fabricated. Furthermore, the UV-molded products with clear nano- patterns which have the pillars with the diameter of 100~200nm were achieved.

Comparison of Hole Mobility Characteristics of Single Channel and Dual Channel Si/SiGe Structure (단일채널 Strained Si/SiGe 구조와 이중채널 Strained Si/SiGe 구조의 이동도 특성 비교)

  • Jung, Jong-Wan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.113-114
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    • 2007
  • Hole mobility characteristics of single surface channel and dual channel Si/SiGe structure are compared, where the former one consists of a relaxed SiGe buffer layer and a tensile strained Si layer on top, and for dual channel structure a compressively strained SiGe layer is inserted between them. Due to the difference of hole mobility enhancement factors of layers between them, hole mobility characteristics with respect to the Si cap thickness shows the opposite tend. Hole mobility increases with thicker Si cap for single channel structure, whereas it decreases with thicker Si cap for dual channel structure.

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Syntheses and Characterization of Columnar Discotic Liquid Crystals Based on TTF Core for Organic Electronic Materials

  • Wang, Lei;Jeong, Kwang-Un;Lee, Soo-Hyoung;Lee, Myong-Hoon
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.1477-1479
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    • 2008
  • We report the first TTF compounds having columnar LC phase at room temperature. Based on the thermal, structural, and morphological observations, it was concluded that TTF derivative with long alkyl chains has highly ordered oblique columnar LC at room temperature. The new TTF derivatives have excellent oxidative stability which is desirable for a p-type (hole transport) materials.

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A Study on Fracture Criterion of PMMA Plates Having a V-Notch with an End Hole (단공 (端孔) V-노치가 있는 PMMA 판의 파괴기준에 관한 연구)

  • Choo, Won Chul;Cho, Sang Bong;Yun, Jon Do
    • Journal of the Korean Society for Precision Engineering
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    • v.33 no.10
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    • pp.865-873
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    • 2016
  • The aim of this study was to examine the validity of fracture criterion for PMMA plates that have a V-notch with an end hole. The predicted stress intensity factors and crack initiation angles by the fracture criterion based on the maximum circumferential stress and the novozhilov's criteria were compared with the experimental results. By increasing the radius of end hole, the differences of predicted stress intensity factors and experimental results increased, possibly due to the plastic zone size. The results indicated that when the radius of end hole is < 1 mm, the fracture criterion would be useful.

Maskless Nano-fabrication by using both Nanoscratch and HF Wet Etching Technique (나노스크래치와 HF 에칭기술을 병용한 Pyrex 7740의 마스크리스 나노 가공)

  • 윤성원;이정우;강충길
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.628-631
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    • 2003
  • This study describes a new mastless nano-fabrication technique of Pyrex 7740 glass using the combination of nanomachining by nano-indenter XP and HF wet etching. First, the surface of a Pyrex 7740 glass specimen was machined by using the nano-machining system, which utilizes the mechanism of the nano-indenter XP. Next, the specimen was etched by HF solution. After the etching process, the convex structure or deeper hole is made because of masking or promotion effect of the affected layer generated by nano-machining. On the basis of this interesting fact. some sample structures were fabricated.

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MEMS for Heterogeneous Integration of Devices and Functionality

  • Fujita, Hiroyuki
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.7 no.3
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    • pp.133-139
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    • 2007
  • Future MEMS systems will be composed of larger varieties of devices with very different functionality such as electronics, mechanics, optics and bio-chemistry. Integration technology of heterogeneous devices must be developed. This article first deals with the current development trend of new fabrication technologies; those include self-assembling of parts over a large area, wafer-scale encapsulation by wafer-bonding, nano imprinting, and roll-to-roll printing. In the latter half of the article, the concept towards the heterogeneous integration of devices and functionality into micro/nano systems is described. The key idea is to combine the conventional top-down technologies and the novel bottom-up technologies for building nano systems. A simple example is the carbon nano tube interconnection that is grown in the via-hole of a VLSI chip. In the laboratory level, the position-specific self-assembly of nano parts on a DNA template was demonstrated through hybridization of probe DNA segments attached to the parts. Also, bio molecular motors were incorporated in a micro fluidic system and utilized as a nano actuator for transporting objects in the channel.

Pattern Fabrication on Si (100) Surface by Using Both Nanoscratch and KOH Etching Technique (나노스크래치와 KOH 에칭 기술을 병용한 Si (100) 패턴제작)

  • 윤성원;이정우;강충길
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2003.05a
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    • pp.448-451
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    • 2003
  • This study describes a new maskless nano-fabrication technique of Si (100) using the combination of nanometer-scale mechanical forming by nano-indenter XP and KOH wet etching. First the surface of a Si (100) specimen was machined by using the nano-machining system, which utilizes the mechanism of the nano-indenter XP. Next, the specimen was etched by KOH solution. After the etching process, the convex structure or deeper hole is made because of masking or promotion effect of the affected layer generated by nano-machining. On the basis of this interesting fact, some sample structures were fabricated.

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Contact block copolymer technique을 이용한 실리콘 나노-필라 구조체 제작방법

  • Kim, Du-San;Kim, Hwa-Seong;Park, Jin-U;Yun, Deok-Hyeon;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.189-189
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    • 2015
  • Plasmonics, sensor, field effect transistors, solar cells 등 다양한 적용분야를 가지는 실리콘 구조체는 제작공정에 의해 전기적 및 광학적 특성이 달라지기 때문에 적합한 나노구조 제작방법이 요구되고 있다. 나노구조체 제작방법으로는 Photo lithography, Extreme ultraviolet lithography (EUV), Nano imprinting lithography (NIL), Block copolymer (BCP) 방식의 방법들이 연구되고 있으며, 특히 BCP는 direct self-assembly 특성을 가지고 있으며 가격적인 면에서도 큰 장점을 가진다. 하지만 BCP를 mask로 사용하여 식각공정을 진행할 경우 BCP가 버티지 못하고 변형되어 mask로서의 역할을 하지 못한다. 이러한 문제를 해결하기 위하여 본 논문에서는 BCP와 질화막을 이용한 double mask 방법을 사용하였다. 기판 위에 BCP를 self-assembly 시키고 mask로 사용하여 hole 부분으로 노출된 기판을 Ion gun을 통해 질화 시킨 후에 BCP를 제거한다. 기판 위에 hole 모양의 질화막 표면은 BCP와 다르게 etching 공정 중 변형되지 않는다. 이러한 질화막 표면을 mask로 사용하여 pillar pattern의 실리콘 나노구조체를 제작하였다. 질화막 mask로 사용되는 template은 PS와 PMMA로 구성된 BCP를 사용하였다. 140kg/mol의 polystyrene과 65kg/mol의 PMMA를 톨루엔으로 용해시키고 실리콘 표면 위에 spin coating으로 도포하였다. Spin coat 후 230도에서 40시간 동안 열처리를 진행하여 40nm의 직경을 가진 PS-b-PMMA self-assembled hole morphology를 형성하였다. 질화막 형성 및 etching을 위한 장비로 low-energy Ion beam system을 사용하였다. Reactive Ion beam은 ICP와 3-grid system으로 구성된 Ion gun으로부터 형성된다. Ion gun에 13.56 MHz의 frequency를 갖는 200W 전력을 인가하였다. Plasma로부터 나오는 Ion은 $2{\Phi}$의 직경의 hole을 가지는 3-grid hole로 추출된다. 10~70 voltage 범위의 전위를 plasma source 바로 아래의 1st gird에 인가하고, 플럭스 조절을 위해 -150V의 전위를 2nd grid에 인가한다. 그리고 3rd grid는 접지를 시켰다. chamber내의 질화 및 식각가스 공급은 2mTorr로 유지시켰다. 그리고 기판의 온도는 냉각칠러를 이용하여 -20도로 냉각을 진행하였다. 이와 같은 공정 결과로 100 nm 이상의 높이를 갖는 40 nm직경의 균일한 Silicon pillar pattern을 형성 할 수 있었다.

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Development of Metal Substrate with Multi-Stage Nano-Hole Array for Low Temperature Solid Oxide Fuel Cell (저온 고체산화물연료전지 구현을 위한 다층 나노기공성 금속기판의 제조)

  • Kang, Sangkyun;Park, Yong-Il
    • Journal of the Korean Ceramic Society
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    • v.42 no.12 s.283
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    • pp.865-871
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    • 2005
  • Submicron thick solid electrolyte membrane is essential to the implementation of low temperature solid oxide fuel cell, and, therefore, development of new electrode structures is necessary for the submicron thick solid electrolyte deposition while providing functions as current collector and fuel transport channel. In this research, a nickel membrane with multi-stage nano hole array has been produced via modified two step replication process. The obtained membrane has practical size of 12mm diameter and $50{\mu}m$ thickness. The multi-stage nature provides 20nm pores on one side and 200nm on the other side. The 20nm side provides catalyst layer and $30\~40\%$ planar porosity was measured. The successful deposition of submicron thick yttria stabilized zirconia membrane on the substrate shows the possibility of achieving a low temperature solid oxide fuel cell.

Development of Vibration Assisted Hybrid Femtosecond Laser Ultra-precision Machining System and Cu-Zn alloy Application (진동자를 이용한 하이브리드 극초단 펄스 레이저 초정밀가공시스템 개발 및 Cu-Zn합금 응용)

  • Choi, Won-Suk;Yoon, Ji-Wook;Cho, Sung-Hak;Kang, Myung-Chang
    • Journal of Powder Materials
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    • v.20 no.4
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    • pp.308-312
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    • 2013
  • In this paper, we describe experiment results using a vibration assisted hybrid femtosecond laser (${\lambda}$:795 nm) ultra-precision machining system. The hybrid system we have developed is possible that optical focal point of the femtosecond laser constantly and frequently within the range of PZT(piezoactuator) vibrator working distance. Using the hybrid system, We have experimented on brass and studied about differences of result of hole aspect ratio compare to general experiment setup of femtosecond laser system. Aspect ratio of a micro hole on brass is increased as 54% with 100 Hz vibration frequency and surface roughness of the side wall also improved compare to non-vibration.