Proceedings of the Korean Society of Precision Engineering Conference (한국정밀공학회:학술대회논문집)
- 2003.06a
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- Pages.628-631
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- 2003
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- 2005-8446(pISSN)
Maskless Nano-fabrication by using both Nanoscratch and HF Wet Etching Technique
나노스크래치와 HF 에칭기술을 병용한 Pyrex 7740의 마스크리스 나노 가공
Abstract
This study describes a new mastless nano-fabrication technique of Pyrex 7740 glass using the combination of nanomachining by nano-indenter XP and HF wet etching. First, the surface of a Pyrex 7740 glass specimen was machined by using the nano-machining system, which utilizes the mechanism of the nano-indenter XP. Next, the specimen was etched by HF solution. After the etching process, the convex structure or deeper hole is made because of masking or promotion effect of the affected layer generated by nano-machining. On the basis of this interesting fact. some sample structures were fabricated.
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