• 제목/요약/키워드: mobility of memory

검색결과 78건 처리시간 0.03초

사물 인터넷 환경에서 CoAP 기반의 신뢰성 있는 이동성 관리 방법 (Reliable Mobility Management Using CoAP in Internet of Things Environments)

  • 천승만;김현수;함창균;정윤석;박종태
    • 전자공학회논문지
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    • 제53권8호
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    • pp.13-18
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    • 2016
  • 사물 인터넷 (IoT : Internet of things) 환경에서 여러 종류의 스마트 디바이스들은 스마트 헬스케어 서비스와 같은 원격 모니터링 서비스를 제공하기 위해 4G/5G, WiBro, 블루투스 등의 다양한 네트워크 기술을 통해 인터넷에 연결된다. IETF Mobile IP 기반의 대부분의 국제표준 인터넷 이동성 관리 기술은 IoT 환경에서 디바이스들이 가지고 있는 제한적인 전력, 제한적인 CPU 처리 및 메모리 능력 및 과도한 시그널링 오버헤드로 인해 사물인터넷 환경에 적합하지 않다. 본 논문에서는 IoT 환경에서 신뢰성있는 이동성 관리를 위해 IETF CoAP에 기반한 새로운 이동성관리 프로토콜인 CoMP (CoAP-based Mobility Management Protocol)를 제시한다. CoMP는 Constrained 환경에서도 신뢰성 있게 이동성관리를 제공할 수 있는 장점을 제공한다. CoMP의 구조 및 알고리즘을 제시하고, 마지막으로 수학적 분석과 시뮬레이션을 사용하여 성능평가를 하였다.

Fin의 두께와 높이 변화에 따른 22 nm FinFET Flash Memory에서의 전기적 특성

  • 서성은;김태환
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.329-329
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    • 2012
  • Mobile 기기로 둘러싸여있는 현대의 환경에서 Flash memory에 대한 중요성은 날로 더해가고 있다. Flash memory의 가격 경쟁력 강화와 사용되는 기기의 소형화를 위해 flash memory의 비례축소가 중요한 문제로 부각되고 있다. 그러나 다결정 실리콘을 플로팅 게이트로 이용하는planar flash memory 소자의 경우 비례 축소 시 short channel effect 와 leakage current, subthreshold swing의 증가로 인한 성능저하와 같은 문제들로 인해 한계에 다다르고 있다. 이를 해결하기 위해 CTF 메모리 소자, nanowire FET, FinFET과 같은 새로운 구조를 가지는 메모리소자에 대한 연구가 활발히 진행되고 있다. 본 연구에서는 22 nm 게이트 크기의 FinFET 구조를 가지는 플래시 메모리소자에서 fin의 두께와 높이의 변화에 따른 메모리 소자의 전기적 특성을 3-dimensional 구조에서 technology computer aided design ( TCAD ) tool을 이용하여 시뮬레이션 하였다. 본 연구에서는 3D FinFET 구조를 가진 플래시 메모리에 대한 시뮬레이션 하였다. FinFET 구조에서 채널영역은 planar 구조와 다르게 표면층이 multi-orientation을 가지므로 본 계산에서는 multi-orientation Lombardi mobility model을 이용하여 계산하였다. 계산에 사용된 FinFET flash memory 구조는 substrate의 도핑농도는 $1{\times}10^{18}$로 하였으며 source, drain, gate의 도핑농도는 $1{\times}10^{20}$으로 설정하여 계산하였다. Fin 높이는 28 nm로 고정한 상태에서 fin의 두께는 12 nm부터 28nm까지 6단계로 나누어서 각 구조에 대한 프로그램 특성과 전기적 특성을 관찰 하였다. 계산결과 FinFET 구조의 fin 두께가 두꺼워 질수록 채널형성이 늦어져 threshold voltage 값이 커지게 되고 subthreshold swing 값 또한 증가하여 전기적 특성이 나빠짐을 확인하였다. 각 구조에서의 전기장과 전기적 위치에너지의 분포가 fin의 두께에 따라 달라지므로써 이로 인해 프로그램 특성과 전기적 특성이 변화함을 확인하였다.

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엘라스토머 기판 상에 제작한 유기 강유전체 메모리 소자의 전기적 특성 (Electrical Characteristics of Organic Ferroelectric Memory Devices Fabricated on Elastomeric Substrate)

  • 정순원;류봉조;구경완
    • 전기학회논문지
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    • 제67권6호
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    • pp.799-803
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    • 2018
  • We demonstrated memory thin-film transistors (MTFTs) with organic ferroelectric polymer poly(vinylidene fluoride-co-trifluoroethylene) and an amorphous oxide semiconducting indium gallium zinc oxide channel on the elastomeric substrate. The dielectric constant for the P(VDF-TrFE) thin film prepared on the elastomeric substrate was calculated to be 10 at a high frequency of 1 MHz. The voltage-dependent capacitance variations showed typical butterfly-shaped hysteresis behaviors owing to the polarization reversal in the film. The carrier mobility and memory on/off ratio of the MTFTs showed $15cm^2V^{-1}s^{-1}$ and $10^6$, respectively. This result indicates that the P(VDF-TrFE) film prepared on the elastomeric substrate exhibits ferroelectric natures. The fabricated MTFTs exhibited sufficiently encouraging device characteristics even on the elastomeric substrate to realize mechanically stretchable nonvolatile memory devices.

Low-Temperature Poly-Si TFT Charge Trap Flash Memory with Sputtered ONO and Schottky Junctions

  • An, Ho-Myoung;Kim, Jooyeon
    • Transactions on Electrical and Electronic Materials
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    • 제16권4호
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    • pp.187-189
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    • 2015
  • A charge-trap flash (CTF) thin film transistor (TFT) memory is proposed at a low-temperature process (≤ 450℃). The memory cell consists of a sputtered oxide-nitride-oxide (ONO) gate dielectric and Schottky barrier (SB) source/drain (S/D) junctions using nickel silicide. These components enable the ultra-low-temperature process to be successfully achieved with the ONO gate stacks that have a substrate temperature of room temperature and S/D junctions that have an annealing temperature of 200℃. The silicidation process was optimized by measuring the electrical characteristics of the Ni-silicided Schottky diodes. As a result, the Ion/Ioff current ratio is about 1.4×105 and the subthreshold swing and field effect mobility are 0.42 V/dec and 14 cm2/V·s at a drain voltage of −1 V, respectively.

Langmuir-Blodgett 법을 이용한 P(VDF-TrFE) 박막 트랜지스터 (P(VDF-TrFE) Thin Film Transistors using Langmuir-Blodgett Method)

  • 김광호
    • 반도체디스플레이기술학회지
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    • 제19권2호
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    • pp.72-76
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    • 2020
  • The author demonstrated organic ferroelectric thin-film transistors with ferroelectric materials of P(VDF-TrFE) and an amorphous oxide semiconducting In-Ga-Zn-O channel on the silicon substrates. The organic ferroelectric layers were deposited on an oxide semiconductor layer by Langmuir-Blodgett method and then annealed at 128℃ for 30min. The carrier mobility and current on/off ratio of the memory transistors showed 9 ㎠V-1s-1 and 6 orders of magnitude, respectively. We can conclude from the obtained results that proposed memory transistors were quite suitable to realize flexible and werable electronic applications.

현대 공간에서 나타나는 베르그송의 동시성 연구 (A Study on Bergson's Simultaneity Revealed in Modern Spaces)

  • 이상준;이찬
    • 한국실내디자인학회논문집
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    • 제24권4호
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    • pp.51-60
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    • 2015
  • This study aims to establish the foundation for a simultaneity research, draw the potential through Bergson's simultaneity, and explore a space with the possibility of a continued change, focusing on the simultaneous process, in which physical mobility and consciousness of space last together. First, this study was focused on understanding Bergson's simultaneity, on the basis of the perspective that space needs to have more active, dynamic mobility. For understanding Bergson's simultaneity, the understanding of Bergson's duration conception, memory and perception was preceded. After that, the characteristics of simultaneity were extracted from the concepts of duration, change, memory and perception and its characteristics, which are connected to space, were analyzed. As a result, the study on simultaneity that was intensively analyzed, based on diverse cases, re-awakened the basis of value or thought, which we must aim at, in space design of the present time. This shows the possibility of another creative form that can be found in spaces of the present time and serves as the foundation to discover an essential and potential value of space in space design. Moreover, the combination of space with science, humanities, art and digital media technology demonstrated once again that there is a good possibility of approaching non-representational space that is pursued today and it is anticipated that using Bergson's simultaneity as a medium for spatial combination in their relationship would help in drawing deeper internal meaning and potential of space.

Memory Effect of $In_2O_3$ Quantum Dots and Graphene in $SiO_2$ thin Film

  • Lee, Dong Uk;Sim, Seong Min;So, Joon Sub;Kim, Eun Kyu
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.240.2-240.2
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    • 2013
  • The device scale of flash memory was confronted with quantum mechanical limitation. The next generation memory device will be required a break-through for the device scaling problem. Especially, graphene is one of important materials to overcome scaling and operation problem for the memory device, because ofthe high carrier mobility, the mechanicalflexibility, the one atomic layer thick and versatile chemistry. We demonstrate the hybrid memory consisted with the metal-oxide quantum dots and the mono-layered graphene which was transferred to $SiO_2$ (5 nm)/Si substrate. The 5-nm thick secondary $SiO_2$ layer was deposited on the mono-layered graphene by using ultra-high vacuum sputtering system which base pressure is about $1{\times}10^{-10}$ Torr. The $In_2O_3$ quantum dots were distributed on the secondary $SiO_2$2 layer after chemical reaction between deposited In layer and polyamic acid layer through soft baking at $125^{\circ}C$ for 30 min and curing process at $400^{\circ}C$ for 1 hr by using the furnace in $N_2$ ambient. The memory devices with the $In_2O_3$ quantum dots on graphene monolayer between $SiO_2$ thin films have demonstrated and evaluated for the application of next generation nonvolatile memory device. We will discuss the electrical properties to understating memory effect related with quantum mechanical transport between the $In_2O_3$ quantum dots and the Fermi level of graphene layer.

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Nonvolatile Ferroelectric P(VDF-TrFE) Memory Transistors Based on Inkjet-Printed Organic Semiconductor

  • Jung, Soon-Won;Na, Bock Soon;Baeg, Kang-Jun;Kim, Minseok;Yoon, Sung-Min;Kim, Juhwan;Kim, Dong-Yu;You, In-Kyu
    • ETRI Journal
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    • 제35권4호
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    • pp.734-737
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    • 2013
  • Nonvolatile ferroelectric poly(vinylidene fluoride-co-trifluoroethylene) memory based on an organic thin-film transistor with inkjet-printed dodecyl-substituted thienylenevinylene-thiophene copolymer (PC12TV12T) as the active layer is developed. The memory window is 4.5 V with a gate voltage sweep of -12.5 V to 12.5 V. The field effect mobility, on/off ratio, and gate leakage current are 0.1 $cm^2/Vs$, $10^5$, and $10^{-10}$ A, respectively. Although the retention behaviors should be improved and optimized, the obtained characteristics are very promising for future flexible electronics.

Investigating InSnZnO as an Active Layer for Non-volatile Memory Devices and Increasing Memory Window by Utilizing Silicon-rich SiOx for Charge Storage Layer

  • Park, Heejun;Nguyen, Cam Phu Thi;Raja, Jayapal;Jang, Kyungsoo;Jung, Junhee;Yi, Junsin
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.324-326
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    • 2016
  • In this study, we have investigated indium tin zinc oxide (ITZO) as an active channel for non-volatile memory (NVM) devices. The electrical and memory characteristics of NVM devices using multi-stack gate insulator SiO2/SiOx/SiOxNy (OOxOy) with Si-rich SiOx for charge storage layer were also reported. The transmittance of ITZO films reached over 85%. Besides, ITZO-based NVM devices showed good electrical properties such as high field effect mobility of 25.8 cm2/V.s, low threshold voltage of 0.75 V, low subthreshold slope of 0.23 V/dec and high on-off current ratio of $1.25{\times}107$. The transmission Fourier Transform Infrared spectroscopy of SiOx charge storage layer with the richest silicon content showed an assignment at peaks around 2000-2300 cm-1. It indicates that many silicon phases and defect sources exist in the matrix of the SiOx films. In addition, the characteristics of NVM device showed a retention exceeding 97% of threshold voltage shift after 104 s and greater than 94% after 10 years with low operating voltage of +11 V at only 1 ms programming duration time. Therefore, the NVM fabricated by high transparent ITZO active layer and OOxOy memory stack has been applied for the flexible memory system.

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Anomaly detection of smart metering system for power management with battery storage system/electric vehicle

  • Sangkeum Lee;Sarvar Hussain Nengroo;Hojun Jin;Yoonmee Doh;Chungho Lee;Taewook Heo;Dongsoo Har
    • ETRI Journal
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    • 제45권4호
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    • pp.650-665
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    • 2023
  • A novel smart metering technique capable of anomaly detection was proposed for real-time home power management system. Smart meter data generated in real-time were obtained from 900 households of single apartments. To detect outliers and missing values in smart meter data, a deep learning model, the autoencoder, consisting of a graph convolutional network and bidirectional long short-term memory network, was applied to the smart metering technique. Power management based on the smart metering technique was executed by multi-objective optimization in the presence of a battery storage system and an electric vehicle. The results of the power management employing the proposed smart metering technique indicate a reduction in electricity cost and amount of power supplied by the grid compared to the results of power management without anomaly detection.