• Title/Summary/Keyword: high transmittance

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분위기 가스에 따른 ITO 박막의 전기적 및 구조적 특성 (Electrical and Structural characteristics of ITO thin films deposited under different ambient gases)

  • 허주희;한대섭;이유림;이규만;김인우
    • 반도체디스플레이기술학회지
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    • 제7권4호
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    • pp.7-11
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    • 2008
  • ITO (Indium Tin Oxide) thin films have been extensively studied for OLED devices because they have high transparent properties in the visible wavelength and a low electrical resistivity. These ITO films are deposited by rf-magnetron sputtering under different ambient gases (Ar, Ar+$O_2$ and Ar+$H_2$) at $300^{\circ}C$. In order to investigate the influences of the oxygen and hydrogen, the flow rate of oxygen and hydrogen in argon has been changed from 0.5sccm to 5sccm and from 0.01sccm to 0.25sccm respectively. The resistivity of ITO film increased with increasing flow rate of $O_2$ under Ar+$O_2$ while it is nearly constant under Ar+$H_2$. And the peak of ITO films obtained (222) and (400) orientations and the average transmittance was over 80% in the visible range. The OLED device fabricated with different ITO substrates made by configuration of ITO/$\alpha$-NPD/Alq3/LiF/Al to elucidate the performance of ITO substrate for OLED device.

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A Study on Thermal Stability of Ga-doped ZnO Thin Films with a $TiO_2$ Barrier Layer

  • Park, On-Jeon;Song, Sang-Woo;Lee, Kyung-Ju;Roh, Ji-Hyung;Kim, Hwan-Sun;Moon, Byung-Moo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.434-436
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    • 2013
  • Ga-doped ZnO (GZO) was substitutes of the SnO2:F films on soda lime glass substrate in the photovoltaic devices such as CIGS, CdTe and DSSC due to good properties and low cost. However, it was reported that the electrical resistivity of GZO is unstable above $300^{\circ}C$ in air atmosphere. To improve thermal stability of GZO thin films at high temperature above $300^{\circ}C$ an $TiO_2$ thin film was deposited on the top of GZO thin films as a barrier layer by Pulsed Laser Deposition (PLD) method. $TiO_2$ thin films were deposited at various thicknesses from 25 nm to 100 nm. Subsequently, these films were annealed at temperature of $300^{\circ}C$, $400^{\circ}C$, $500^{\circ}C$ in air atmosphere for 20 min. The XRD measurement results showed all the films had a preferentially oriented ( 0 0 2 ) peak, and the intensity of ( 0 0 2 ) peak nearly did not change both GZO (300 nm) single layer and $TiO_2$ (50 nm)/GZO (300 nm) double layer. The resistivity of GZO (300 nm) single layer increased from $7.6{\times}10^{-4}{\Omega}m$ (RT) to $7.7{\times}10^{-2}{\Omega}m$ ($500^{\circ}C$). However, in the case of the $TiO_2$ (50 nm)/GZO (300 nm) double layer, resistivity showed small change from $7.9{\times}10^{-4}{\Omega}m$ (RT) to $5.2{\times}10^{-3}{\Omega}m$ ($500^{\circ}C$). Meanwhile, the average transmittance of all the films exceeded 80% in the visible spectrum, which suggests that these films will be suitable for photovoltaic devices.

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수분산 Polyurethane/Poly(3,4-ethylenedioxythiophene) 혼성 필름의 물리화학적 특성 향상 (Improvement of Physicochemical Properties of Waterborne Polyurethane/Poly(3,4-ethylenedioxythiophene) Hybrid Thin Films)

  • 고영수;임진형
    • 폴리머
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    • 제37권5호
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    • pp.587-591
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    • 2013
  • Poly(3,4-ethylenedioxythiophene)(PEDOT)은 높은 전기 전도도, 광학적 투과성 및 좋은 화학적 안정성을 가지고 있는 반면 낮은 물리화학적 물성을 가지고 있다. 본 연구의 목적으로 PEDOT의 내용제성 및 필름경도와 같은 물리화학적 특성을 향상시키고자 하였다. 음이온성 수성폴리우레탄(WPU)이 가지는 카르복실기는 아지리딘 존재 하에서 효과적인 가교반응이 일어나 물리화학적 특성이 개선된 WPU/PEDOT 혼성 전도성 박막을 제조할 수 있다. 다양한 WPU 및 고형분 함량별로 WPU/PEDOT 유기-유기 혼성 박막을 제조하여 전기적/물리화학적 특성을 비교하였다. 고형분 함량이 증가할수록 투과율과 표면저항은 감소하였다. WPU/PEDOT 혼성 전도성 박막의 연필경도와 내용제성이 WPU가 가지는 카르복실기의 가교반응에 인해 효과적으로 증가하였다.

Electrical and Mechanical Properties of Indium-tin-oxide Films Deposited on Polymer Substrate Using Organic Buffer Layer

  • Han, Jeong-In;Lee, Chan-Jae;Rark, Sung-Kyu;Kim, Won-Keun;Kwak, Min-GI
    • Journal of Information Display
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    • 제2권2호
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    • pp.52-60
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    • 2001
  • The electrical and mechanical properties in indium-tin-oxide films deposited on polymer substrate were examined. The materials of substrates were polyethersulfone (PES) which have gas barrier layer and anti-glare coating for plastic-based devices. The experiments were performed by rf-magnetron sputtering using a special instrument and buffer layers. Therefore, we obtained a very flat polymer substrate deposited ITO film and investigated the effects of buffer layers, and the instrument. Moreover, the influences of an oxygen partial pressure and post-deposition annealing in ITO films deposited on polymer substrates were clarified. X-ray diffraction observation, measurement of electrical property, and optical microscope observation were performed for the investigation of micro-structure and electro-mechanical properties, and they indicated that as-deposited ITO thin films are amorphous and become quasi-crystalline after adjusting oxygen partial pressure and thermal annealing above $180^{\circ}C$. As a result, we obtained 20-25 ${\Omega}/sq$ of ITO films with good transmittance (above 80 %) of oxygen contents with under 0.2 % and vacuum annealing. Furthermore, using organic buffer layer, we obtained ITO films which have a rather high electrical resistance (40-45 ${\Omega}/sq$) but have improved optical (more than 85 %) and mechanical characteristics compared to the counterparts. Consequently, a prototype reflective color plastic film LCD was fabricated using the PES polymer substrates to confirm whether the ITO films could be realized in accordance with our experimental results.

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높은 결정성을 갖는 이산화티탄 나노입자의 합성 (Synthesis of Titanium Dioxide Nanoparticles with a High Crystalline Characteristics)

  • 김기출
    • 융합정보논문지
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    • 제7권5호
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    • pp.53-58
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    • 2017
  • 석유 고갈의 시대에 저가이면서 반투명한 특징을 갖고 있는 염료감응형 태양전지(DSC)는 1991년 $Gr{\ddot{a}}tzel$의 연구결과 보고 이후 많은 주목을 받아왔다. 염료감응형 태양전지의 광전극의 빛 수확 성능을 증진시키고, 궁극적으로 광전변환효율을 향상시키기 위하여 다양한 구조를 갖는 산란층이 광전극 소재로 제안되었다. DSC 광전극의 산란층에서 산란의 중심으로는 지름이 250 - 300 nm 정도의 크기를 갖는 비교적 큰 이산화티탄 나노입자가 필요하다. 본 연구에서는 변형된 졸겔 공정을 이용하여 약 300 nm 크기의 이산화티탄 나노결정을 합성하였다. XRD와 TEM 분석결과에 의하면, 합성된 이산화티탄 나노입자는 아나타제 상의 단결정 특성을 나타내었다. 합성된 이산화티탄 나노입자를 이용하여 스핀 코팅 공정으로 제조된 이산화티탄 박막의 광학적 투과율은 550 nm 파장에서 약 50%로 측정되었다. 이처럼 적당한 투과율은 DSC 산란층의 산란 중심으로 사용하기에 적합하며, DSC의 광전변환효율 향상에 적절하게 기여할 것으로 기대된다.

Parametric Studies of Pulsed Laser Deposition of Indium Tin Oxide and Ultra-thin Diamond-like Carbon for Organic Light-emitting Devices

  • Tou, Teck-Yong;Yong, Thian-Khok;Yap, Seong-Shan;Yang, Ren-Bin;Siew, Wee-Ong;Yow, Ho-Kwang
    • Journal of the Optical Society of Korea
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    • 제13권1호
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    • pp.65-74
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    • 2009
  • Device quality indium tin oxide (ITO) films are deposited on glass substrates and ultra-thin diamond-like carbon films are deposited as a buffer layer on ITO by a pulsed Nd:YAG laser at 355 nm and 532 nm wavelength. ITO films deposited at room temperature are largely amorphous although their optical transmittances in the visible range are > 90%. The resistivity of their amorphous ITO films is too high to enable an efficient organic light-emitting device (OLED), in contrast to that deposited by a KrF laser. Substrate heating at $200^{\circ}C$ with laser wavelength of 355 nm, the ITO film resistivity decreases by almost an order of magnitude to $2{\times}10^{-4}\;{\Omega}\;cm$ while its optical transmittance is maintained at > 90%. The thermally induced crystallization of ITO has a preferred <111> directional orientation texture which largely accounts for the lowering of film resistivity. The background gas and deposition distance, that between the ITO target and the glass substrate, influence the thin-film microstructures. The optical and electrical properties are compared to published results using other nanosecond lasers and other fluence, as well as the use of ultra fast lasers. Molecularly doped, single-layer OLEDs of ITO/(PVK+TPD+$Alq_3$)/Al which are fabricated using pulsed-laser deposited ITO samples are compared to those fabricated using the commercial ITO. Effects such as surface texture and roughness of ITO and the insertion of DLC as a buffer layer into ITO/DLC/(PVK+TPD+$Alq_3$)/Al devices are investigated. The effects of DLC-on-ITO on OLED improvement such as better turn-on voltage and brightness are explained by a possible reduction of energy barrier to the hole injection from ITO into the light-emitting layer.

유연 기판 위에 증착된 IZO 박막의 구조적 및 전기적 특성 (Structural and electrical characteristics of IZO thin films deposited on flexible substrate)

  • 이봉근;이규만
    • 반도체디스플레이기술학회지
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    • 제10권2호
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    • pp.39-44
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    • 2011
  • In this study, we have investigated the structural and electrical characteristics of IZO thin films deposited on flexible substrate for the OLED (organic light emitting diodes) devices. For this purpose, PES was used for flexible substrate and IZO thin films were deposited by RF magnetron sputtering under oxygen ambient gases (Ar, $Ar+O_2$) at room temperature. In order to investigate the influences of the oxygen, the flow rate of oxygen in argon mixing gas has been changed from 0.1sccm to 0.5sccm. All the samples show amorphous structure regardless of flow rate. The electrical resistivity of IZO films increased with increasing flow rate of $O_2$ under $Ar+O_2$. All the films showed the average transmittance over 85% in the visible range. The OLED device was fabricated with different IZO electrodes made by configuration of IZO/a-NPD/DPVB/$Alq_3$/LiF/Al to elucidate the performance of IZO substrate. OLED devices with the amorphous-IZO (a-IZO) anode film show better current density-voltage-luminance characteristics than that of OLED devices with the commercial crystalline-ITO (c-ITO) anode film. It can be explained that very flat surface roughness and high work function of a-IZO anode film lead to more efficient hole injection by reduction of interface barrier height between anode and organic layers. This suggests that a-IZO film is a promising anode materials substituting conventional c-ITO anode in OLED devices.

투명전자소자를 위한 HfO2계 투명 MIM 커패시터 특성연구 (Characteristics of Transparent Mim Capacitor using HfO2 System for Transparent Electronic Device)

  • 조영제;이지면;곽준섭
    • 한국진공학회지
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    • 제18권1호
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    • pp.30-36
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    • 2009
  • 투명 전자소자의 고유전 $HfO_2$ 절연막을 개발하기 위하여, ITO/$HfO_2$/ITO 금속-절연체-금속 (Metal-Insulator-Metal, MIM) 커패시터 구조를 형성한후 $HfO_2$ 박막의 두께에 따른 전기적, 광학적, 구조적 특성의 변화를 연구하였다. $HfO_2$ 박막의 두께가 50 nm에서 300 nm로 증가함에 따라 유전상수는 20에서 10이하로 감소하였으나, $HfO_2$ 두께가 증가함에 따라 누설전류는 감소하여 200 nm 이상의 두께에서는 $2.7{\times}10^{-12}\;A/cm^2$ 이하의 낮은 누설전류 특성을 나타내었다. ITO/$HfO_2$/ITO MIM 커패시터의 $HfO_2$ 박막의 두께가 50 nm에서 300 nm로 증가함에 따라 투과율은 감소하였으나 300 nm 두께에서도 가시광선 영역에서 80% 이상의 투과율을 나타내어 우수한 투과도 특성을 나타내었다.

RF 마그네트론 스퍼터링법으로 증착된 Al 도핑된 ZnO 투명 전도 산화막의 Ar 유량에 따른 특성 (Properties of Al-doped ZnO Transparent Conducting Oxide Films Deposited with Ar Flow Rate by RF Magnetron Sputtering)

  • 이인환;김덕규;김홍배
    • 한국진공학회지
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    • 제19권3호
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    • pp.206-210
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    • 2010
  • RF 마그네트론 스퍼터링법을 이용하여 Al 도핑된 ZnO 박막을 Ar 유량에 따라 증착하고 박막의 다양한 특성을 연구하였다. ZnO 박막의 Ar 유량 변화를 통해 고품질 박막을 증착할 수 있었고 Al 도핑된 ZnO 박막에 대한 Ar 유량의 영향을 확인하였다. 모든 Al 도핑된 ZnO에서 80% 이상의 좋은 투과도를 보였다. Hall 측정과 X-ray photoelectron spectrometer 측정 결과, 비저항이 가장 작은 60 sccm에서 가장 작은 Al 도핑 농도를 보였다. Ar 유량에 따른 Al 도핑된 ZnO 박막에서의 전기적인 특성은 Al 도핑 농도보다 산소 공공에 의해 더 영향을 받음을 확인하였다.

전면 유리와 EVA의 광 반사에 의한 PV모듈의 광전류 손실 예측 시뮬레이션 (A Simulation of Photocurrent Loss by Reflectance of the Front Glass and EVA in the Photovoltaic Module)

  • 이상훈;송희은;강기환;안형근;한득영
    • 전기학회논문지
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    • 제62권1호
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    • pp.76-82
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    • 2013
  • The solar cell is a device to convert light energy into electric, which supplies power to the external load when exposed to the incident light. The photocurrent and voltage occurred in the device are significant factors to decide the output power of solar cells. The crystalline silicon solar cell module has photocurrent loss due to light reflections on the glass and EVA(Ethylene Vinyl Acetate). These photocurrent loss would be a hinderance for high-efficiency solar cell module. In this paper, the quantitative analysis for the photocurrent losses in the 300-1200 wavelength region was performed. The simulation method with MATLAB was used to analyze the reflection on a front glass and EVA layer. To investigate the intensity of light that reached solar cells in PV(Photovoltaic) module, the reflectance and transmittance of PV modules was calculated using the Fresnel equations. The simulated photocurrent in each wavelength was compared with the output of real solar cells and the manufactured PV module to evaluate the reliability of simulation. As a result of the simulation, We proved that the optical loss largely occurred in wavelengths between 300 and 400 nm.