• Journal of the Korean Ceramic Society
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• v.36 no.7
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• pp.762-766
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• 1999

The crystal structure of A2+(Mg1/3Nb2/3)O3,(A2+=Sr2+ and Ca2+)ceramics was studied usig X-ray diffraction (XRD) and high resolution transmission electrion microscopy(HRTEM). Ba(Mg1/3Nb2/3)O3 (SMN) has the 1:2 ordered monoclinic structure which has the anti-phase tilt of octahedra. The type of tilting in SMN was considered to be a$^{\circ}$a$^{\circ}$c- or a­a­c$^{\circ}$ Ca(Mg1/3Nb2/3)O3 (CMN) also has the 1:2 ordered monoclinic structure which was distorted by the anti-phase tilt or in-phsae tilt of octahedra. A unit cell containing both the in-phase tilt axis and anti-phase tilt axis was not observed in the CMN. Therefore CMN has the mixed phase consisting of the 1:2 ordered monoclinic phase with anti-phase tilt of octahedra and the one with in -phase tilt of ocatahedra,. The anti-parallel shift of cation was also observed in the CMN.

• The Korean Journal of Ceramics
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• v.6 no.2
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• pp.129-133
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• 2000

Boron nitride films were synthesized with $N_2$ion flux of low energy, up to 100 eV, at different substrate temperatures of no heating, 200, 400, 500, and $800^{\circ}C$, respectively. Boron was supplied by e-beam evaporation at the rate of $1.5\AA$/sec. For all the conditions, hexagonal BN (h-BN) phase was mainly synthesized and high resolution transmission electron microscopy (HRTEM) showed that (002) planes of h-BN phase were aligned vertical to the Si substrate. The maximum alignment occurred around $400^{\circ}C$. In addition to major h-BN phase, transmission electron diffraction (TED) rings identified the formation of cubic BN (c-BN) phase. But HRTEM showed no distinct and continuous c-BN layer. These results suggest that c-BN phase may form in a scattered form even when h-BN phase is mainly synthesized under small momentum transfer by bombarding ions, which are not reconciled with the macro compressive stress model for the c-BN formation.

• Korean Journal of Metals and Materials
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• v.48 no.7
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• pp.660-666
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• 2010

30 nm thick Ni layers were deposited on a glass substrate by e-beam evaporation. Subsequently, 30 nm or 60 nm ${\alpha}-Si:H$ layers were grown at low temperatures ($<220^{\circ}C$) on the 30 nm Ni/Glass substrate by catalytic CVD (chemical vapor deposition). The sheet resistance, phase, microstructure, depth profile and surface roughness of the $\alpha-Si:H$ layers were examined using a four-point probe, HRXRD (high resolution Xray diffraction), Raman Spectroscopy, FE-SEM (field emission-scanning electron microscopy), TEM (transmission electron microscope) and AES depth profiler. The Ni layers reacted with Si to form NiSi layers with a low sheet resistance of $10{\Omega}/{\Box}$. The crystallinty of the $\alpha-Si:H$ layers on NiSi was up to 60% according to Raman spectroscopy. These results show that both nano-scale NiSi layers and crystalline Si layers can be formed simultaneously on a Ni deposited glass substrate using the proposed low temperature catalytic CVD process.

• Journal of the Korean Magnetics Society
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• v.21 no.6
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• pp.214-218
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• 2011

In this study, we have systematically investigated the effect of sputtering conditions on the microstructural properties of Ag/CoFeB thin film on MgO substrate. It was found that the crystallinity and surface roughness of the Ag film strongly depends on the Ar sputtering pressure and sputtering power. Epitaxial growth of Ag(100) film on MgO(100) substrate was achieved under the sputtering conditions of high sputtering power and elevated temperature. XRR (X-ray reflectivity) and high-resolution TEM (transmission electron microscopy) measurements also revealed the interfacial roughening in the Ag/CoFeB interface due to the island structure formation and intermixing between Ag and CoFeB.

• Korean Journal of Materials Research
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• v.18 no.7
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• pp.362-366
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• 2008

The precipitation behavior in Mg-6 wt%Zn-1 wt%Y alloy annealed at different temperatures of $200^{\circ}C$ and $400^{\circ}C$ has been characterized by high resolution transmission electron microscope. When the alloy is annealed at $200^{\circ}C$ for 6 hr, the plate- and the rod-shaped ${\beta}_2'$ phases are precipitated in the matrix. The orientation relationship of plate-shaped precipitates with the matrix exhibits a [$11{\bar{2}}0]{\beta}_2$ || [$10{\bar{1}}0$]Mg, $(0001){\beta}_2'$ || (0001)Mg. While the rod-shaped precipitates have two kinds of the orientation relationships with the matrix, i.e. $[11{\bar{2}}0]{\beta}_2'$||[0001] Mg, $(0001){\beta}_2'||(11{\bar{2}}0)$ Mg and $[11{\bar{2}}0]{\beta}_2'$||[0001] Mg, $({\bar{1}}106){\beta}_2'||(10{\bar{1}}0)$ Mg. With increasing annealing time at $200^{\circ}C$ the ${\beta}_1'$ phases are also precipitated in the matrix and the orientation relationship exhibits a $[010]{\beta}_1'$ || [0001]Mg, $(603){\beta}_1'$ || ($01{\bar{1}}0$)Mg between the ${\beta}_1'$ precipitate and the matrix. The icosahedral phases are precipitated in the alloy annealed at $400^{\circ}C$ and exhibit a $[I2]_I$ || [0001]Mg relationship with the matrix.

• Applied Microscopy
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• v.38 no.4
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• pp.279-284
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• 2008

The phase change materials have been extensively used as an optical rewritable data storage media utilizing their phase change properties. Recently, the phase change materials have been spotlighted for the application of non-volatile memory device, such as the phase change random access memory. In this work, we have investigated the crystallization behavior and microstructure analysis of In-Sb-Te (IST) thin films deposited by RF magnetron sputtering. Transmission electron microscopy measurement was carried out after the annealing at $300^{\circ}C$, $350^{\circ}C$, $400^{\circ}C$ and $450^{\circ}C$ for 5 min. It was observed that InSb phases change into $In_3SbTe_2$ phases and InTe phases as the temperature increases. It was found that the thickness of thin films was decreased and the grain size was increased by the bright field transmission electron microscopy (BF TEM) images and the selected area electron diffraction (SAED) patterns. In a high resolution transmission electron microscopy (HRTEM) study, it shows that $350^{\circ}C$-annealed InSb phases have {111} facet because the surface energy of a {111} close-packed plane is the lowest in FCC crystals. When the film was heated up to $400^{\circ}C$, $In_3SbTe_2$ grains have coherent micro-twins with {111} mirror plane, and they are healed annealing at $450^{\circ}C$. From the HRTEM, InTe phase separation was occurred in this stage. It can be found that $In_3SbTe_2$ forms in the crystallization process as composition of the film near stoichiometric composition, while InTe phase separation may take place as the composition deviates from $In_3SbTe_2$.

• Journal of the Korean Ceramic Society
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• v.46 no.3
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• pp.336-343
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• 2009

Nickel oxide thin films exhibit the resistive switching as a function of applied voltages. The switching phenomena involve low and high resistance states after electroforming. The electrical features are believed to be associated with the formation and rupture of filaments. The set and reset behaviors are controlled by the oxidation and reduction of filaments. The indirect evidence of filaments is corroborated by the presence of nanocrystalline nickel oxides found in high-resolution transmission electron microscopy. The insertion of insulating layers seems to control the current-voltage characteristics by preventing the continuous formation of conductive filaments, potentially leading to artificial control of resistive behaviors in NiO-based systems.

• Korean Journal of Materials Research
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• v.6 no.1
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• pp.84-89
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• 1996

분자선 증착법(Molecular Beam Epitaxy)에 의하여 성장시킨 고농도 InGaAs layer에서 성장중지법이 계면 거칠기에 미치는 영향이 연구되었다. 계면을 평활화하기 위하여 단원자층의 GaAs 또는 AIAs를 InGaAs alyer 양쪽 계면에 증착한 뒤 뒤이어 성장중지를 실시하였다. Photoluminescence(PL) 측정에 의하면, 단원자 GaAs층 증착을 통한 평활화법보다 상당히 향상된 계면조건을 보여졌다. 고 분해능 단면 전자현미경법(Cross-section high resolution transmission electron microscopy, XHRTEM)에 의해 관찰되어진바, 계면 평활화법에 의해 계면의 평활성, 연속성 및 결정결함 밀도등에서 현저한 향상이 얻어졌다.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.364.1-364.1
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• 2016

We report the characteristics of individual ultra-long SnO2 nanowires(NWs) grown on sapphire(0001) substrates by vapor transport method. NWs, with typical lengths of >$400{\mu}m$, grew in the form of NW bundles under a hydrogen reducing atmosphere, without metal catalysts. The individual NWs were examined using high-resolution X-ray diffraction, transmission electron microscopy, and micro-Raman spectroscopy. The results revealed that the SnO2 NWs grew as high-quality, tetragonal-rutile-phase single crystals with mosaic distributions of $0.02^{\circ}$ and $0.026^{\circ}$ in the (101) and (110) planes, respectively.

• Electrical & Electronic Materials
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• v.16 no.9
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• pp.61.1-61
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• 2003

Stoichiometric, uniform, amorphous ZrO$_2$ films with an equivalent oxide thickness of ∼1.5nm and a dielectric constant of ∼18 were deposited by an atomic layer controlled deposition process on silicon for potential application in meta-oxide-semiconductor(MOS) devices. The conduction mechanism is identified as Schottky emission at low electric fields and as Poole-Frenkel emission at high electric fields. the MOS devices showed low leakage current, small hysteresis(〈50mV), and low interface state density(∼2*10e11/cm2eV). Microdiffraction and high-resolution transmission electron microscopy showed a localized monoclinic phase of ${\alpha}$-ZrO$_2$ and an amorphous interfacial ZrSi$\_$x/O$\_$y/ layer which has a correspondign dielectric constant of 11