• Title/Summary/Keyword: high doping concentration

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The Effects of Doping Hafnium on Device Characteristics of $SnO_2$ Thin-film Transistors

  • Sin, Sae-Yeong;Mun, Yeon-Geon;Kim, Ung-Seon;Park, Jong-Wan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.199-199
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    • 2011
  • Recently, Thin film transistors (TFTs) with amorphous oxide semiconductors (AOSs) can offer an important aspect for next generation displays with high mobility. Several oxide semiconductor such as ZnO, $SnO_2$ and InGaZnO have been extensively researched. Especially, as a well-known binary metal oxide, tin oxide ($SnO_2$), usually acts as n-type semiconductor with a wide band gap of 3.6eV. Over the past several decades intensive research activities have been conducted on $SnO_2$ in the bulk, thin film and nanostructure forms due to its interesting electrical properties making it a promising material for applications in solar cells, flat panel displays, and light emitting devices. But, its application to the active channel of TFTs have been limited due to the difficulties in controlling the electron density and n-type of operation with depletion mode. In this study, we fabricated staggered bottom-gate structure $SnO_2$-TFTs and patterned channel layer used a shadow mask. Then we compare to the performance intrinsic $SnO_2$-TFTs and doping hafnium $SnO_2$-TFTs. As a result, we suggest that can be control the defect formation of $SnO_2$-TFTs by doping hafnium. The hafnium element into the $SnO_2$ thin-films maybe acts to control the carrier concentration by suppressing carrier generation via oxygen vacancy formation. Furthermore, it can be also control the mobility. And bias stability of $SnO_2$-TFTs is improvement using doping hafnium. Enhancement of device stability was attributed to the reduced defect in channel layer or interface. In order to verify this effect, we employed to measure activation energy that can be explained by the thermal activation process of the subthreshold drain current.

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The Piezoelectic and electromechanical Characteristics of PZ-PT-PMWS (PZ-PT-PMWS의 압전 및 전기기계적 특성)

  • 홍종국;이종섭;채홍인;윤만순;정수현;임기조
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.403-406
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    • 2000
  • The piezoelectric properties and the doping effect of N $b_2$ $O_{5}$ and Mn $O_2$for 0.95PbZ $r_{x}$ $Ti_{x}$ $O_3$+0.05Pb(M $n_{0.42}$ $W_{0.26}$S $b_{0.32}$) $O_3$ compositions have been investigated. In the composition of 0.95PbZ $r_{0.54}$ $Ti_{0.46}$ $O_3$+0.05Pb(M $n_{0.42}$ $W_{0.26}$S $b_{0.32}$) $O_3$the Values Of $k_{p}$ find and $\varepsilon$$_{33}$ $^{T}$ are maximized, but $Q_{m}$ Was minimized ( $k_{p}$ =0.51, $Q_{m}$ =1750). The grain size was suppressed and the uniformity of grain was improved with doping concentration of N $b_2$ $O_{5}$ for 0.95PbZ $r_{0.54}$ $Ti_{0.46}$ $O_3$+0.005Pb(M $n_{0.42}$ $W_{0.26}$S $b_{0.32}$) $O_3$sample. The values of $k_{p}$ increased and the values of $Q_{m}$ slightly decreased when 0.5 wt% of N $b_2$ $O_{5}$ is doped. And the values of $k_{p}$ was the same formation of the N $b_2$ $O_{5}$ dopant when 0.5 wt% of M $n_2$ $O_{5}$ is doped. But the values of $Q_{m}$ was deeply decreased when 0.5 wt% of Mn $O_2$is doped. As a experiment results under high electric field driving, this piezoelectric ceramics are very stable. Conclusively, piezoelectric ceramic compsiton investigated at this paper is suitable for application to high power piezoelectric devices.. devices..ices.. devices..

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Fabrication and Characterization of High Efficiency Green PhOLEDs with [TCTA-TAZ] : Ir(ppy)3 Double Emission Layers ([TCTA-TAZ] : Ir(ppy)3 이중 발광층을 갖는 고효율 녹색 인광소자의 제작과 특성 평가)

  • Shin, Sang-Baie;Shin, Hyun-Kwan;Kim, Won-Ki;Jang, Ji-Geun
    • Korean Journal of Materials Research
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    • v.18 no.4
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    • pp.199-203
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    • 2008
  • High-efficiency phosphorescent organic light emitting diodes using TCTA-TAZ as a double host and $Ir(ppy)_3$ as a dopant were fabricated and their electro-luminescence properties were evaluated. The fabricated devices have the multi-layered organic structure of 2-TNATA/NPB/(TCTA-TAZ) : $Ir(ppy)_3$/BCP/SFC137 between an anode of ITO and a cathode of LiF/AL. In the device structure, 2-TNATA[4,4',4"-tris(2-naphthylphenyl-phenylamino)-triphenylamine] and NPB[N,N'-bis(1-naphthyl)-N,N'-diphenyl-1,1'-biphenyl-4,4'-diamine] were used as a hole injection layer and a hole transport layer, respectively. BCP [2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline] was introduced as a hole blocking layer and an electron transport layer, respectively. TCTA [4,4',4"-tris(N-carbazolyl)-triphenylamine] and TAZ [3-phenyl-4-(1-naphthyl)-5-phenyl-1,2,4-triazole] were sequentially deposited, forming a double host doped with $Ir(ppy)_3$ in the [TCTA-TAZ] : $Ir(ppy)_3$ region. Among devices with different thickness combinations of TCTA ($50\;{\AA}-200\;{\AA}$) and TAZ ($100\;{\AA}-250\;{\AA}$) within the confines of the total host thickness of $300\;{\AA}$ and an $Ir(ppy)_3$-doping concentration of 7%, the best electroluminescence characteristics were obtained in a device with $100\;{\AA}$-think TCTA and $200\;{\AA}$-thick TAZ. The $Ir(ppy)_3$ concentration in the doping range of 4%-10% in devices with an emissive layer of [TCTA ($100\;{\AA}$)-TAZ ($200\;{\AA}$)] : $Ir(ppy)_3$ gave rise to little difference in the luminance and current efficiency.

Theoretical Modeling of High Concentration Bismuth-based Erbium-doped Fiber Amplifier (고농도로 도핑된 Bismuth 기반 어븀첨가 광섬유 증폭기의 이론적 모델링 기법에 관한 연구)

  • Shin, Jae-Hyun;Jung, Min-Wan;Lee, Ju-Han
    • Korean Journal of Optics and Photonics
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    • v.21 no.4
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    • pp.139-145
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    • 2010
  • A complete modeling of erbium-doped Bismuth-oxide fibers with a high doping concentration is presented. A 6-level amplifier system that incorporated clustering-induced concentration quenching, cooperative upconversion, pump excited state absorption (ESA), and signal ESA, was adopted for the modeling. The accuracy of the modeling was verified by comparing the calculated gain and noise figure with experimentally obtained ones.

Investigation of Oxygen Incorporation in AlGaN/GaN Heterostructures

  • Jang, Ho-Won;Baik, Jeong-Min;Lee, Jong-Lam;Shin, Hyun-Joon;Lee, Jung-Hee
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.3 no.2
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    • pp.96-101
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    • 2003
  • Direct evidence on the incorporation of high concentration of oxygen into undoped AlGaN layers for the AlGaN/GaN heterostuctures is provided by scanning photoemission microscopy using synchrotron radiation. In-situ annealing at $1000^{\circ}C$ resulted in a significant increase in the oxygen concentration at the AlGaN surface due to the predominant formation of Al-O bonds. The oxygen incorporation into the AlGaN layers resulting from the high reactivity of Al to oxygen can enhance the tunneling-assisted transport of electrons at the metal/AlGaN interface, leading to the reduction of the Schottky barrier height and the increase of the sheet carrier concentration near the AlGaN/GaN interface.

Photocatalytic Hydrogen Production in Water-Methanol Mixture over Iron-doped CaTiO3

  • Jang, J. S.;Borse, P. H.;Lee, J. S.;Lim, K. T.;Jung, O. S.;Jeong, E. D.;Bae, J. S.;Kim, H. G.
    • Bulletin of the Korean Chemical Society
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    • v.32 no.1
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    • pp.95-99
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    • 2011
  • $CaTi_{1-x}Fe_xO_3(0{\leq}x{\leq}0.4)$ solid solution photocatalysts were synthesized by iron doping during the conventional solid state reaction at $1100^{\circ}C$ for 5 h and characterized by ultraviolet-visible (UV-vis) absorption spectroscopy, X-ray diffraction, morphological analysis. We found that $CaTi_{1-x}Fe_xO_3$ samples not only absorb UV but also the visible light photons. This is because the Fe substitution at Ti-site in $CaTi_{1-x}Fe_xO_3$ lattice induces the band transition from Fe3d to the Fe3d + Ti3d hybrid orbital. The photocatalytic activity of Fe doped $CaTiO_3$ samples for hydrogen production under UV light irradiation decreased with the increase in the Fe concentration. There exists an optimized concentration of iron in $CaTiO_3$, which yields a maximum photocatalytic activity under visible light ($\lambda\geq420nm$) photons.

Efficiency Improvement of $N^+NPP^+$ Si Solar Cell with High Low Junction Emitter Structure (고저 접합 에미터 구조를 갖는 $N^+NPP^+$ Si 태양전지의 효율 개선)

  • 장지근;김봉렬
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.21 no.1
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    • pp.62-70
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    • 1984
  • N+NPP+ HLEBSF (high low emitter back surface field) solar cells which have N+N high low junction in the emitter as well as N+PP+ BSF cells were designed and fabricated by using <111> oriented P type Si wafers with the resistivity of 10$\Omega$/$\textrm{cm}^2$ and the thickness of 13-15 mil. Physical parameters (impurity concentration, thickness) at each region of N+PP+ and N+NPP+ cell were made equally through same masks and simultaneous process except N region of HLEBSF cell to investigate the high low emitter junction effect for efficiency improvement. Under the light intensity of 100 mW/$\textrm{cm}^2$, total area (active area) conversion efficiency were typically 10.94% (12.16%) for N+PP+ BSF cells and 12.07% (13.41%) for N+N PP+ cells. Efficiency improvement of N+NPP+ cell which has high low emitter Junction structure is resulted from the suppression of emitter recombination current and the increasement of open circuit voltage (Voc) and short circuit current (Ish) by removing heavy doping effects occurring in N+ emitter region.

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Extended Trench Gate Superjunction Lateral Power MOSFET for Ultra-Low Specific on-Resistance and High Breakdown Voltage

  • Cho, Doohyung;Kim, Kwangsoo
    • ETRI Journal
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    • v.36 no.5
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    • pp.829-834
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    • 2014
  • In this paper, a lateral power metal-oxide-semiconductor field-effect transistor with ultra-low specific on-resistance is proposed to be applied to a high-voltage (up to 200 V) integrated chip. The proposed structure has two characteristics. Firstly, a high level of drift doping concentration can be kept because a tilt-implanted p-drift layer assists in the full depletion of the n-drift region. Secondly, charge imbalance is avoided by an extended trench gate, which suppresses the trench corner effect occurring in the n-drift region and helps achieve a high breakdown voltage (BV). Compared to a conventional trench gate, the simulation result shows a 37.5% decrease in $R_{on.sp}$ and a 16% improvement in BV.

The effects of Germanium concentration and Hydrogen loading time on the growth of fiber Bragg grating (Ge 도핑농도와 수소처리시간 변화가 광섬유격자 형성에 미치는 영향)

  • Song, J.H.;Lee, J.H.;Song, J.T.;Lee, K.S.;Lee, Y.S.;Jeon, C.O.;Jeon, K.I.
    • Proceedings of the KIEE Conference
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    • 1998.11c
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    • pp.993-995
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    • 1998
  • We fabricated fiber gratings with three different Ge-doped fibers exposed to 60atm pressure of Hz gas at 90"C for different times and studied the effects of Ge-doping concentration and $H_2$ loading time on the growth of gratings. According to experiments. the growing effect of hydrogen loading on high Ge-doped fiber was great.

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Synthesis and Characterization of High Luminance ${Zn_2}{SiO_4}$:Mn Phosphors (고발광 ${Zn_2}{SiO_4}$:Mn 형광체의 제조 및 특성)

  • 성부용;정하균;박희동;김대수
    • Journal of the Korean Ceramic Society
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    • v.37 no.8
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    • pp.774-780
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    • 2000
  • In order to improve luminescence prperty of phosphors, we have synthesized Zn2SiO4:Mn phosphors by a new chemical synthetic route, i.e., the homogeneous precipitation method. This method has featured that the formation of phosphoris completed at relatively low temperature of 105$0^{\circ}C$ and the particle morphology exhibits spherical shape to be well-dispersed and uniform size. At all the Mn concentration explored, phosphors prepared by this method have exhibited the improved emission intensities. In particular, the emission intensities of phosphors with Mn doping contents between 1 at% and 3.5 at% were higher about 40% than that of commercial phosphor. On the other hand, the decay time has been decreased from 23 ms to 11 ms with increasing Mn concentration. In addition, the phosphor composition containing 3 at% Mn has displayed the most saturated color.

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