• Nuclear Engineering and Technology
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• 제54권12호
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• pp.4652-4659
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• 2022

Among the detector materials available at room temperature, thallium bromide (TlBr), which has a relatively high atomic number and density, is widely used for gamma camera imaging. This study aimed to verify the usefulness of TlBr through quantitative evaluation by modeling detectors of various compound types using Monte Carlo simulations. The Geant4 application for tomographic emission was used for simulation, and detectors based on cadmium zinc telluride and cadmium telluride materials were selected as a comparison group. A pixel-matched parallel-hole collimator with proven excellent performance was modeled, and phantoms used for quality control in nuclear medicine were used. The signal-to-noise ratio (SNR), contrast to noise ratio (CNR), sensitivity, and full width at half maximum (FWHM) were used for quantitative analysis to evaluate the image quality. The SNR, CNR, sensitivity, and FWHM for the TlBr detector material were approximately 1.05, 1.04, 1.41, and 1.02 times, respectively, higher than those of the other detector materials. The SNR, CNR and sensitivity increased with increasing detector thickness, but the spatial resolution in terms of FWHM decreased. Thus, we demonstrated the feasibility and possibility of using the TlBr detector material in comparison with commercial detector materials.

• Nuclear Engineering and Technology
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• 제54권12호
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• pp.4679-4683
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• 2022

Environmental radiation monitoring is required to protect from the effects of radiation in industrial fields such as nuclear power plant (NPP) monitoring, and various gamma camera systems are being developed. The purpose of this study is to optimize parameters of a diverging collimator composed of pure tungsten for compactness and lightness through Monte Carlo simulation. We conducted the performance evaluation based on spatial resolution and signal-to-noise ratio for point source and obtained gamma images and profiles. As a result, optimization was determined at a collimator height of 60.0 mm, a hole size of 1.5 mm, and a septal thickness of 1.0 mm. Also, the full-width-at-half-maximum was 3.5 mm and the signal-to-noise ratio was 53.5. This study proposes a compact 45° diverging collimator structure that can quickly and accurately identify the location of the source for radiation monitoring.

• 천문학회지
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• 제56권1호
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• pp.23-33
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• 2023

We investigate the diffusion process of Thomson-scattered line photons in both real space and frequency space through a Monte Carlo approach. The emission source is assumed to be monochromatic and point-like embedded at the center of a free electron region in the form of a sphere and a slab. In the case of a spherical region, the line profiles emergent at a location of Thomson optical depth τ_Th from the source exhibit the full width of the half maximum σ_λ ≃ τ^1.5_Th. In the slab case, we focus on the polarization behavior where the polarization direction flips from the normal direction of the slab to the parallel as the slab optical depth τ_Th increases from τ_Th ≪ 1 to τ_Th ≫ 1. We propose that the polarization flip to the parallel direction to the slab surface in optically thick slabs is attributed to the robustness of the Stokes parameter Q along the vertical axis with respect to the observer's line of sight whereas randomization dominates the remaining region as τ_Th increases. A brief discussion on the importance of our study is presented.

• 우주기술과 응용
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• 제4권3호
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• pp.185-198
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• 2024

Korea Astronomy and Space science Institute (KASI) partnered with the Australian National University (ANU) to develop the adaptive optics (AO) system at the Geochang observatory with a 100 cm optical telescope for multiple applications, including space geodesy, space situational awareness and Korean space missions. The AO system is designed to get high resolution images of space objects with lower magnitude than 10 by using themselves as a natural guide star, and achieve a Strehl ratio larger than 20% in the environment of good seeing with a fried parameter of 12-15 cm. It will provide the imaging of space objects up to 1,000 km as well as its information including size, shape and orientation to improve its orbit prediction precision for collision avoidance between active satellites and space debris. In this paper, we address not only the design of AO system, but also analyze the images of stellar objects. It is also demonstrated that the AO System is achievable to a near diffraction limited full width at half maximum (FWHM) by analyzing stellar images.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1995년도 제8회 학술발표회 논문개요집
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• pp.36-36
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• 1995

The cubic (zinc blende) CdSe eppilayers were grown on GaAs(100) substrates by electron beam (e-beam) evapporation technique. X-ray scans with copper $K\alpha$ radiation indicate that the CdSe eppilayers are zinc blende. The lattice pparameter obtained from the (400) reflection is 6.077$\AA$, which is in excellent agreement with the value repported in the literature for zinc blende CdSe. The orientation of as-grown CdSe eppilayer is determined by electron channeling ppatterns(ECpp). The crystallinity of heteroeppitaxial CdSe layers were investigated based on the double crystal x-ray rocking curve(DCRC). The deppendence of the rocking curve width on layer thickness was studied. The FWHM(full width at half maximum) of CdSe eppilayers grown on GaAs(100) substrates is decreasing with increasing eppilayer thickness. The carrier concentration and mobility of the as-grown eppilayers deduced Hall data by van der ppauw method, are about 7$\times$1017 cm-3 and 2$\times$102 $\textrm{cm}^2$ / sec at room tempperature, resppectively. The energy gapp was determinded from the pphotocurrent sppectrum. In pphotocurrent sppectrum of a 1-${\mu}{\textrm}{m}$-thick CdSe eppilayer at 30K, the ppeak at 1.746 eV is due to the free exciton of cubic CdSe. In summary, We have shown that eppilayers of zinc blende CdSe can be grown on GaAs(100) substrates by e-beam, desppite the large mismatch between eppilayer and substrate, as well as the natural ppreference for CdSe to form in the wurtzite structure.

• 한국전기전자재료학회논문지
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• 제25권7호
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• pp.543-551
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• 2012

In this study, transparent conducting Al-doped Zinc Oxide (AZO) films with a thickness of 150 nm were prepared on corning glass substrate by the RF magnetron sputtering with using a Al-doped zinc oxide (AZO), ($Al_2O_3$: 2 wt%) target at room temperature. This study investigated the effect of rapid thermal annealing temperature and oxygen ambient on structural, electrical and optical properties of Al-doped zinc oxide (AZO) thin films. The films were annealed at temperatures ranging from 400 to $700^{\circ}C$ by using Rapid thermal equipment in oxygen ambient. The effect of RTA treatment on the structural properties were studied by x-ray diffraction and atomic force microscopy. It is observed that the Al-doped zinc oxide (AZO) thin film annealed at $500^{\circ}C$ at 5 minute oxygen ambient gas reveals the strongest XRD emission intensity and narrowest full width at half maximum among the temperature studied. The enhanced UV emission from the film annealed at $500^{\circ}C$ at 5 minute oxygen ambient gas is attributed to the improved crystalline quality of Al-doped zinc oxide (AZO) thin film due to the effective relaxation of residual compressive stress and achieving maximum grain size.

• Transactions on Electrical and Electronic Materials
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• 제12권2호
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• pp.60-63
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• 2011

We investigated the etching characteristics of zinc oxide (ZnO) and the effect of additive gases in a $Cl_2$-based inductively coupled plasma. The inert gases were argon, nitrogen, and helium. The maximum etch rates were 44.3, 39.9, and 37.9 nm/min for $Cl_2$(75%)/Ar(25%), $Cl_2$(50%)/$N_2$(50%), and $Cl_2$(75%)/He(25%) gas mixtures, 600 W radiofrequency power, 150 W bias power, and 2 Pa process pressure. We obtained the maximum etch rate by a combination of chemical reaction and physical bombardment. A volatile compound of Zn-Cl. achieved the chemical reaction on the surface of the ZnO thin films. The physical etching was performed by inert gas ion bombardment that broke the Zn-O bonds. The highly oriented (002) peak was determined on samples, and the (013) peak of $Zn_2SiO_4$ was observed in the ZnO thin film sample based on x-ray diffraction spectroscopy patterns. In addition, the sample of $Cl_2$/He chemistry showed a high full-width at half-maximum value. The root-mean-square roughness of ZnO thin films decreased to 1.33 nm from 5.88 nm at $Cl_2$(50%)/$N_2$(50%) plasma chemistry.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2002년도 춘계종합학술대회
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• pp.271-274
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• 2002

본 논문에서는 광센서용 광원에 적합한 1.55$\mu\textrm{m}$ 파장대의 InGaAsP/InP 반도체레이저를 제작하였다. 레이징을 억제시켜주기 위해서 bending type의 소자를 설계 및 제작하였으며, 제작된 소자의 출력은 펄스 구동전류 100㎃에서 1.6㎽이고, 스펙트럼 폭은 40nm의 값을 가졌다. 그리고, 제작된 광원을 적용하였을 때 광섬유 자이로스코프에 파이버 종단에서의 출력은 $25^{\circ}C$, 직류 100㎃에서 540㎻였고, 스펙트럼 폭은 53nm였다. 그리고, 불규칙잡음 계수는 2.5$\times$10­$^3$deg/√hr였고, 자이로 출력 drift도 잡음수준으로 조사되었다. 따라서, 본 연구에서 제작한 광원을 광섬유 자이로 스코프에 사용 가능함을 확인하였다.

• 한국결정성장학회지
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• 제27권3호
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• pp.143-147
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• 2017

PVT법으로 성장된 AlN 단결정의 표면 특성 및 결정성을 신뢰성 있게 평가하기 위해 $KOH/H_2O_2$ 혼합액을 이용한 화학적 습식 에칭을 통하여 AlN 단결정의 결함을 분석하였고, 고온 어닐링 공정을 통해 단결정의 결정성 변화를 관찰하였다. $300^{\circ}C$ 이상의 고온에서 강 염기성의 etchant를 사용하는 기존 에칭 방법에서는 재료의 결정성에 따라 쉽게 over etching이 일어난다. Over etching이 일어날 경우 면적당 정확한 에치 핏의 개수를 알 수 없기 때문에 전위 밀도의 신뢰성이 매우 떨어진다. 따라서 이러한 단점을 보완하기 위해 KOH 수용액에 $H_2O_2$를 산화제로 사용하여 $100^{\circ}C$ 이하의 저온에서 에칭을 성공하였으며, 주사전자현미경(SEM, scanning electron microscope)을 통해 에치 핏을 관찰하여 최적 에칭 조건 및 전위 밀도를 확인할 수 있었다. 또한, 성장된 AlN 단결정에 고온 어닐링 공정을 적용한 후, DC-XRD(double crystal X-ray diffraction)를 이용하여 결정성을 평가한 결과, 고온 어닐링 공정 후 FWHM(full with at half maximum) 값이 급격히 감소되는 것을 확인하였으며 이에 대한 메커니즘을 분석하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.233-233
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• 2010

CdS thin films were deposited on glass substrates by R.F. magnetron sputtering method and some of the samples were treated by rapid thermal annealing (RTA) process. Effects of thermal annealing on structural and optical properties were investigated at different temperatures ranging from 100 to $600^{\circ}C$. The crystallographic structure of the films and the size of the crystallites in the films were studied by X-ray diffraction. The crystallite sizes were found to increase, and the X-ray diffraction patterns were seen to sharpen by annealing. Optical properties of the films were calculated using the envelope method and the photoluminescence measurements. The optical properties of the films were seen to be dependent on the film thicknesses. The energy gap of the films was found to decrease by annealing. The band edge sharpness of the optical absorption was seen to oscillate by thermal annealing. Annealing over $400^{\circ}C$ was seen to degrade the optical properties of the film. The best annealing temperature for the films was found to be $400^{\circ}C$ from the optical properties. It is observed that the CdS film annealed at $400^{\circ}C$ reveals the strongest UV emission intensity and narrowest full width at half maximum among the temperature ranges studied. The enhanced UV emission from the film annealed at $400^{\circ}C$ is attributed to the improved crystalline quality of CdS thin film due to the effective relaxation of residual compressive stress and achieving maximum grain size. The results show that heat treatments under optimal annealing condition can provide significant improvements in the properties of CdS thin films.