• Title/Summary/Keyword: deposition rate

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Fabrication details of Ba1-xKxFe2As2 films by pulsed laser deposition technique

  • Lee, Nam Hoon;Jung, Soon-Gil;Ranot, Mahipal;Kang, Won Nam
    • Progress in Superconductivity and Cryogenics
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    • v.16 no.3
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    • pp.4-6
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    • 2014
  • Among Fe-based superconductors, potassium doped $BaFe_2As_2$ is favorable for applications because of its relatively high transition temperature and low anisotropy. To study the superconducting properties and the applicable aspects, high quality thin films of potassium doped $BaFe_2As_2$ should be fabricate. However, the high volatility of potassium makes it difficult to fabricate thin films of this compound. In this paper, we discuss the details of the experimental conditions used to fabricate $Ba_{1-x}K_xFe_2As_2$ films by ex situ PLD method. In the first set of samples, barium ratio in the target was controlled to make films with various potassium doping rate. However, in the second set of samples, the amount of potassium was controlled to find out optimal conditions for making high quality $Ba_{1-x}K_xFe_2As_2$ films.

Electrical Characteristics of Pentacene Thin Film Transistors.

  • Kim, Dae-Yop;Lee, Jae-Hyuk;Kang, Dou-Youl;Choi, Jong-Sun;Kim, Young-Kwan;Shin, Dong-Myung
    • 한국정보디스플레이학회:학술대회논문집
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    • 2000.01a
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    • pp.69-70
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    • 2000
  • There are currently considerable interest in the applications of conjugated polymers, oligomers, and small molecules for thin-film electronic devices. Organic materials have potential advantages to be utilized as semiconductors in field-effect transistors and light-emitting diodes. In this study, pentacene thin-film transistors (TFTs) were fabricated on glass substrate. Aluminums were used for gate electrodes. Silicon dioxide was deposited as a gate insulator by PECVD and patterned by reactive ion etching (R.I.E). Gold was used for the electrodes of source and drain. The active semiconductor pentacene layer was thermally evaporated in vacuum at a pressure of about $10^{-8}$ Torr and a deposition rate $0.3{\AA}/s$. The fabricated devices exhibited the field-effect mobility as large as 0.07 $cm^2/V.s$ and on/off current ratio as larger than $10^7$.

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Plasma Resistances of Yttria Deposited by EB-PVD Method (EB-PVD법으로 코팅된 Y2O3의 내플라즈마 특성)

  • Kim, Dae-Min;Yoon, So-Young;Kim, Kyeong-Beom;Kim, Hui-Sik;Oh, Yoon-Suk;Lee, Sung-Min
    • Journal of the Korean Ceramic Society
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    • v.45 no.11
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    • pp.707-712
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    • 2008
  • Plasma resistant nanocrystalline $Y_2O_3$ films were deposited on alumina substrates through the electron-beam PVD technique. Increasing substrate temperature to $600^{\circ}C$ resulted in the textured microstructures with significantly enhanced adhesion force of the coating to the substrate. During the exposure to fluorine plasma, erosion rate of the coated specimen was higher than that of a sintered yttria specimen, but significantly lower than that of a single crystalline alumina. Considering the adhesion and erosion behaviors observed in the coated specimen prepared at $600^{\circ}C$, the deposition technique appears effective in reducing contamination particles generated from the ceramic parts in the plasma environment.

The Chemical Structure and Photoconductivity Properties of Thin Films Fabricated by Plasma Polymerization Method (플라즈마 중합법에 의해 제작된 PHENYL ISOTHIOCYANATE 박막의 화학적구조와 광전도 특성)

  • Kim, Sung-O;Park, Bok-Kee;Kim, Du-Seok;Park, Jin-Kyo;Choi, Chung-Seong;Lee, Duck-Chool
    • Proceedings of the KIEE Conference
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    • 1997.07d
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    • pp.1555-1559
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    • 1997
  • The thin films were obtained by plasma polymerization of phenyl isothiocyanate. Polymerizations were carried out in rf(13.56[MHz]) glow discharge generated in an inter-electrode capacitively coupled gas flow system. It was found that this monomer produces uniform films with a wide range of thicknesses, from hundreds of nanometers to tens of micrometers. The deposition rate appeared to be dependent on the substrate distance from the monomer inlet. The IR data revealed significant decrease in -NCS groups content in the polymer as compared with the monomer spectrum and indicated for the appearance of new absorption bands corresponding to the -CN and C-H aliphatic groups. The soluble fraction by GC was found to be composed of numerous low molecular-weight compounds.

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Deposition of Solar Selective Coatings for High Temperature Applications (고온용 태양 선택흡수막의 제작)

  • Lee, Kil-Dong
    • Journal of the Korean Solar Energy Society
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    • v.28 no.1
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    • pp.33-42
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    • 2008
  • Zr-O ($Zr-ZrO_2$) cermets solar selective coatings with a double cermets layer film structure were prepared using a DC (direct current) magnetron sputtering method. The typical film structure from surface to bottom substrate were an $Al_2O_3$ anti-reflection layer on a double Zr-O cermets layer on an Al metal infrared reflection layer. Optical properties of optimized Zr-O cermets solar selective coating had an absorptance of ${\alpha}\;=\;0.95$ and thermal omittance of ${\epsilon}\;=\;0.10\;(100^{\circ}C)$. The absorbing layer of Zr-O cermets coatings on glass and silicon substrate was identified as being amorphous by using XRD. AFM showed that ZF-O cermets layers were very smooth and their surface roughness were approximately $0.1{\sim}0.2 nm$. The chemical analysis of the cermets coatings were determined by using XPS. Chemical shift of photoelectron binding energy was occurred due to the change of Zr-O cermets coating structure deposited with increase in oxygen flow rate. The result of thermal stability test showed that the Zr-O cermets solar selective coating was stable for use at temperature below $350^{\circ}C$.

A Numerical Analysis Using CFD for Effective Process at CMP Equipment (CFD를 이용한 CMP장비의 효과적인 공정을 위한 수치해석적 연구)

  • Lee, Sue-Yeon;Kim, Kwang-Sun
    • Journal of the Semiconductor & Display Technology
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    • v.10 no.4
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    • pp.139-144
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    • 2011
  • CMP process is an essential element in the semiconductor product processes in Chemical Mechanical Polishing. Taken as a whole, CMP is one process, but concretely, it is a detail process which consists of polishing, cleaning, and so on. Especially, the polishing and cleaning are key points in the whole process. Polishing rate is the most important factor and is related with deposition of slurry in the polishing process. Each outlet velocities is the most important factors in cleaning process. And when the velocities are more uniform, the cleaning becomes more effective. In this research, based on these factors, we performed a numerical analysis for effective polishing and cleaning which can be applied to industrial field. Consequently, we figured out that more than one opened nozzle is more effective than one opened nozzle at the polishing pad in case of this research. And we confirmed that the revised models have the uniform velocity distribution more than the previous model of the cleaning nozzle.

Study of the Effect of (U0.8Pu0.2)O2 Uranium-Plutonium Mixed Fuel Fission Products on a Living Organism

  • Baimukhanova, Ayagoz;Kim, Dmitriy;Zhumagulova, Roza;Tazhigulova, Bibinur;Zharaspayeva, Gulzhanar;Azhiyeva, Galiya
    • Nuclear Engineering and Technology
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    • v.48 no.4
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    • pp.965-974
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    • 2016
  • The article describes the results of experiments conducted on pigs to determine the effect of plutonium, which is the most radiotoxic and highly active element in the range of mixed fuel $(U_{0.8}Pu_{0.2})O_2$ fission products, on living organisms. The results will allow empirical prediction of the emergency plutonium radiation dose for various organs and tissues of humans in case of an accident in a reactor running on mixed fuel $(U_{0.8}Pu_{0.2})O_2$.

Direct Electrical Probing of Rolling Circle Amplification on Surface by Aligned-Carbon Nanotube Field Effect Transistor

  • Lee, Nam Hee;Ko, Minsu;Choi, Insung S.;Yun, Wan Soo
    • Bulletin of the Korean Chemical Society
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    • v.34 no.4
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    • pp.1035-1038
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    • 2013
  • Rolling circle amplification (RCA) of DNA on an aligned-carbon nanotube (a-CNT) surface was electrically interfaced by the a-CNT based filed effect transistor (FET). Since the electric conductance of the a-CNT will be dependent upon its local electric environment, the electric conductance of the FET is expected to give a very distinctive signature of the surface reaction along with this isothermal DNA amplification of the RCA. The a-CNT was initially grown on the quartz wafer with the patterned catalyst by chemical vapor deposition and transferred onto a flexible substrate after the formation of electrodes. After immobilization of a primer DNA, the rolling circle amplification was induced on chip with the a-CNT based FET device. The electric conductance showed a quite rapid increase at the early stage of the surface reaction and then the rate of increase was attenuated to reach a saturated stage of conductance change. It took about an hour to get the conductance saturation from the start of the conductance change. Atomic force microscopy was used as a complementary tool to support the successful amplification of DNA on the device surface. We hope that our results contribute to the efforts in the realization of a reliable nanodevice-based measurement of biologically or clinically important molecules.

Design and Fabrication of a Micro PZT Cantilever Array Actuator for Applications in Fluidic Systems

  • Kim Hyonse;In Chihyun;Yoon Gilho;Kim Jongwon
    • Journal of Mechanical Science and Technology
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    • v.19 no.8
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    • pp.1544-1553
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    • 2005
  • In this article, a micro cantilever array actuated by PZT films is designed and fabricated for micro fluidic systems. The design features for maximizing tip deflections and minimizing fluid leakage are described. The governing equation of the composite PZT cantilever is derived and the actuating behavior predicted. The calculated value of the tip deflection was 15 ${\mu}m$ at 5 V. The fabrication process from SIMOX (Separation by oxygen ion implantation) wafer is presented in detail with the PZT film deposition process. The PZT films are characterized by investigating the ferroelectric properties, dielectric constant, and dielectric loss. Tip deflections of 12 ${\mu}m$ at 5 V are measured, which agreed well with the predicted value. The 18 ${\mu}l/s$ leakage rate of air was observed at a pressure difference of 1000 Pa. Micro cooler is introduced, and its possible application to micro compressor is discussed.

Growth Mechanism of Self-Catalytic Ga2O3 Nano-Burr Grown by RF Sputtering

  • Park, Sin-Yeong;Choe, Gwang-Hyeon;Gang, Hyeon-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.462-462
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    • 2013
  • Gallium Oxide (Ga2O3) has been widely investigated for the optoelectronic applications due to its wide bandgap and the optical transparency. Recently, with the development of fabrication techniques in nanometer scale semiconductor materials, there have been an increasing number of extensive reports on the synthesis and characterization of Ga2O3 nano-structures such as nano-wires, nanobelts, and nano-dots. In contrast to typical vaporliquid-solid growth mode with metal catalysts to synthesis 1-dimensional nano-wires, there are several difficulties in fabricating the nanostructures by using sputtering techniques. This is attributed to the fact that relatively low growth temperatures and higher growth rate compared with chemical vapor deposition method. In this study, Ga2O3 chestnut burr were synthesized by using radio-frequency magnetron sputtering method. In contrast to typical sputtering method with sintered ceramic target, a Ga2O3 powder (99.99% purity) was used as a sputtering target. Several samples were prepared with varying the growth parameters, especially he growth time and the growth temperature to investigate the growth mechanism. Samples were characterized by using XRD, SEM, and PL measurements. In this presentation, the details of fabrication process and physical properties of Ga2O3 nano chestnut burr will be reported.

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