• Title/Summary/Keyword: deposition cross section

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The Characteristics Analysis of Track of Laser Metal Deposition Using AISI M2 Powder (AISI M2 파우더를 이용한 레이저 메탈 디포지션의 트랙 특성 분석)

  • Kim, WonHyuck;Song, MyungHwan;Park, InDuck;Kang, DaeMin
    • Transactions of the Korean Society of Automotive Engineers
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    • v.24 no.4
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    • pp.463-470
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    • 2016
  • In this paper, the characteristics analysis of LMD track, such as including track structure, track wear resistance and track thickness, were analyzed to enhance the deposition efficiency using a diode-pumped disk laser. SKD61 hot work steel plate and Fe based AISI M2 alloy were used as a the substrate and powder for the LMD process, respectively. The laser power, track pitch and powder feed rate among LMD parameters were adopted to estimate the deposition efficiency. As the laser power is increased, heat input and melting pool on the substrate is grown also increases, so resulting in the increased LMD track thickness was increased. Through EPMA mapping analysis of the cross-section in the LMD track, it was observed that all the elements are evenly distributed inside. Therefore, the entire hardness in the LMD track is expected to be almost uniform regardless of location. The characteristics of the LMD specimen were excellent compared to the STD11 specimen in terms of the wear track width and the wear rate as well as the coefficient of friction. Especially the wear rate of LMD specimen has been significantly reduced by 60 % or more. From Based on the experimental results, the prediction formula of LMD thickness was calculated by using laser power, track pitch and powder feed rate.

Study on Changing of the Channelbed Microtopography of Urban River - On Taebaek River of Chunchon city - (도시하천(都市河川)의 하상미지형(河床微地形) 변화(變化)에 관한 연구(硏究) - 춘천시(春川市) 태백천(太白川)을 대상으로 -)

  • Kim, Kyoung-Nam;Chun, Kun-Woo
    • Journal of Forest and Environmental Science
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    • v.13 no.1
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    • pp.81-89
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    • 1997
  • Urban river needs continuous observation for the river conservation because river surrounding environment sensitivly is changed by human activity. In order to grasp the effect of human activity against Taebaek river in Chunchon city, this research analysed the channel shape change, fluctuation volume and bias degree over five times, for June, 1993 to June, 1996. The results were as follows : 1. The change of channel shape on each surveying time mainly occurred in June, 1996 and maximum deposition. $1,247m^3$ occurred on 19~20 section, maximum scouring, $340m^3$ occurred on 6~7 section, 2. When comparing with June, 1993, increased deposition volume of channelbed was about $4,600m^3$ in June, 1996, 3. The bias degree of channel mainly occurred in June, 1996 of surveying times and at 6, 7, 15, 16, 17, 18, 19, 20 line of surveying lines.

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Plasma Chemistry Data Research for Plasma Applications

  • Yoon, Jung-Sik
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.77-77
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    • 2012
  • As interest has increased in the interaction between low-temperature plasmas and materials, the role of modeling and simulation of processing in plasma has become important in understanding the effects of charged particles and radicals in plasma applications. Thus in this presentation, we present the theoretical and experimental studies of electron impact cross section for plasma processing gas, such as plasma etching and deposition processes. Also, here the work conducted at the Data Center for Plasma Properties (DCPP) over last 7 years on the systematic synthesis and assessment of fundamental knowledge on low-energy electron interactions with plasma processing gases is briefly summarized and discussed.

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Effect of Substrate Temperature on Polycrystalline Silicon Film Deposited on Al Layer (Al 박막을 이용한 다결정 Si 박막의 제조에서 기판온도 영향 연구)

  • Ahn, Kyung Min;Kang, Seung Mo;Ahn, Byung Tae
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.96.2-96.2
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    • 2010
  • The surface morphology and structural properties of polycrystalline silicon (poly-Si) films made in-situ aluminum induced crystallization at various substrate temperature (300~600) was investigated. Silicon films were deposited by hot-wire chemical vapor deposition (HWCVD), as the catalytic or pyrolytic decomposition of precursor gases SiH4 occurs only on the surface of the heated wire. Aluminum films were deposited by DC magnetron sputtering at room temperature. continuous poly-Si films were achieved at low temperature. from cross-section TEM analyses, It was confirmed that poly-Si above $450^{\circ}C$ was successfully grown on and poly-Si films had (111) preferred orientation. As substrate temperature increases, Si(111)/Si(220) ratio was decreased. The electrical properties of poly-Si film were investigated by Hall effect measurement. Poly-Si film was p-type by Al and resistivity and hall effect mobility was affected by substrate temperature.

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A study on the AIN thin films fabricated by RF magnetron sputtering (RF Magnetron Sputtering 법으로 제조된 AIN 박막에 관한 연구)

  • 남창길;최승우;천희곤;조동율
    • Journal of the Korean Vacuum Society
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    • v.6 no.1
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    • pp.44-49
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    • 1997
  • AIN thin films were deposited on silicon and glass substrates by sputtering Al target and introducing mixed gases of argon and nitrogen into reactive RF magnetron sputter. The substrate was not heated to protect the PC (polycarbonate) substrate and the micro-sized pregroove morphology on the surface of PC substrate. But its temperature was around $100^{\circ}C$ due to the self-heating by plasma. The crystallinity, cross-section morphology and refractive index were characterized by changing various deposition parameters.

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Change of Spray Characteristics with Mixing Port Length of Y-Jet Atomizers (Y-Jet 노즐에서의 혼합관 길이변화에 따른 분무특성 연구)

  • 송시홍;이상용
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.18 no.11
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    • pp.3021-3031
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    • 1994
  • Experiments have been performed to find out the effect of the mixing port length of Y-jet atomizers on the spray performance, using air and water as the test fluids. Water and air flow rates and drop sizes were measured at each injection pressure condition for different mixing port length. The air flow rate was almost unaffected by the change of the mixing port length. However, the water flow rate was relatively susceptible to the change of the mixing port length. The mixing point pressure was very much influenced by the mixing port length. Variations of spatial distribution of Sauter Mean Diameter (SMD, $D_{32}$) and the cross-section-averaged SMD ($D_{32,m}$) with different mixing port length and air/water mass flow rate ratio were examined. Generally, when the mixing port length was reduced, the mean drop size decreased and became spatially even.

Grain Size Determination of Copper Film by Electron Backscatter Diffraction (EBSD를 이용한 구리박막의 결정립 크기 결정)

  • Kim, Su-Hyeon;Kang, Joo-Hee;Han, Seung Zeon
    • Korean Journal of Metals and Materials
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    • v.48 no.9
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    • pp.847-855
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    • 2010
  • The grain size of a cross-section of $8{\mu}m$-thick copper film was determined by electron backscatter diffraction analysis. Grain size distribution histogram showed the presence of a large fraction of small-sized grains, and the mean grain size was significantly affected by handling of them. A cut-off grain size, below which all grains are ignored as noise and eliminated for the calculation of the mean value, should be three or four times as large as the step size. Due to the presence of small grains, the linear intercept method derived larger mean grain size, which depends less sensitively on the cut-off grain size than the equivalent circle diameter method.

Room-temperature Preparation of Al2O3 Thick Films by Aerosol Deposition Method for Integrated RE Modules

  • Tsurumi, Takaaki;Nam, Song-Min;Mori, Naoko;Kakemoto, Hirofumi;Wada, Satoshi;Akedo, Jun
    • Journal of the Korean Ceramic Society
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    • v.40 no.8
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    • pp.715-719
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    • 2003
  • The Aerosol Deposition (AD) process will be proposed as a new fabrication technology for the integrated RF modules. $\alpha$-A1$_2$O$_3$ thick films were successfully grown on glass and Al substrates at room temperature by the AD process. Relative dielectric permittivity and loss tangent of the $Al_2$O$_3$ thick films on Al showed 9.5 and 0.005, respectively. To form microstrip lines on aerosol-deposited A1903 thick films, copper electroplating and lithography processes were employed, and the square-type cross section with sharp edges could be obtained. Low-pass LC filters with 10 GHz cutoff frequency were simulated by an electromagnetic analysis, exhibiting the validity of the AD process as a fabrication technology f3r integrated RF modules.

A Study on the Heat Transfer Characteristics of Single Bead Deposition of Inconel 718 Superalloy on S45C Structural Steel Using a DMT Process (DMT 공정을 이용한 S45C 구조용강 위 Inconel 718 초합금 단일 비드 적층시 열전달 특성 분석에 관한 연구)

  • Lee, Kwang-Kyu;Ahn, Dong-Gyu;Kim, Woo-Sung;Lee, Ho-Jin
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.19 no.8
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    • pp.56-63
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    • 2020
  • The heat transfer phenomenon in the vicinity of the irradiated region of a focused laser beam of a DMT process greatly affects both the deposition characteristics of powders on a substrate and the properties of the deposited region. The goal of this paper is to investigate the heat transfer characteristics of a single bead deposition of Inconel 718 powders on S45C structural steel using a laser-aided direct metal tooling (DMT) process. The finite element analysis (FEA) model with a Gaussian volumetric heat flux is developed to simulate a three-dimensional transient heat transfer phenomenon. The cross-section of the bead for the FEA is estimated with an equivalent area method using experimental results. Through the comparison of the results of the experiments and those of the analysis, the effective beam radius of the bottom region of the volumetric heat flux and the efficiency of the heat flux model for different powers and travel speeds of the laser are predicted. From the results of the FEA, the influence of the power and the travel speed of the laser on the creation of a steady-state heat transfer region and the formation of the heat-affected zone (HAZ) in the substrate are investigated.

Optical Properties and Structural Analysis of SiO2 Thick Films Deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD법에 의해 증착된 SiO2 후막의 광학적 성질 및 구조적 분석)

  • Cho, Sung-Min;Kim, Yong-Tak;Seo, Yong-Gon;Yoon, Hyung-Do;Im, Young-Min;Yoon, Dae-Ho
    • Journal of the Korean Ceramic Society
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    • v.39 no.5
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    • pp.479-483
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    • 2002
  • Silicon dioxide thick film using silica optical waveguide cladding was fabricated by Plasma Enhanced Chemical Vapor Deposition(PECVD) method, at a low temperature ($320^{\circ}$C) and from $(SiH_4+N_2O)$ gas mixtures. The effects of deposition parameters on properties of $SiO_2$ thick films were investigated by variation of $N_2O/SiH_4$ flow ratio and RF power. After the deposition process, the samples were annealed in a furnace at $1150^{\circ}$C, in N2 atmosphere, for 2h. As the $N_2O/SiH_4$ flow ratio increased, deposition rate decreased from 9.4 to 2.9 ${\mu}m/h$. As the RF power increased, deposition rate increased from 4.7 to 6.9 ${\mu}m/h$. The thickness and the refractive index measurements were measured by prism coupler. X-ray Photoelectron Spectroscopy(XPS) and Fourier Transform-infrared Spectroscopy(FT-IR) were used to determine the chemical states. The cross-section of films was observed by Scanning Electron Microscopy(SEM).