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http://dx.doi.org/10.4191/KCERS.2002.39.5.479

Optical Properties and Structural Analysis of SiO2 Thick Films Deposited by Plasma Enhanced Chemical Vapor Deposition  

Cho, Sung-Min (Department of Advanced Materials Engineering, Sungkyunkwan University)
Kim, Yong-Tak (Department of Advanced Materials Engineering, Sungkyunkwan University)
Seo, Yong-Gon (Optical Telecommunication Research Center, Korea Electronics Technology Institute)
Yoon, Hyung-Do (Optical Telecommunication Research Center, Korea Electronics Technology Institute)
Im, Young-Min (Optical Telecommunication Research Center, Korea Electronics Technology Institute)
Yoon, Dae-Ho (Department of Advanced Materials Engineering, Sungkyunkwan University)
Publication Information
Journal of the Korean Ceramic Society / v.39, no.5, 2002 , pp. 479-483 More about this Journal
Abstract
Silicon dioxide thick film using silica optical waveguide cladding was fabricated by Plasma Enhanced Chemical Vapor Deposition(PECVD) method, at a low temperature ($320^{\circ}$C) and from $(SiH_4+N_2O)$ gas mixtures. The effects of deposition parameters on properties of $SiO_2$ thick films were investigated by variation of $N_2O/SiH_4$ flow ratio and RF power. After the deposition process, the samples were annealed in a furnace at $1150^{\circ}$C, in N2 atmosphere, for 2h. As the $N_2O/SiH_4$ flow ratio increased, deposition rate decreased from 9.4 to 2.9 ${\mu}m/h$. As the RF power increased, deposition rate increased from 4.7 to 6.9 ${\mu}m/h$. The thickness and the refractive index measurements were measured by prism coupler. X-ray Photoelectron Spectroscopy(XPS) and Fourier Transform-infrared Spectroscopy(FT-IR) were used to determine the chemical states. The cross-section of films was observed by Scanning Electron Microscopy(SEM).
Keywords
PECVD; Optical waveguide; Silicon dioxide; PLC;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
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1 S. C. Deshmukh and E. S. Aykil, 'Investigation of $SiO_2$Plasma Enhanced Chemical Vapor Deposition Through Tet-raethoxysilane Using Attenuated Total Reflection Fourier Transform Infrared Spectroscopy,' J. Vac. Sci. Technol., A 13 2355-67 (1995)
2 N. Takato, K. Jinguji, M. Yasu, H. Toba and M. Kawachi, 'Silica-based Single-mode Waveguide on Silicon and their Application to Guided-wave Optical Interferometers,' J. of Lightwave TechnoI., 6 1003-10 (1988)   DOI   ScienceOn
3 J. K. Sim, Y. H. Lee, H. K. Sung and T. G. Choi, 'The Effective $P_2O_5$ Doping into $B_2O_3-P_2O_5-SiO_2$ Silica Layer Fabrication by Flame Hydrolysis Deposition(in Kor.),' J. Kor. Ceram. Soc., 35 [4] 364-70 (1998)
4 E. S. Bulat, M. Tabasky and B Tweed, et al., 'Fabrication of Waveguide using Low-temperature Plasma Processing Tech-nique,' J. Vac. Sci. TechnoI., All 1268-74 (1995)
5 A. A. Langford, M. L. Fleet, B. P. Nelson, W. A. Lanford and N. Maley, 'Infrared Absorption Strength and Hydrogen Content of Hydrogenated Amorphous Silicon,' Phys. Rev. B, 45 13367-77 (1992)   DOI   ScienceOn
6 C. Tosello, F. Rossi, S. Ronchin, R. Rolli, G. C. Righini, F. Pozzi, S. Pelli, M. Fossi, E. Moser, M. Montagna, M. Fer-rari, C. Duverger, A. Chiappini and C. D. Bernardi, 'Erbium-activated Silica-titania Planar Waveguides on Silica-on-sil-icon Substrates Prepared by RF Sputtering,' J. Non-Cryst. Solids, 284 230-36 (2001)   DOI   ScienceOn
7 J. Zhang, Z. Ren, R. Liang, Y. Sui and W. Liu, 'Planar Opti-cal Waveguide Thin Films Grown by Microwave ECR PECVD,' Surface and Coating Technol., 131 116-20 (2000)   DOI   ScienceOn
8 S. M. Cho, Y. T. Kim, Y. G. Seo, Y. M. Im and D. H. Yoon, 'Effects of $N_2O/SiH_4$, Flow Ratio and RF Power on Prop-erties of $SiO_2$ Thick Films Deposited by Plasma Enhanced Chemical Vapor Deposition(in Kor.),' J. Kor. Ceram. Soc., 38 [11] 1037-41 (2001)
9 Y. Kuo, 'Plasma Enhanced Chemical Vapor Deposited Sil-icon Nitride as a Gate Dielectric Film for Amorphous Sil-icon Thin Film Transistors,' Vacuum, 51 741-45 (1998)   DOI   ScienceOn
10 E. M. Yeatman, M. M. Ahmad, O. McCarthy, A. Vannucci, P. Gastaldo, D. Barbier, D. Mongardien and C. Moronvalle, 'Optical Gain in Er-doped $SiO_2-TiO_2$ Waveguide Fabricated by the Sol-gel Technique,' Opt. Commun., 164 19-25 (1999)   DOI   ScienceOn
11 Pereyra and M. I. Alayo, 'High Quality Low Temperature DPECVD Silicon Dioxide,' J. Non-CrystaIline Solids, 212 225-31 (1997)   DOI   ScienceOn
12 J. T. Fitch, S. S. Kim and G. Lucovsky, 'Thermal Sta-bilization of Device Quality Films Deposited at Low Tem-peratures,' J. Vac. Sci. Technol., A8 [3] 1871-77 (1990)