Nano-thick Nickel Silicide and Polycrystalline Silicon on Polyimide Substrate with Extremely Low Temperature Catalytic CVD (폴리이미드 기판에 극저온 Catalytic-CVD로 제조된 니켈실리사이드와 실리콘 나노박막)
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- Korean Journal of Metals and Materials
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- v.49 no.4
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- pp.321-328
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- 2011