• Title/Summary/Keyword: crystal

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Characterization of the grown - in defects in the large diameter silicon crystal grown by Czochralski method (대구경 규소 Czochralski 단결정 속의 결정 결함 규명)

  • 이보영;김영관
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.6 no.1
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    • pp.11-18
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    • 1996
  • Grown-in defects like OISF and FPD in the large diameter(> 8 inch)of silicon crystal are characterized. It was revealed that the presence of the ring-patterned OISF would deterorate the minority life time of the silicon crystal. Through the cooling experiment from the $1250^{\circ}C$, the nucleation of the OISF was confirmed to follow the homogeneous nucleation and growth process. In addition to OISF nucleus, crystal originated particle, which was known to be closely related with FPD (Flow Pattern Defects), was found to depend on the pulling rate of the crystal. Combination of the lower rate of the pulling and the faster cooling near the $950^{\circ}C$ is proposed to be effective method in reducing the generation of these grown-in defects.

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Crystal growth and scintillation properties of CsI:Na (CsI:Na 결정 육성과 섬광 특성)

  • Cheon, Jong-Kyu;Kim, Sung-Hwan;Kim, H.J.
    • Journal of Sensor Science and Technology
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    • v.19 no.6
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    • pp.443-448
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    • 2010
  • In this work, the scintillation properties of CsI:Na crystal were investigated as radiation detection sensor. This scintillation material was grown by a 2-zone vertical Bridgman method. Under X-ray excitation the crystal shows a broad emission band between 280 nm and 690 nm wavelength range, peaking at 413 nm. Energy resolution for $^{137}Cs$ 662 keV $\gamma$-rays of the crystal was measured to be 6.9 %(FWHM). At room temperature, the crystal exhibits three exponential decay time components. The fast and major component of scintillation time profile of the crystal emission decays with a 457 ns time constant. Absolute light yield of the crystal was estimated to be 53,000 ph/MeV using LAAPD. The sample crystal shows proportionality of 30 % in the measured energy range from 31 to 1,333 keV. And the $\alpha/\beta$ ratio of the crystal was 0.14.

Growth and optical characterization of $CuInSe_2$ single crystal thin film for solar cell application (태양전지용 $CuInSe_2$단결정 박막 성장과 광학적 특성)

  • 백승남;홍광준
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.12 no.4
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    • pp.202-209
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    • 2002
  • The stochiometric mix of evaporating materials for the $CuInSe_2$single crystal thin films was prepared from horizontal furnace. To obtain the single crystal thin films, $CuInSe_2$compound crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were $620^{\circ}C$ and $410^{\circ}C$, respectively. The crystalline structure of single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $CuInSe_2$single crystal thin films measured from Hall effect by van der Pauw method. From the photocurrent spectrum by illumination of perpendicular light on the c-axis of the $CuInSe_2$single crystal thin film, we have found that the values of spin orbit splitting $\Delta$So and the crystal field splitting $\Delta$Cr. From the photoluminescence measurement on $CuInSe_2$single crystal thin film, we observed free exciton ($E_x$) existing only high quality crystal and neutral bound exciton ($A^{\circ}$, X) having very strong peak intensity. Then, the full-width-at-half-maximum (FWHM) and binding energy of neutral donor bound exciton were 7 meV and 5.9 meV, respectivity. By haynes rule, an activation energy of impurity was 59 meV.

Photocurrent study on the splitting of the valence band and growth of $Cdln_2Te_4$ single crystal by Bridgman method (Bridgman법에 의한 $Cdln_2Te_4$단결정의 성장과 가전자대 갈라짐에 대한 광전류 연구)

  • 홍광준;이관교;이봉주;박진성;신동찬
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.13 no.3
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    • pp.132-138
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    • 2003
  • A stoichiometric mixture for $CdIn_2Te_4$ single crystal was prepared from horizontal electric furnace. The $CdIn_2Te_4$ single crystal was grown in the three-stage vertical electric furnace by using Bridgman method. The $CdIn_2Te_4$ single crystal was evaluated to be tetragonal by the power method. The (001) growth plane of oriented $CdIn_2Te_4$ single crystal was confirmed from back-reflection Laue patterns. The carrier density and mobility of $CdIn_2Te_4$ single crystal measured with Hall effect by van der Pauw method are $8.61\times 1016 \textrm {cm}^{-3}$ and 242 $\textrm{cm}^2$/V.s at 293 K, respectively. The temperature dependence of the energy band gap of the $CdIn_2Te_4$ single crystal obtained from the absorption spectra was well described by the Varshni's relation, $1.4750ev - (7.69\times10^{-3})\; ev/k)\;T^2$/(T + 2147k).The crystal field and the spin-orbit splitting energies for the valence band of the $CdIn_2Te_4$ single crystal have been estimated to be 0.2704 eV and 0.1465 eV, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the $\Delta$so definitely exists in the $\Gamma_7$ states of the valence band of the $CdIn_2Te_4$ single crystal. The three photocurrent peaks observed at 10 K are ascribed to the $A_{1-} B_{1-}$ and Cl-exciton peaks for n = 1.

Study on th growth of nonlinear optical crystal $CsLiB_{6}O_{10}$ (비선형 광학 결정 $CsLiB_{6}O_{10}$ 육성에 관한 기초 연구)

  • 김호건;김명섭
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.6 no.2
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    • pp.166-176
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    • 1996
  • The fundamental conditions for growing $CsLiB_{6}O_{10}$ crystal, new nonlinear optical material, were investigated. Stoichiometirc mixture of $CsLiB_{6}O_{10}$ composition resulted in the crystal of the same composition in the process of heating at the temperature above $600^{\circ}C$. No phase transition was observed in the $CsLiB_{6}O_{10}$ crystal in the temperature range of $600^{\circ}C~800^{\circ}C$, and $CsLiB_{6}O_{10}$ crystal melted congruently at $850^{\circ}C$. When the melt of this composition was cooled at rates of $1~150^{\circ}C/hr$, glass state ingot was formed regardless of cooling rates. However, $CsLiB_{6}O_{10}$ crystals were formed directly from the melt at any cooling rate in the presence of $CsLiB_{6}O_{10}$ seed crystal in the melt. Transparent $CsLiB_{6}O_{10}$ single crystal was grown from the melt using the seed crystal at the growing rate of 0.06 mm/hr in the furnace having the temperature gradient of $100^{\circ}C/cm$. Analysis of the single crystal showed that the crystal belonged to the noncentrosymmetric tetragonal space group 142d and unit cell dimensions were $a=10.467(1)\;{\AA},\;c=8.972(1)\;{\AA}\;and\;V=983.0(2)\;{\AA}^3$. Optical absorption edge of the crystal was observed at 180mm and the crystal showed a good optical transparency (70% transmittance, sample thickness 0.5 mm) in the wide wavelength range above 300 nm.

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Crystal structure investigation of AlN crystal grown on 6H-SiC seed by a physical vapor transport method (6H-SiC 종자 결정을 사용하여 PVT법으로 성장된 AlN 결정 연구)

  • Shin, Hee-Won;Lee, Dong-Hoon;Kim, Hwang-Ju;Park, Mi-Seon;Jang, Yeon-Suk;Lee, Won-Jae;Kim, Jung-Gon;Jeong, Seong-Min;Lee, Myung-Hyun;Seo, Won-Seon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.26 no.1
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    • pp.49-52
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    • 2016
  • The effect of process parameters such as the growth pressure and temperature on the AlN crystal growth has been investigated. AlN crystal was grown onto 6H-SiC seed crystal using PVT (Physical Vapor Transport) method. Crystal properties and morphology of AlN crystal was changed with growth pressure and temperature. Raman analysis confirmed that AlN crystals with different orientation were successfully grown on SiC seed crystal.

A study on the AlN crystal growth using its thin films grown on SiC substrate (SiC 기판상에 성장된 AlN 박막을 이용한 AlN 결정 성장에 관한 연구)

  • Yin, Gyong-Phil;Kang, Seung-Min
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.28 no.4
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    • pp.170-174
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    • 2018
  • AlN crystal is been developing in global site for many years and 1 inch diameter wafer was already developed but it is demanding the efforts for the better quality. On the other hand, also the 2-inch size is developing recently to reduce the unit cost for manufacturing and to use to fabrication of the UV LED chips. In this study, we tried to evaluate the possibility of bulk AlN crystals on his thin films by PVT method. The AlN thin film was grown on SiC single crystal 2" wafer by HVPE method. We successfully grew AlN bulk crystal of a thickness of 7 mm using its thin film of a thickness of $10{\mu}m$ as a seed crystal. The resultants of AlN crystals were identified by metallurgical microscope, optical stereographic microscope and DCXRD measurement.

A study on point defect for thermal annealed CuGaSe2 single crystal thin film (열처리된 CuGaSe2 단결정 박막의 점결함연구)

  • 이상열;홍광준
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.154-154
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    • 2003
  • A stoichiometric mixture of evaporating materials for CuGaSe2 single crystal thin films was prepared from horizontal electric furnace. Using extrapolation method of X-ray diffraction patterns for the polycrystal CuGaSe2, it was found tetragonal structure whose lattice constant at and co were 5.615 ${\AA}$ and 11.025 ${\AA}$, respectively. To obtain the single crystal thin films, CuGaSe2 mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (MWE) system. The source and substrate temperatures were Slot and 450$^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (UXD). The carrier density and mobility of CuGaSe2 single crystal thin films measured with Hall effect by van der Pauw method are 5.0l${\times}$10$\^$17/ cm$\^$-3/ and 245 $\textrm{cm}^2$/V$.$s at 293K, respectively. The temperature dependence of the energy band gap of the CuGaSe2 obtained from the absorption spectra was well described by the Varshni's relation, Eg(T) = 1.7998 eV - (8.7489${\times}$10$\^$-4/ eV/K)T$^2$/(T + 335 K. After the as-grown CuGaSe2 single crystal thin films was annealed in Cu-, Se-, and Ca-atmospheres, the origin of point defects of CuGaSe2 single crystal thin films has been investigated by the photoluminescence(PL) at 10 K The native defects of V$\_$CU/, V$\_$Se/, Cu$\_$int/, and Se$\_$int/ obtained by PL measurements were classified as a donors or accepters type. And we concluded that the heat-treatment in the Cu-atmosphere converted CuGaSe2 single crystal thin films to an optical n-type. Also, we confirmed that Ga in CuGaSe2/GaAs did not form the native defects because Ga in CuGaSe2 single crystal thin films existed in the form of stable bonds.

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Study of Properties of High-K Strontium Oxide Alignment Layer Using Solution Process for Low Power Mobile Information Device (저전력 휴대용 통신단말을 위한 Solution Process를 이용한 고 유전율 Strontium Oxide 배향막의 특성 연구)

  • Han, Jeong-Min;Kim, Won-Bae
    • Journal of Satellite, Information and Communications
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    • v.10 no.2
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    • pp.90-94
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    • 2015
  • We stuidied liauid crystal alignment treatment using solution process for making thin oxide layer in liquid crystal display. It is the one of very effient and popular process in making thin oxide layer in electronical industrial fields. Particularly, this process has highly potential value in liquid crystal display industrial fields because it cause automatically induced alignment process without tranditional alignment process in liquid crystal alignment process. We made several different kinds of mol density solutions using strontium oxide solution. And those solutions were treated for solidification layers using annealing process for 2 hours. And we stuided pretilt angle properties of these alignment layers of strontium oxide for clarifying the relationship of liquid crystal molecules and thin strontium oxide layer. And we also tested the existence of strontium oxide thin layer on substrate using XPS measurement. We expected the hig gain of electro-optical properties in liquid crystal display using strontium oxide thin layer because it has high K property material than the other metal-based oxide layers. In this results, we measured 1.447 to 1.613 thresholds volts as 0.1 mol to 0.4 mol density in 0.1 mol density steps. This is significant better characteristics than conventional liquid crystal display as higher than 1.85 thresholds volts. And it make possible to making next-generation liquid crystal display which present low-power consumption and wide gray scale in liquid crystal display.

Crystallization of Benzene from Benzene-Cyclohexane Mixtures by Layer Melt Crystallization - Phenomena of Impurity Inclusion in Crystal - (경막형 용융결정화에 의한 벤젠-사이클로헥산 혼합물로부터 벤젠의 결정화-결정의 불순물 내포현상-)

  • Kim, Kwang-Joo;Lee, Jung-Min;Ryu, Seung-Kon
    • Applied Chemistry for Engineering
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    • v.8 no.3
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    • pp.389-394
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    • 1997
  • The distribution of impurity included in benzene layer crystal was explored in layer crystallization of cyclohexane and benzene mixtures. The influence of crystal growth rate on crystal purity was investigated. All experimental results for bezene-cyclohexane system obtained in layer crystallizer have been evaluated with the criterion of Wintermantel. The purity of crystal decreases with increasing degree of subcooling, decreasing feed concentration and increasing crystal growth rate. The crystal growth rate was a key parameter to determine the inclusion of impurity in crystals. The results obtained from runs performed at increasing crystallization time(i.e. crystal thickness) have clearly shown that migration of inclusions within crystal layer to the melt, leading to the removal of impurity occurs. The diffusion of impurity which takes place during the crystallization from the beginning, enhances a further purification of the crystal layer if that underwent a thermal gradient after growth of the layer crystal stops.

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