• 한국산학기술학회논문지
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• 제20권6호
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• pp.14-18
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• 2019

반도체의 전도성은 주로 케리어에 의해서 결정된다. 전도성이 높아지려면 케리어의 수가 많고 에너지 내의 트랩 준위를 만들어서 케리어들이 낮은 에너지로도 금지대역을 넘어설수 있도록 하는 도핑기법을 주로 사용한다. 케리어들은 결정질 결합구조를 갖으며, 계면불일치에 의하여 전도성이 떨어지는 경향도 있지만 대체적으로 고농도 도핑은 이동도를 높이는 대표적인 방법에 속한다. 하지만 비정질 결합구조에서도 전도성이 높아지는 현상이 나타나며, 본 연구에서는 트래핑현상과는 다른 터널링 현상에 의한 공간전하제한 전류가 흐르면서 전도성이 향상되고 이동도가 높아지는 현상에 대하여 관찰하였다. 비정질구조에서는 케리어수가 낮고 저항이 높아지며, 커패시턴스의 on/off 특성이 향상되면서 이동도가 높아지는 것을 확인하였다. ZTO 박막은 150도에서 열처리한 경우 커패시턴스의 on/off 특성이 향상되었으며, 충전과 방전하는 실험에서는, 충전과 방전되는 형상에 있어서 시간차이가 있었으며, n형과 p형의 구분이 없었으며, 공핍층과 같은 비정질 결합구조를 보여주었다. 비정질 결합구조는 전위장벽으로 볼 수 있으며, 전위장벽은 공간전하제한전류가 흐르게 되는 원천이기도 하며, 터널링현상에 의한 전도현상이 나타나는 원인이 된다. 따라서 비정질구조에서 이동도가 증가하는 현상이 나타났으며, 케리어가 희박함에도 불구하고 전도성이 증가하는 것을 확인하였다.

• 센서학회지
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• 제27권3호
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• pp.182-185
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• 2018

Zinc oxide (ZnO) thin films have the advantages of growing at a low temperature and obtaining high charge mobility (carrier mobility) [1]. Furthermore, the zinc oxide thin film can be used to control application resistance depending on its oxygen content. ZnO has the desired physical properties, a transparent nature, with a flexible display that makes it ideal for use as a thin-film transistor. Though these transparent flexible thin-film transistors can be manufactured in various manners, manufacturing large-area transistors using a solution process is easier owing to the low cost and flexible substrate. The advantage of being able to process at low temperatures has been attracting attention as a preferred method. However, in the case of a thin-film transistor fabricated through a solution process, it is reported that charge mobility is lower. To improve upon this, a method of improving the crystallinity through heat treatment and increasing electron mobility has been reported. However, as the heat treatment temperature is relatively high at $500^{\circ}C$, an application where a flexible substrate is absent would be more suitable.

• 한국인쇄학회지
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• 제22권1호
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• pp.75-82
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• 2004

The photoluminescence and electroluminescence of poly(9-vinylcarbazole) (PVCz) containing different ratio 1.3,5-dimethly-3,5-di-tert-butyl-4,4-diphenoquinone (MBDQ), 1.3,5-diemthyl-3.5-di-tert-butyl-4,4-stylbenquinone (MBSQ) were characterized. As the contents of DQ and SQ increased, the intensity of peaks at 516 and 540nm increased in PL spectra. The results of TOF measurement were shown that the hole mobility of PVCz decreased as the ratio of DQ or SQ increased. On the other hand, the electron mobility of PVCz increased. Therefore Electron transport is more favorable than hole transport in these charge transfer complexes, due to the stronger localization of the holes. Evidence for better electron transport is the higher mobility of electrons in pure DQ or SQ compared to hole mobility in pure PVCz, and lower DQ or SQ concentration required for equivalent mobilities in the charge-transfer complexes.

• 폴리머
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• 제25권5호
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• pp.719-727
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• 2001

유기광도전체에 있어서의 액정은 종래의 분자 배향성을 가지지 않는 비정성 고체계와는 달리 분자 배향성을 가지기 때문에 분자 사이의 질서도가 높아지게 되고, charge-carrier의 hopping을 방해하는 hopping site의 공간적인 틈이 작아져 고 이동도의 특성을 가질수 있다. 본 연구에서는 유기광도전체의 전하 수송층에 액정5CT를 혼합하여, charge-carrier수송특성에 있어서의 액정5CT의 영향을 관찰하였다. 액정5CT를 함유한 유기광도전체는 액정의 혼합비가 증가함에 따가 초기전위는 증가하였으며, 암감쇄는 감소하는 경향을 나타내었다. 감도는 5CT를 TNF와 OXD 각자에 대하여 40 wt%로 혼합한 시료의 경우에 가장 우수하게 나타났다. 형광거동을 관찰한 결과, 이는 전하수송재료와 액정5CT의 전하 수송착체에 의한 것으로, 액정5CT를 TNF와 OXD 각각에 대하여 40 wt%로 혼합한 시료의 경우가 다른 시료에 비해 전하 수송착체가 가장 잘 형성되어, 성공을 잘 수송하기 때문으로 나타났다.

• 반도체디스플레이기술학회지
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• 제12권4호
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• pp.49-54
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• 2013

In this study, we have investigated the effect of the substrate temperature and oxygen flow rate on the characteristics of IZO thin films for the OLED (organic light emitting diodes) devices. For this purpose, IZO thin films were deposited by RF magnetron sputtering at room temperature and $300^{\circ}C$ with various $O_2$ flow rate. In order to investigate the influences of the oxygen, the flow rate of oxygen in argon mixing gas has been changed from 0.1sccm to 0.5sccm. IZO thin films deposited at room temperature show amorphous structure, whereas IZO thin films deposited at $300^{\circ}C$ show crystalline structure having an (222) preferential orientation regardless of $O_2$ flow rate. The electrical resistivity of IZO film increased with increasing flow rate of $O_2$ under Ar+$O_2$. The change of electrical resistivity with increasing flow rate of $O_2$ was mainly interpreted in terms of the charge carrier concentration rather than the charge carrier mobility. The electrical resistivity of the amorphous-IZO films deposited at R.T. was lower than that of the crystalline-IZO thin films deposited at $300^{\circ}C$. The change of electrical resistivity with increasing substrate temperature was mainly interpreted in terms of the charge carrier mobility rather than the charge carrier concentration. All the films showed the average transmittance over 85% in the visible range. The current density and the luminance of OLED devices with IZO thin films deposited at room temperature in 0.1sccm $O_2$ ambient gas are the highest amongst all other films. The optical band gap energy of IZO thin films plays a major role in OLED device performance, especially the current density and luminance.

• 반도체디스플레이기술학회지
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• 제11권4호
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• pp.25-30
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• 2012

In this study, we have investigated the effect of the substrate temperature and oxygen flow rate on the characteristics of IZO thin films for the organic light emitting diodes (OLED) devices. For this purpose, IZO thin films were deposited by RF magnetron sputtering at room temperature and $300^{\circ}C$ with various $O_2$ flow rate. In order to investigate the influences of the oxygen, the flow rate of oxygen in argon mixing gas has been changed from 0.1sccm to 0.5sccm. IZO thin films deposited at room temperature show amorphous structure, whereas IZO thin films deposited at $300^{\circ}C$ show crystalline structure having an (222) preferential orientation regardless of $O_2$ flow rate. The electrical resistivity of IZO film increased with increasing flow rate of $O_2$ under $Ar+O_2$. The change of electrical resistivity with increasing flow rate of $O_2$ was mainly interpreted in terms of the charge carrier concentration rather than the charge carrier mobility. The electrical resistivity of the amorphous-IZO films deposited at R.T. was lower than that of the crystalline-IZO thin films deposited at $300^{\circ}C$. The change of electrical resistivity with increasing substrate temperature was mainly interpreted in terms of the charge carrier mobility rather than the charge carrier concentration. All the films showed the average transmittance over 83% in the visible range.

• 반도체디스플레이기술학회지
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• 제12권2호
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• pp.33-37
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• 2013

In this study, we have investigated the effect of the substrate temperature and hydrogen flow rate on the characteristics of IZO thin films for the organic light emitting diodes (OLED) devices. For this purpose, IZO thin films were deposited by RF magnetron sputtering at room temperature and $300^{\circ}C$ with various $H_2$ flow rate. In order to investigate the influences of the oxygen, the flow rate of hydrogen in argon mixing gas has been changed from 0.1sccm to 0.9sccm. IZO thin films deposited at room temperature show amorphous structure, whereas IZO thin films deposited at $300^{\circ}C$ show crystalline structure having an (222) preferential orientation regardless of $H_2$ flow rate. The electrical resistivity of IZO film decreased with increasing flow rate of $H_2$ under Ar+$H_2$. The change of electrical resistivity with increasing flow rate of $H_2$ was mainly interpreted in terms of the charge carrier concentration rather than the charge carrier mobility. The electrical resistivity of the amorphous-IZO films deposited at R.T. was lower than that of the crystalline-IZO thin films deposited at $300^{\circ}C$. The increase of electrical resistivity with increasing substrate temperature was interpreted in terms of the decrease of the charge carrier mobility and the charge carrier concentration. All the films showed the average transmittance over 83% in the visible range.

• Bulletin of the Korean Chemical Society
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• 제34권7호
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• pp.2063-2066
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• 2013

While many eukaryotic and some prokaryotic proteins show a phosphorylation-dependent mobility shift (PDMS) on SDS-PAGE, the molecular mechanism for this phenomenon had not been elucidated. We have recently shown that the distribution of negatively charged amino acids around the phosphorylation site is important for the PDMS of some proteins. Here, we show that replacement of the phosphorylation site with a negatively charged amino acid results in a similar degree of the mobility shift of a protein as phosphorylation, indicating that the PDMS is due to the introduction of a negative charge by phosphorylation. Compared with a protein showing no shift, one showing a retarded mobility on SDS-PAGE had a decreased capacity for SDS binding. The elucidation of the consensus sequence (${\Theta}X_{1-3}{\Theta}X_{1-3}{\Theta}$, where ${\Theta}$ corresponds to an acidic function) for a PDMS suggests a general strategy for mutagenizing a phosphorylatable protein resulting in a PDMS.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.994-997
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• 2002

We have synthesized novel Diphenoquinone(DQ) derivatives. Electron drift mobility of DQ series was measured and electron affinity$(E_a)$ of them is estimated 3.7~3.9eV by CV. Electron drift mobility$(\mu)$ of electric field dependence by time of flight(TOF) technique is $1.76{\times}10^{-5}cm^2/V{\cdot}s$(DQ5) at the concentration of 10wt% verse poly(4,4'-cyclohexylidene diphenylcarbonate)(Pc-Z) and $1.66{\times}10^6V/cm$.

• 전기전자학회논문지
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• 제22권2호
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• pp.484-487
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• 2018

5 MeV proton-irradiation with total dose of $10^{15}/cm^2$ was performed on AlGaN/GaN-on-Si high electron mobility transistors (HEMTs) with various gate metals including Ni, TaN, W, and TiN to investigate the degradation characteristics. The positive shift of pinch-off voltage and the reduction of on-current were observed from irradiated HEMTs regardless of a type of gate materials. Hall and transmission line measurements revealed the reduction of carrier mobility and sheet charge concentration due to displacement damage by proton irradiation. The shift of pinch-off voltage was dependent on Schottky barrier heights of gate metals. Gate leakage and capacitance-voltage characteristics did not show any significant degradation demonstrating the superior radiation hardness of Schottky gate contacts on GaN.