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T. Oh and C. H. Kim "Study on Characteristic Properties of Annealed SiOC Film Prepared by Inductively Coupled Plasma Chemical Vapor Deposition," IEEE Trans. Plasma Science, vol. 38, pp. 1598-1602, 2010. DOI: https://doi.org/10.1109/TPS.2010.2049665
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Narendra Kumar, Satyendra Kumar, Jitendra Kumar and Siddhartha Pandaa, "Investigation of Mechanisms Involved in the Enhanced Label Free Detection of Prostate Cancer Biomarkers Using Field Effect Devices," Journal of The Electrochemical Society, vol. 164, no. 9, pp. B409-B416, 2017. DOI: https://doi.org/10.1149/2.0541709jes
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T. Oh and C. K. CHoi "Comparison between SiOC thin film fabricated by using plasma enhance chemical vapor deposition and SiO2 thin film by using fourier transform infrared spectroscopy," Journal of the Korean Physical Society, vol. 56, pp. 1150-1155, 2010. DOI: https://doi.org/10.3938/jkps.56.1150
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John Robertson, Robert M. Wallace, "High-K materials and metal gates for CMOS applications," Materials Science and Engineering R, vol. 88, pp.1-41. 2015. DOI: https://doi.org/10.1016/j.mser.2014.11.001
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Teresa. Oh, "Analysis of Electrical Characteristics of Oxide Semiconductor of ZnO, SnO2 and ZTO," Korean Journal of Materials Research, vol. 25, No. 7, pp. 347-351, 2015. DOI: https://doi.org/10.3740/MRSK.2015.25.7.347
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Teresa. Oh, "Tunneling Condition at High Schottky Barrier and Ambipolar Transfer Characteristics in Zinc Oxide Semiconductor Thin Film Transistor," Material Research Bulletin, vol 77, pp.1-7, 2016. DOI: https://doi.org/10.1016/j.materresbull.2015.11.038
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Kyonghwan Oh and Oh-Kyong Kwon, "Threshold-Voltage-Shift Compensation and Suppression Method Using Hydrogenated Amorphous Silicon Thin-Film Transistors for Large Active Matrix Organic Light-Emitting Diode Displays," Japanese Journal of Applied Physics, vol. 51, pp. 03CD01, 2012. DOI: https://doi.org/10.7567/JJAP.51.03CD01
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