• Journal of the Korean Society of Radiology
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• v.13 no.6
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• pp.831-840
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• 2019

The X-ray detector by liquid crystal with front light was proposed and verified by a X-ray image. The proposed detector utilizes the visible light instead of the electric signal by transistor. Therefore, it shows low noise and can be fabricated at low cost. The liquid crystal detector uses the orientation change of the liquid crystal molecule by conductivity change of the photoconductive layer. We can get the X-ray image from the transmitted light through the liquid crystal. The X-ray dose was calibrated from the measured transmittance of the visible light after comparison to the reference transmittance curve of the liquid crystal. The amorphous Se was used for photo con ducting layer and parylene was used for the liquid crystal alignment instead of the conventional alignment layer which needs high-temperature process over 200℃. The proposed X-ray detector can decrease the X-ray dose by high sensitivity which was verified by simulation. After the fabrication of the X-ray detector, the X-ray image was obtained as a function of the bias voltage to the liquid crystal. 10 lines/mm resolution was obtained from the line pattern and we will apply it to the 17inch diagonal liquid crystal X-ray detector with 3π retardation.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.12 no.7
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• pp.1235-1242
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• 2008

In this paper, x-ray image sensor of photon counting type having a $32{\times}32$ pixel array is designed with $0.18{\mu}m$ triple-well CMOS process. Each pixel of the designed image sensor has an area of loot $100{\times}100\;{\mu}m2$ and is composed of about 400 transistors. It has an open pad of an area of $50{\times}50{\mu}m2$ of CSA(charge Sensitive Amplifier) with x-ray detector through a bump bonding. To reduce layout size, self-biased folded cascode CMOS OP amp is used instead of folded cascode OP amp with voltage bias circuit at each single-pixel CSA, and 15-bit LFSR(Linear Feedback Shift Register) counter clock generator is proposed to remove short pulse which occurs from the clock before and after it enters the counting mode. And it is designed that sensor data can be read out of the sensor column by column using a column address decoder to reduce the maximum current of the CMOS x-ray image sensor in the readout mode.

• Korean Chemical Engineering Research
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• v.60 no.2
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• pp.313-319
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• 2022

AlGaN/GaN based HfO₂ MOSHEMT (metal oxide semiconductor high electron transistor) with different gate recess depth was simulate to demonstrate a successful normally-off operation of the transistor. Three types of the HEMT structures including a conventional HEMT, a gate-recessed HEMT with 3 nm thick AlGaN layer, and MIS-HEMT without AlGaN layer in the gate region. The conventional HEMT showed a normally-on characteristics with a drain current of 0.35 A at V_G = 0 V and V_DS = 15 V. The recessed HEMT with 3 nm AlGaN layer exhibited a decreased drain current of 0.15 A under the same bias condition due to the decrease of electron concentration in 2DEG (2-dimensional electron gas) channel. For the last HEMT structure, distinctive normally- off behavior of the transistor was observed, and the turn-on voltage was shifted to 0 V.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.43 no.11 s.353
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• pp.48-57
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• 2006

This work describes a 12b 200KHz 0.52mA $0.47mm^2$ algorithmic ADC for sensor applications such as motor controls, 3-phase power controls, and CMOS image sensors simultaneously requiring ultra-low power and small size. The proposed ADC is based on the conventional algorithmic architecture with recycling techniques to optimize sampling rate, resolution, chip area, and power consumption. The input SHA with eight input channels for high integration employs a folded-cascode architecture to achieve a required DC gain and a sufficient phase margin. A signal insensitive 3-D fully symmetrical layout with critical signal lines shielded reduces the capacitor and device mismatch of the MDAC. The improved switched bias power-reduction techniques reduce the power consumption of analog amplifiers. Current and voltage references are integrated on the chip with optional off-chip voltage references for low glitch noise. The employed down-sampling clock signal selects the sampling rate of 200KS/s or 10KS/s with a reduced power depending on applications. The prototype ADC in a 0.18um n-well 1P6M CMOS technology demonstrates the measured DNL and INL within 0.76LSB and 2.47LSB. The ADC shows a maximum SNDR and SFDR of 55dB and 70dB at all sampling frequencies up to 200KS/s, respectively. The active die area is $0.47mm^2$ and the chip consumes 0.94mW at 200KS/s and 0.63mW at 10KS/s at a 1.8V supply.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.46 no.3
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• pp.60-68
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• 2009

This work proposes a 10b 200MS/s 65nm CMOS ADC for high-definition video systems such as HDTV requiring high resolution and fast operating speed simultaneously. The proposed ADC employs a four-step pipeline architecture to minimize power consumption and chip area. The input SHA based on four capacitors reduces the output signal range from $1.4V_{p-p}$ to $1.0V_{p-p}$ considering high input signal levels at a low supply voltage of 1.2V. The proposed three-stage amplifiers in the input SHA and MDAC1 overcome the low output resistance problem as commonly observed in a 65nm CMOS process. The proposed multipath frequency-compensation technique enables the conventional RNMC based three-stage amplifiers to achieve a stable operation at a high sampling rate of 200MS/s. The conventional switched-bias power-reduction technique in the sub-ranging flash ADCs further reduces power consumption while the reference generator integrated on chip with optional off-chip reference voltages allows versatile system a locations. The prototype ADC in a 65nm CMOS technology demonstrates a measured DNL and INL within 0.19LSB and 0.61LSB, respectively. The ADC shows a maximum SNDR of 54.BdB and 52.4dB and a maximum SFDR of 72.9dB and 64.8dB at 150MS/S and 200MS/s, respectively. The proposed ADC occupies an active die area of $0.76mm^2$ and consumes 75.6mW at a 1.2V supply voltage.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.57-58
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• 2011

III-V족 화합물 반도체의 일종인 InSb는 77 K에서 0.23 eV의 작은 밴드 갭을 가지며 높은 전하 이동도를 가지고 있기 때문에 대기권에서 전자파 흡수가 일어나지 않는 3~5 ${\mu}m$범위의 장파장 적외선 감지가 가능하여 중적외선 감지 소자로 이용되고 있다. 하지만 InSb는 밴드 갭이 매우 작기 때문에, 소자 제작시 누설전류에 의한 소자 특성의 저하가 문제시 되고 있다. 또한 다른 화합물 반도체에 비해 녹는점이 낮고, 휘발성이 강한 5족 원소인 Sb의 승화로 기판의 화학양론적 조성비(stoichiometry)가 변하기 쉬워, 계면특성 저하의 원인이 된다. 따라서 우수한 특성을 가지는 적외선 소자의 구현을 위해서, 저온에서 계면 특성이 우수한 고품질의 절연막 증착 연구가 필수적이다. 본 연구에서는 InSb 기판 위에 $SiO_2$, $Si_3N_4$의 절연막 형성시 증착온도의 변화에 따른 계면 트랩 밀도를 분석하였다. $SiO_2$, $Si_3N_4$ 절연막은 플라즈마 화학 기상 증착법(PECVD)을 이용하여 n형 InSb 기판 위에 증착하였으며, 증착온도를 $120^{\circ}C$부터 $240^{\circ}C$까지 변화시켰다. Metal oxide semiconductor(MOS) 구조 제작을 통하여, 커패시턴스-전압(C-V)분석을 진행하였으며, 절연막과 InSb 사이의 계면 트랩 밀도를 Terman method를 이용하여 계산하였다[1]. 또한, $SiO_2$와 $Si_3N_4$의 XPS 분석과 TOF-SIMS 분석을 통하여 계면 트랩 밀도의 원인을 밝혀 보았다. $120{\sim}240^{\circ}C$ 온도 범위에서 계면 트랩 밀도는 $Si_3N_4$의 경우 $2.4{\sim}4.9{\times}10^{12}cm^{-2}eV^{-1}$, $SiO_2$의 경우 $7.1{\sim}7.3{\times}10^{11}cm^{-2}eV^{-1}$ 값을 나타냈고, 두 절연막 모두 증착 온도가 증가할수록 계면 트랩 밀도가 증가하는 경향을 보였다. 그러나 모든 샘플에서 $Si_3N_4$의 경우, flat band voltage가 음의 전압으로 이동한 반면, $SiO_2$의 경우, 양의 전압으로 이동하는 것을 확인할 수 있었다. 계면 트랩 밀도 증가의 원인을 확인하기 위해서, oxide를 $120^{\circ}C$, $240^{\circ}C$에서 증착시킨 샘플을 XPS 분석을 통하여 깊이에 따른 성분분석을 하였고, 그 결과, $240^{\circ}C$에서 증착된 샘플에서 계면에서 $In_2O_3$와 $Sb_2O_3$ 피크의 증가를 확인하였다. 이는 계면에서 oxide양이 증가함을 의미하며, 이렇게 생성된 oxide는 계면 트랩으로 작용하므로, 계면 특성을 저하시키는 원인으로 작용함을 알 수 있었다. Nitride 절연막을 증착시킨 샘플은 TOF-SIMS 분석을 통해, 계면에서의 성분 분석을 하였고, 그 결과, $240^{\circ}C$에서 증착된 샘플에서 In-N, Sb-N, Si-N 결합의 감소를 확인하였다. 이렇게 분해된 결합들의 dangling 결합이 늘어 계면 트랩으로 작용하므로, 계면 특성을 저하시키는 원인으로 작용함을 알 수 있었다. 최종적으로, 소자특성을 확인 하기 위하여 계면 트랩 밀도가 가장 낮게 측정된 $200^{\circ}C$ 조건에서 $SiO_2$ 절연막을 증착하여 InSb 적외선 소자를 제작하였다. 전류-전압(I-V) 분석 결과 -0.1 V에서 16 nA의 누설 전류 값을 보였으며, $2.6{\times}10^3{\Omega}cm^2$의 RoA(zero bias resistance area)를 얻을 수 있었다. 절연막 증착조건의 최적화를 통하여, InSb 적외선 소자의 특성이 개선됨을 확인할 수 있었다.