• Journal of the Korean Institute of Telematics and Electronics
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• v.27 no.7
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• pp.1033-1041
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• 1990

In this paper, under pinch-off conditions, the gate-drain breakdown voltage characteristics of GaAs Power MESFET's as a function of device parameters such as channel thickness, doping concentration, gate length etc. are analyzed. Using the Green's function, the gate ionic charge induced by the depleted channel ionic charge is calculated. The impact ionization integral by avalanche multiplication between gate and drain is used to investigate breakdown phenomena. Especially, the localized excess surface charge effect as well as the uniform surface charge effect on breakdown voltage is considered.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.28 no.8A
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• pp.650-656
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• 2003

In 1995, a group of representatives from the integrated circuits and computer-aided design industries presented a industry standard bipolar model called the VBIC model. The VBIC model includes the improved Early effect, quasi-saturation, substrate parasitic, avalanche multiplication, and self-heating which are not available in the conventional SGP model. This paper applies VBIC model for SiGe HBT device and develops an accurate and efficient methodology to extract all the DC and AC parameters of the VBIC model for SiGe HBT device at room temperature. Simulated results by the extracted VBIC model parameter are compared with the measurement data and show very good agreement in both DC and s-parameters prediction.

• Proceedings of the Optical Society of Korea Conference
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• 2003.07a
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• pp.100-101
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• 2003

본 논문은 초고속 광통신용 검출기로 사용되고 있는 InP／InGaAs Avalanche Photodiode (APD)에 대한 연구로서 구조 변화에 따른 APD의 특성에 대해 연구하였다. 채택된 APB의 기본 구조는 Separated Absorption, Grading, Charge and Multiplication (SAGCM)구조로 u-InP 의 두께 3.5$\mu\textrm{m}$에~2.9$\mu\textrm{m}$ 만큼 Zn diffusion 하였으며, u-InGaAs 의 흡수층 두께는 0.8$\mu\textrm{m}$ 로 하였다. charge sheet 층의 도핑 농도는 ~ 3.5 $\times$ 10／sup 12／／cm／sup 2／ 이고, 전극 구조는 back side illumination type이다. (중략)

• Journal of the Korean Vacuum Society
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• v.14 no.4
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• pp.229-237
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• 2005

The degradation phenomena in SiGe hetero-junction bipolar transistors(SiGe HBTs) induced by bias stress are investigated in this review. If SiGe HBTs are stressed over a specific time interval, the device parameters deviate from their nominal values due to the internal changes in the devices. Reverse-bias stress on emitter-base(EB) junctions causes base current increase and current gain decrease because carriers accelerated by the electrical field generate recombination centers. When forward-bias current stress is conducted at an ambient temperature above $140^{\circ}C$ , hot carriers produced by Auger recombination or avalanche multiplication induce current gain fluctuation. Mixed-mode stressing, where high emitter current and high collector-base voltage are simultaneously applied to the device, provokes base current rise as EB reverse-bias stressing does.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.8 no.1
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• pp.123-136
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• 2004

In this paper, complexity and regularity of polynomial multiplication over $GF({2^n})$ are defined by using Hamming weight of rows and columns of the matrix ever GF(2) which represents polynomial multiplication. It is shown experimentally that in order to construct the block cipher robust against differential cryptanalysis, polynomial multiplication of substitution layer and the permutation layer should have high complexity and high regularity. With result of the experiment, a way of constituting S box and G function is suggested in the block cipher whose structure is similar to SEED, which is KOREA standard of 128-bit block cipher. S box can be formed with a nonlinear function and an affine transform. Nonlinear function must be strong with differential attack and linear attack, and it consists of an inverse number over $GF({2^8})$ which has neither a fixed pout, whose input and output are the same except 0 and 1, nor an opposite fixed number, whose output is one`s complement of the input. Affine transform can be constituted so that the input/output correlation can be the lowest and there can be no fixed point or opposite fixed point. G function undergoes linear transform with 4 S-box outputs using the matrix of 4${\times}$4 over $GF({2^8})$. The components in the matrix of linear transformation have high complexity and high regularity. Furthermore, G function can be constituted so that MDS(Maximum Distance Separable) code can be formed, SAC(Strict Avalanche Criterion) can be met, and there can be no weak input where a fixed point an opposite fixed point, and output can be two`s complement of input. The primitive polynomials of nonlinear function affine transform and linear transformation are different each other. The S box and G function suggested in this paper can be used as a constituent of the block cipher with high security, in that they are strong with differential attack and linear attack with no weak input and they are excellent at diffusion.

• Nuclear Engineering and Technology
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• v.51 no.5
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• pp.1428-1435
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• 2019

The total ionizing dose (TID) and non ionizing energy loss (NIEL) effects of 100 MeV phosphorous ($P^{7+}$) and 80 MeV nitrogen ($N^{6+}$) ions on 200 GHz silicon-germanium heterojunction bipolar transistors (SiGe HBTs) were examined in the total dose range from 1 to 100 Mrad(Si). The in-situ I-V characteristics like Gummel characteristics, excess base current (${\Delta}I_B$), net oxide trapped charge ($N_{OX}$), current gain ($h_{FE}$), avalanche multiplication (M-1), neutral base recombination (NBR) and output characteristics ($I_C-V_{CE}$) were analysed before and after irradiation. The significant degradation in device parameters was observed after $100MeV\;P^{7+}$ and $80MeV\;N^{6+}$ ion irradiation. The $100MeV\;P^{7+}$ ions create more damage in the SiGe HBT structure and in turn degrade the electrical characteristics of SiGe HBTs more when compared to $80MeV\;N^{6+}$. The SiGe HBTs irradiated up to 100 Mrad of total dose were annealed from $50^{\circ}C$ to $400^{\circ}C$ in different steps for 30 min duration in order to study the recovery of electrical characteristics. The recovery factors (RFs) are employed to analyse the contribution of room temperature and isochronal annealing in total recovery.