• Title/Summary/Keyword: as

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Shedding Light on the Use of AS Relationships for Path Inference

  • Deng, Wenping;Muhlbauer, Wolfgang;Yang, Yuexiang;Zhu, Peidong;Lu, Xicheng;Plattner, Bernhard
    • Journal of Communications and Networks
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    • v.14 no.3
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    • pp.336-345
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    • 2012
  • Autonomous system (AS) business relationships and their inference have been widely studied by network researchers in the past. An important application of inferred AS relationships can be the prediction of AS paths between a source and destination AS within a model. However, besides knowing the topology and inferred AS relationships, AS path prediction within a model needs to be understood in order for us to know how we can derive border gateway protocol (BGP) policies from AS relationships. In this paper, we shed light onto the predictive capabilities of AS relationships by investigating whether they can be translated into BGP policies such that inferred AS paths are consistent with real AS paths, e.g., paths observed from BGP routing tables. Our findings indicate that enforcing constraints such as the well-known valley-free property and the widely assumed preference of customer routes always results in a very low consistency for AS path inference. In addition, this is true irrespective of whether customer, peer, or provider routes are preferred. Apparently, applying such constraints eliminates many "correct" paths that are observed in BGP routing tables and that are propagated in a simple shortest path model where AS relationships are ignored. According to our findings, deriving BGP routing policies for predicting with high accuracy AS paths in a model directly from AS relationships is still difficult.

Growth Interruption Effects of GaAs/AlGaAs Quantum Wells Grown by Molecular Beam Epitaxy (분자선에피택시에 의해 성장한 GaAs/AlGaAs 양자우물의 성장 멈춤 효과)

  • Kim, Min-Su;Leem, Jae-Young
    • Journal of the Korean Vacuum Society
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    • v.19 no.5
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    • pp.365-370
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    • 2010
  • The growth interruption effects on growth mode of the GaAs and AlGaAs epitaxial layers grown on GaAs substrate by molecular beam epitaxy were investigated. Growth process of the epitaxial layers as a function of the growth interruption time was observed by reflection high energy electron diffraction (RHEED). The growth interruption time was 0, 15, 30, 60 s. The GaAs/$Al_{0.3}Ga_{0.7}As$ multi quantum wells (MQWs) with different growth interruption time were grown and its properties were investigated. RHEED intensity oscillation and optical property of the MQWs were dependent on the growth interruption time. When the growth interruption time was 30 s, interface between the well and barrier layers became sharper.

운반자 구속 현상이 개선된 InAs/GaAs 양자점 성장 및 특성평가

  • Jo, Byeong-Gu;Lee, Gwang-Jae;Park, Dong-U;Kim, Hyeon-Jun;Hwang, Jeong-U;O, Hye-Min;Lee, Gwan-Jae;Kim, Jin-Su;Kim, Jong-Su;No, Sam-Gyu;Im, Jae-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.154-154
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    • 2011
  • 자발형성법(Self-assembled)을 이용한 InAs 양자점(Quantum dots)은 성장법의 고유한 물리적 한계로 길이방향에 대한 수직방향 비율(Aspect ratio, AR)이 상대적으로 작은 값을 갖는다. 기존에 보고된 바에 따르면 GaAs 기판에 형성한 InAs 양자점은 일반적으로 AR이 0.3 정도를 보인다. 이러한 높이가 상대적으로 낮은 InAs 양자점은 수직방향으로 운반자(Carrier)의 파동함수 (Wave-function) 구속이 작게 되어 나노 양자점 구조의 0차원적 특성이 저하되게 된다. 본 논문에서는 Arsenic 차단법(Interruption technique)을 이용한 수정자발형성법(Modified self-assembled method, MSAM)으로 InAs 양자점(MSAM-InAs 양자점)을 형성하고 성장 변수에 따라 광 및 구조적 특성을 평가하여 0차원 순도를 분석하였다. MSAM InAs 양자점을 성장하고 12 nm 두께의 GaAs spacer 층을 증착한 후 $600^{\circ}C$에서 30초 동안 Arsenic 분위기에서 열처리(Annealing)를 수행 한 후 다시 InAs을 증착 하였다. 이러한 과정을 5번 반복하여 높이 방향으로 형상을 개선시킨 InAs 양자점을(Vetically-controlled MSAM, VCMSAM) 성장하였다. 기존 자발형성법을 이용한 InAs 양자점과 MSAM-InAs 양자점 단일층 구조를 기준시료로 성장하였다. 상온 포토루미네슨스(Photoluminescence, PL) 실험에서 단일 MSAM InAs 양자점 및 VCMSAM 양자점 시료의 발광에너지는 각각 1.10 eV와 1.13 eV를 나타내었다. VCMSAM InAs 양자점 시료의 PL세기는 단일 MSAM 양자점보다 3.4배 증가되어, 확연히 높게 나타나는 결과를 보였다. 이러한 결과는 높이 방향으로 운반자의 파동함수 구속력이 증가하여 구속준위 (Localized states)의 전자-정공의 파동함수중첩(Overlap integral)이 개선된 것으로 설명할 수 있다. 투과전자현미경(Transmission electron microscopy) 및 원자력간 현미경(Atomic force microscopy)을 이용하여 구조적 특성을 평가하고 이를 비교 분석한 결과를 보고한다.

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The Structural and Optical Properties of GaAs- SiO2 Composite Thin Films With Varying GaAs Nano-particle Size (GaAs 나노입자 크기에 따른 SiO2 혼합박막의 구조적 광학적 특성)

  • Lee, Seong-Hun;Kim, Won-Mok;Sin, Dong-Uk;Jo, Seong-Hun;Jeong, Byeong-Gi;Lee, Taek-Seong;Lee, Gyeong-Seok
    • Korean Journal of Materials Research
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    • v.12 no.4
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    • pp.296-303
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    • 2002
  • For potential application to quantum mechanical devices, nano-composite thin films, consisting of GaAs quantum dots dispersed in SiO$_2$ glass matrix, were fabricated and studied in terms of structural, chemical, and optical properties. In order to form crystalline GaAs quantum dots at room temperature, uniformly dispersed in $SiO_2$matrix, the composite films were made to consist of alternating layers of GaAs and $SiO_2$in the manner of a superlattice using RF magnetron sputter deposition. Among different film samples, nominal thickness of an individual GaAs layer was varied with a total GaAs volume fraction fixed. From images of High Resolution Transmission Electron Microscopy (HRTEM), the formation of GaAs quantum dots on SiO$_2$was shown to depend on GaAs nominal thickness. GaAs deposits were crystalline and GaAs compound-like chemically according to HRTEM and XPS analysis, respectively. From measurement of optical absorbance using a spectrophotometer, absorption edges were determined and compared among composite films of varying GaAs nominal thicknesses. A progressively larger shift of absorption edge was noticed toward a blue wavelength with decreasing GaAs nominal thickness, i.e. quantum dots size. Band gaps of the composite films were also determined from Tauc plots as well as from PL measurements, displaying a linear decrease with increasing GaAs nominal thickness.

GaAs Epitaxial Layer Growth by Molecuar Beam Epitaxy (MBE에 이한 GaAs 에피택셜층 성장)

  • 정학기;이재진
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.22 no.6
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    • pp.34-40
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    • 1985
  • Characteristics of GaAE epilayers grown on (100) CaAs wa(tors by molecular beam epitaxy (MBE) under various single crystal growing conditions were investigated. In fabrica-ting GaAs, epilayer by MBE, the most important factors are a substrate temperature(ts) and a flux density ratio (As/Ga). In this experiment, the substrate temperature was varied in the range of 48$0^{\circ}C$ to $650^{\circ}C$ and As and Ga cell temperatures were varied in the range of 218$^{\circ}C$ to 256$^{\circ}C$ and 876$^{\circ}C$ to 98$0^{\circ}C$, respectively. At the substrate temperature of 54$0^{\circ}C$, As cell temperature of 23$0^{\circ}C$, and Ga cell temperature of 91$0^{\circ}C$, the As/Ga ratio was 5"10, the surface morphology was most smooth . Investigation of As-stabilized surface by RHEED and of depth profile by SIM5 showed that As is less stable than Ga. Also, X-ray diffraction measurement revealed that single crystals of (400) and (200) were formed at the both sub-strate temperatures of 52$0^{\circ}C$ and 54$0^{\circ}C$.TEX>.

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Ferromagnetism and Magnetotransport of Be-codoped GaMnAs (Be-codoped GaMnAs의 상온 강자성 및 자기 수송 특성)

  • Im, W.S.;Yu, F.C.;Gao, C.X.;Kim, D.J.;Kim, H.J.;Ihm, Y.E.;Kim, C.S.
    • Journal of the Korean Magnetics Society
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    • v.14 no.6
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    • pp.213-218
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    • 2004
  • Be-codoped GaMnAs layers were systematically grown via molecular beam epitaxy with varying Mn- and Be-flux. Mn flux was controlled to cover from solid solution type GaMnAs to precipitated GaMnAs. Two Be flux were chosen to exhibit semiconducting and metallic resistivity in the grown layers. The structural, electrical, and magnetic properties of GaAs:(Mn, Be) were investigated. The lightly Be-codoped GaMnAs layers showed ferromagnetism at room temperature, but did not reveal magnetotransport due to small magneto-resistance and high resistance of the matrix. However, room temperature magnetotransport could be observed in the degenerate Be-codoped GaMnAs layers, and which was assisted by the high conductivity of the matrix. The Be-codoping has promoted segregation of new ferromagnetic phase of MnGa as well as MnAs.

Reduction of Drain Leakage Current by AlGaAs buffer layer in GaAs MESFET (GaAs MESFET에서 AlGaAs buffer layer에 의한 Drain 누설전류 차단)

  • Park, Jun;Jo, Jung-Yol
    • Proceedings of the KIEE Conference
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    • 1998.07d
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    • pp.1321-1323
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    • 1998
  • We investigated drain leakage current in GaAs power MESFET. The device we studied by 20 simulation has a $1000{\AA}$ thick AlGaAs buffer layer under n-GaAs active layer. The calculation shows that the leakage current through GaAs substrate is significantly reduced by the buffer layer.

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Digital recess etching for advanced performance of 0.25$\mu\textrm{m}$­ Double-heterostructure AIGaAs/GaAs PHEMT (0-25 $\mu\textrm{m}$ gate Double-heterostructure AIGaAs/GaAs PHEMT의 성능향상을 위한 디지털 리세스에 대한 연구)

  • 류충식;장효은;범진욱
    • Proceedings of the IEEK Conference
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    • 2002.06b
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    • pp.213-216
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    • 2002
  • A double-heterostructure AIGaAs/GaAs PHEMT (Pseudomorphic High Electron Mobility Transistor) using digital recess has been successfully realized. Futhermore, the differences of gm,nax, fT, fmax between two samples are as low as 0.62%, 1.58% and 2.56 % respectively. Experimental results are presented demonstrating the etch rate and Process invariability with respect to hydrogen peroxide and acid exposure times with uniformity among devices on a sample.

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The Electronic Properties and the Interface Stoichiometries of Ge-GaAs and AlAs-GaAs (Ge-GaAs 계면과 AlAs-GaAs 계면의 전자구조와 화학적 특성)

  • 조화석;박진호;오영기;김민기
    • Journal of the Korean Vacuum Society
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    • v.2 no.3
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    • pp.339-345
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    • 1993
  • 계면의 원자구조와 전자특성간의 상관성을 연구하기 위하여 GaAs-Ge(AlAs) 이종접합에서 전자의 국소상태밀도(LDOS)를 계산하였다. 본 연구에서는 tight-binding recursion 방법을 기초로 하여 계면의 국소상태밀도로부터 band-offsets, 계면형성에너지, 계면결합의 bond order 등을 연구하는 보다 편리한 방법을 제시하였다.

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Crystal Growth and Characterization of Compound Semiconductor Materials (화합물 반도체 재료의 결정성장과 특성평가)

  • 민석기
    • Korean Journal of Crystallography
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    • v.1 no.2
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    • pp.115-125
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    • 1990
  • We have investigated bulk and hetero-epitaxial growth of GaAs single crystal. Various growth techniques such as HB, HZM, and VGF for high quality bulk GaAs were successfully developed by appling the specially designed DM(direct monitoring) furnace. Al GaAs/GaAs superlattice structure and In(x)Ga(1-x) As/GaAs epilayers were also grown by MOCVD and VPE, respectively. The characterization of GaAs single crystals and epilayers was made by X-ray diffraction, Hall effect, PL, chemical etching and angle lapping technique.

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