• Journal of the Korean Magnetics Society
• /
• v.10 no.1
• /
• pp.7-10
• /
• 2000

The soft magnetic properties of Co-based amorphous alloy have been studied as a function of cooling condition after annealing. The F&W treatment (furnace cooling to 25$0^{\circ}C$ then water quenching) could increase 60~10$0^{\circ}C$ more the initial permeability than those of furnace cooled or water quenched alloys. These results are investigated in terms of thermal stress and ordering of magnetic ion pairs.

• Proceedings of the KIEE Conference
• /
• 1987.07a
• /
• pp.539-541
• /
• 1987

P+ ion implanted poly-Si flim with doses of 10E13-10E16 ions/$cm^2$ were annealed by CO2 laser and their sheet resistances were measured and compared with thoses of furnace annealed samples. In case of lightly doped samples, the measured sheet resistance of laser annealed samples were lower several orders of magnitude than those of furnace annealed samples. The origin of this reduction of sheet resistances is supposed to be the increase of the grain size to the extent of certain critical value.

• Journal of Hydrogen and New Energy
• /
• v.30 no.5
• /
• pp.455-464
• /
• 2019

Experiments were conducted to investigate the sensitivity of steel plate oxidation with temperature in a simulated furnace. Used steel plates were a general steel and a high tensile steel. Porous media burner (PM burner) used in model furnace was made for uniform temperature profile. The surrounding temperature was controlled by adjusting the flow rate of the mixture in the combustor. Oxide layer analysis was performed using SEM image analysis and EDS line scanning. Both steel sheets showed a tendency to increase the thickness of the steel sheet surface oxide layer as the temperature increases, and it was confirmed that the flaking phenomenon in surface oxidation layer appeared when the temperature was above a certain temperature.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.08a
• /
• pp.242.1-242.1
• /
• 2013

최근, 저항변화 메모리 (resistance random access memory, ReRAM)는 단순한 구조, 고집적성, 낮은 소비 전력, 우수한 retention 특성 CMOS 기술과의 공정호환성 등의 장점으로 인하여 현재 사용되는 메모리의 물리적 한계를 극복할 수 있는 차세대 메모리로써 주목을 받고 있다. 더욱이 용액공정은 높은 균일성, 공정 시간 및 비율 감소 그리고 대면적화가 가능한 장점을 가진 이유로 TiOx, ZrOx ZnO 같은 high-k 물질들을 이용한 연구가 보고되고 있다. 기존의 ReRAM 용액공정에서 결함, 즉 oxygen vacancies 그리고 불순물들을 제어하기 위해 일반적으로 사용되는 furnace 열처리는 낮은 열효율과 고비용등의 문제점을 가지고 있다. 특히 glass 또는 flexble 기판의 경우 열처리 온도에 제약이 있다. 이러한 문제를 해결하기 위한 방법으로 열 균일성, 짧은 공정시간 의 장점을 가진 microwave 열처리 방법이 보고되고 있다. 따라서 본 연구에서는 용액공정을 이용하여 증착한 HfOx 기반의 저항변화 메모리를 제작하여 저온에서 microwave 열처리 와 furnace 열처리의 특성을 비교평가 하였다. 그 결과 microwave 열처리 방법이 furnace 열처리 방법보다 넓은 메모리 마진, 향상된 uniformity 를 가지는 것을 확인 하였다. 이로써 저온공정이 필요한 ReRAM 의 열처리 대안책 으로 사용될 수 있을 것으로 기대된다.

• The Transactions of The Korean Institute of Electrical Engineers
• /
• v.60 no.6
• /
• pp.1175-1177
• /
• 2011

The SBN thin films were deposited on Pt/Ti/$SiO_2$/Si and p-type Si(100) substrate by rf magnetron sputtering method using $Sr_{0.7}Bi_{2.3}Nb_2O_9$ ceramic target. SBN thin films deposited were annealed at 600~800[$^{\circ}C$] by furnace in oxygen atmosphere during 40min. The polarization characteristics have been investigated to confirm the possibility of the SBN thin films for the application to destructive read out ferroelectric random access memory. The maximum remanent polarization and the coercive voltage are 0.6[${\mu}C/cm^2$], 1.2[V] respectively at annealing temperature of 800[$^{\circ}C$]. The leakage current density was the $2.57{\times}10^{-6}[A/cm^2]$ at an applied voltage of 5[V] at annealing temperature of 650[$^{\circ}C$]. Also, the fatigue characteristics of SBN thin films did not change up to $10^8$ switching cycles.

• Journal of the Korean Institute of Telematics and Electronics A
• /
• v.30A no.10
• /
• pp.41-50
• /
• 1993

This paper describes the fabrication process and electrical characteristics of PSA (Polysilicon Self-Align) bipolar transistors with a thin base width of 1100.angs.. To realize this shallow junction depth, one-step rapid thermal annealing(RTA) technology has been applied instead of conventional furnace annealing process. It has been shown that the series resistances and parasitic capacitances are significantly reduced in the device with emitter area of 1${\times}4{\mu}m^{2}$. The switching speed of 2.4ns/gate was obtained by measuring the minimum propagation delay time in the I$^{2}$L ring oscillator with 31 stages.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2006.08a
• /
• pp.1469-1472
• /
• 2006

We investigated the electrical and optical properties of ZnO:Al thin films as a function of the thermal process conditions. The film was prepared by RF magnetron sputtering followed by annealing in a box furnace in air. An ZnO:Al (98:2) alloy with the purity of 99.99% (3 inch diameter) was used as the target material. The electrical properties of the transparent electrode, exhibited surface oxidation as a result of rapid oxygen absorption with increasing annealing temperature. The processed ZnO:Al films and commercial ITO(indium-tin-oxide) were applied to an OLED stack to investigate the current density and luminescence efficiency. The efficiency of the device using the ZnO:Al electrode was higher than that from the device using the ITO electrode.

• Proceedings of the IEEK Conference
• /
• 2003.07b
• /
• pp.1069-1072
• /
• 2003

Germane-sillicide phase formation on S $i_{0.25}$G $e_{0.75}$ with Ni 100$\square$, Co 10$\square$/Ni 100$\square$ and Ni 50$\square$/Co 10$\square$/Ni 50$\square$ layer was studied by sheet resistance and Field Emission Scanning Electron Microscopy(FESEM). Thermal stability of nickel germane-silicide is found to be improved by sputtering Ni/Co/Ni on the SiGe. After annealing at 600, 650, $700^{\circ}C$, 30min., the nickel germane-silicide formed by Ni 50$\square$/Co 10$\square$/Ni 50$\square$ layer achieved a sheet resistance less than 17ohms/sq.(almost the same to the value before furnace annealing for 30min.) , while the process of the other two ways result in high sheet resistance and even sheet resistance fail due to Ge segregation.ion.

• Journal of the Korean Ceramic Society
• /
• v.43 no.4 s.287
• /
• pp.220-223
• /
• 2006

BLT nanotubes were synthesized by using simple and convenient method template-wetting process. Porous alumina membranes were prepared by 2 step anodic oxidation as the template. To improve wetting properties and make low surface energy, BLT solution was mixed with polymer. Polymer was removed completely during annealing. After completely etching the template in 30 wt% KOH solution, we demonstrate that BLT nanotubes with a diameter of 200 nm can be fabricated. Grain growth process of BLT nanotubes during baking, and furnace annealing was examined by FE-SEM and XRD.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 1993.05a
• /
• pp.62-63
• /
• 1993

Salicide(Self-aligned) CoSi$_2$의 형성을 알아보기 위하여, 단결정 실리콘 기판내에 불순물 주입에 따른 실리사이드의 형성영향을 알아보는, As,BF$_2$를 주입 한 시편과, 코발트와 SiO$_2$를 증착한 시편을 준비하였다. RF sputtering 방식으로 각각의 기판위에 코발트를 증착 한 후 Rapid Thermal Annealing(RTA) 온도 400-100$0^{\circ}C$영역에서 20초 동안 열처리 하였다. RTA 온도 80$0^{\circ}C$에서 비저항이 약 18$\mu$$\Omega$-cm정도의 CoSi$_2$를 형성 시켰으며 SEM 과 $\alpha$-step 으로 확인된 Si 기판과 코발트 실리사이드의 계면 roughness 및 surface roughness는 우수하였고, CoSi$_2$의 두께 증가에 따른 실리콘 소모량의 증가에 따라 기판내에 있던 As,BF$_2$ 이온들이 실리사이드내로 재분포 되는 현상을 보였다.CoSi$_2$/Si 계면간의 열적안정성은 $N_2$분위기로 30분간 Furnace Annealing 온도 100$0^{\circ}C$까지 CoSi$_2$의 응집화 현상이 일어나지 않았다.