• Title/Summary/Keyword: a-C:H film

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Anneal Temperature Effects on Hydrogenated Thin Film Silicon for TFT Applications

  • Ahn, Byeong-Jae;Kim, Do-Young;Yoo, Jin-Su;Junsin Yi
    • Transactions on Electrical and Electronic Materials
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    • v.1 no.2
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    • pp.7-11
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    • 2000
  • a-Si:H and poly-Si TFT(thin film transistor) characteristics were investigated using an inverted staggered type TFT. The TFT an as-grown a-Si:H exhibited a low field effect mobility, transconductance, and high gate threshold voltage. The poly-Si films were achieved by using an isothermal and RTA treatment for glow discharge deposited a-Si:H films. The a-Si:H films were cystallized at the various temperature from 600$^{\circ}C$ to 1000$^{\circ}C$. As anneal temperature was elevated, the TFT exhibited increased g$\sub$m/ and reduced V$\sub$ds/. V$\sub$T/. The poly-Si grain boundary passivation with grain boundary trap types and activation energies as a function of anneal temperature. The poly-si TFT showed an improved I$\sub$nm//I$\sub$off/ ratio of 10$\^$6/, reduced gate threshold voltage, and increased field effect mobility by three orders.

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The Phase Transition and Thermochromic Characteristics of W/Mg-codoped Monoclinic VO2 Nanoparticle and Its Composite Film

  • Park, Heesun;Kim, Jongmin;Jung, Young Hee;Kim, Yeong Il
    • Journal of the Korean Chemical Society
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    • v.61 no.2
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    • pp.57-64
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    • 2017
  • Monoclinic $VO_2(M)$ nanoparticles codoped with 1.5 at. % W and 2.9 at. % Mg were synthesized by the hydrothermal treatment and post-thermal transformation method of $V_2O_5-H_2C_2O_4-H_2O$ with $Na_2WO_4$ and $Mg(NO_3)_2$. The composite thin film of the W/Mg-codoped $VO_2(M)$ with a commercial acrylic block copolymer was also prepared on PET substrate by wet-coating method. The reversible phase transition characteristics of the codoped $VO_2(M)$ nanoparticles and the composite film were investigated from DSC, resistivity and Vis-NIR transmittance measurements compared with the undoped and Wdoped $VO_2(M)$ samples. Mg-codoping into W-doped $VO_2(M)$ nanoparticles synergistically enhanced the transition characteristics by increasing the sharpness of transition while the transition temperature ($T_c$) lowered by W-doping was maintained. The codoped composite film showed the prominently enhanced NIR switching efficiency compared to only W-doped $VO_2(M)$ film with a lowered $T_c$.

A Study on the SiO2Sensing Layer Used in ISFET (ISFET용 SiO2 감응박막에 관한 연구)

  • 최두진;임공진;정형진;김창은
    • Journal of the Korean Ceramic Society
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    • v.27 no.1
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    • pp.79-85
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    • 1990
  • A study on the oxidation of SiO2 sensing layer was done at 950, 1000, 105$0^{\circ}C$ under dry O2 atmosphere. The rate determining step around the oxide layer thickness, 1000$\AA$ was different with the oxidation temperature, as follows ; ⅰ) linear growth at 95$0^{\circ}C$ and ⅱ) parabolic growth at 100$0^{\circ}C$ and 105$0^{\circ}C$. The flatness of SiO2 film was observed within $\pm$1% and surface state charge density was reduced by annealing in N2 atmosphere. Finally, pH sensitivity of SiO2 film, in the range of pH 3-9, was 20mV/pH.

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Synthesis and Photoluminescence Characteristics of Zinc Gallate (ZnGa2O4) Thin Film Phosphors (Zinc Gallate (ZnGa2O4)박막 형광체의 합성과 발광특성)

  • Kim, Su-Youn;Yun, Young-Hoon;Choi, Sung-Churl
    • Journal of the Korean Ceramic Society
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    • v.44 no.1 s.296
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    • pp.32-36
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    • 2007
  • Zinc gallate $(ZnGa_2O_4)$ thin film phosphors have been formed on ITO glass substrates by a sol-gel spinning coating method. For the formation of the film phosphors, the starting materials of zinc acetate dihydrate, gallium nitrate hydrate and 2-methoxyethanol as a solution were used. The thin films deposited were firstly dried at $100^{\circ}C$ and fired at $500^{\circ}C\;or\;600^{\circ}C$ for 30 min and then, annealed $500^{\circ}C\;or\;600^{\circ}C$ at for 30 min under an annealing atmosphere of 3% $H_2/Ar$. The thin films deposited on ITO glass plates showed the (220), (222), (400), (422), (511), and (440) peaks of spinel structure as well as the (311) peak indicating a standard powder diffraction pattern. The surface morphologies of the thin film phosphors were observed with a firing and an annealing condition. The $ZnGa_2O_4$ film phosphors showed the blue emission spectra around 410 nm as well as the emission spectra in the UV region (360-380 nm).

Thin Film Adhesion and Cutting Performance in Diamond-Coated Carbide Tools

  • Jong Hee Kim;Dae Young Jung;Hee Kap Oh
    • The Korean Journal of Ceramics
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    • v.3 no.2
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    • pp.105-109
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    • 1997
  • The effects of surface conditions of the C-2 cemented carbide substrate on the adhesion of diamond film were investigated. The substrates were pretreated for different times with Murakami's reagent and then the acid solution of an H2SO4-H2O2. The adhesion strength was estimated by a peeling area around the Rockwell-A indentation. The cutting performance of the diamond-coated tools was evaluated by measuring flank wears in dry turning of Al-17% Si alloy. The morphology of deposited diamond crystallites was dominated by (111) and (220) surfaces with a cubooctahedral shape. The diamond film quality was hardly affected by the surface conditions of the substrate. The variation of tool life with longer substrate etching times resulted from a compromies between the increase of film adhesion at the interface and the decrease of toughness at the substrate surface. The coated tools were mainly deteriorated by chipping and flaking of the diamond film form a lock of adhesion strength, differently from the wear phenomena of PCD tools.

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Structural and electrical characteristics of IZO thin films deposited under different ambient gases (분위기 가스에 따른 IZO 박막의 구조적 및 전기적 특성)

  • Lee, Yu-Lim;Lee, Kyu-Mann
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.3
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    • pp.53-58
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    • 2010
  • In this study, we have investigated the effect of the ambient gases on the characteristics of IZO thin films for the OLED (organic light emitting diodes) devices. For this purpose, IZO thin films were deposited by RF magnetron sputtering under various ambient gases (Ar, $Ar+O_2$ and $Ar+H_2$) at $150^{\circ}C$. In order to investigate the influences of the oxygen and hydrogen, the flow rate of oxygen and hydrogen in argon mixing gas has been changed from 0.1sccm to 0.5sccm, respectively. All the samples show amorphous structure regardless of ambient gases. The electrical resistivity of IZO film increased with increasing flow rate of $O_2$ under $Ar+O_2$ while under $Ar+H_2$ atmosphere the electrical resistivity showed minimum value near 0.5sccm of $H_2$. All the films showed the average transmittance over 85% in the visible range. The OLED device was fabricated with different IZO substrates made by configuration of IZO/${\alpha}$-NPD/DPVB/$Alq_3$/LiF/Al to elucidate the performance of IZO substrate. OLED devices with the amorphous-IZO (a-IZO) anode film show better current densityvoltage-luminance characteristics than that of OLED devices with the commercial crystalline-ITO (c-ITO) anode film. It can be explained that very flat surface roughness and high work function of a-IZO anode film lead to more efficient hole injection by reduction of interface barrier height between anode and organic layers. This suggests that a-IZO film is a promising anode materials substituting conventional c-ITO anode in OLED devices.

Interface Passivation Properties of Crystalline Silicon Wafer Using Hydrogenated Amorphous Silicon Thin Film by Hot-Wire CVD (열선 CVD법으로 증착된 비정질 실리콘 박막과 결정질 실리콘 기판 계면의 passivation 특성 분석)

  • Kim, Chan-Seok;Jeong, Dae-Young;Song, Jun-Yong;Park, Sang-Hyun;Cho, Jun-Sik;Yoon, Kyoung-Hoon;Song, Jin-Soo;Kim, Dong-Hwan;Yi, Jun-Sin;Lee, Jeong-Chul
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.06a
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    • pp.172-175
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    • 2009
  • n-type crystalline silicon wafers were passivated with intrinsic a-Si:H thin films on both sides using HWCVD. Minority carrier lifetime measurement was used to verify interface passivation properties between a-Si:H thin film and crystalline Si wafer. Thin film interface characteristics were investigated depending on $H_2/SiH_4$ ratio and hot wire deposition temperature. Vacuum annealing were processed after deposition a-Si:H thin films on both sides to investigate thermal effects from post process steps. We noticed the effect of interface passivation properties according to $H_2/SiH_4$ ratio and hot wire deposition temperature, and we had maximum point of minority carrier lifetime at H2/SiH4 10 ratio and $1600^{\circ}C$ wire temperature.

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Advances in Absorbers and Reflectors of Amorphous Silicon Oxide Thin Film Solar Cells for Tandem Devices (적층형 태양전지를 위한 비정질실리콘계 산화막 박막태양전지의 광흡수층 및 반사체 성능 향상 기술)

  • Kang, Dong-Won
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.2
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    • pp.115-118
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    • 2017
  • Highly photosensitive and wide bandgap amorphous silicon oxide (a-$SiO_x$:H) films were developed at low temperature ranges ($100{\sim}150^{\circ}C$) with employing plasma-enhanced chemical vapor deposition by optimizing $H_2/SiH_4$ gas ratio and $CO_2$ flow. Photosensitivity more than $10^5$ and wide bandgap (1.81~1.85 eV) properties were used for making the a-$SiO_x$:H thin film solar cells, which exhibited a high open circuit voltage of 0.987 V at the substrate temperature of $100^{\circ}C$. In addition, a power conversion efficiency of 6.87% for the cell could be improved up to 7.77% by employing a new n-type nc-$SiO_x$:H/ZnO:Al/Ag triple back-reflector that offers better short circuit currents in the thin film photovoltaic devices.

Degradation Efficiencies of Gas Phase Hydrocarbons for Photocatalysis Reactor With TiO2Thin Film (TiO2광촉매 반응기의 기체상 탄화수소의 분해효율)

  • 이진홍;박종숙;김진석;오상협;김동현
    • Journal of Korean Society for Atmospheric Environment
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    • v.18 no.3
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    • pp.223-230
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    • 2002
  • Titania photocatalytic oxidation reactors were studied to investigate degradation efficiencies of hydrocarbons. In general, it is well known phenomena that thin layered titania oxidizes most of hydrocarbons to carbon dioxide and water under UV light. In this study, degradation efficiencies were measured due to changes in reactor structures, UV sources, the number of titania coatings, and various hydrocarbon chemicals. It was proven that gas degradation efficiencies are related to such factors as UV transmittance of coating substance, collision area of surface, and gas flow rate. For packing type annular reactor, about 98% degradation efficiency was achieved for achieved for propylene of 500 ppm level at a flow rate of 100 ml/min. Several gases were also tested for double-coated titania thin film under the condition of continuous flow of 100 ml/min and 365 nm UV source. It was shown that degradation efficiencies were decreasing in the order: $C_3$ $H_{6}$, n-C$_4$ $H_{10}$, $C_2$ $H_4$, $C_2$ $H_2$, $C_{6}$ $H_{6}$ and $C_2$ $H_{6}$./. 6/./.

Film-Forming Properties of Proteinaceous Fibrous Material Produced from Soybean Fermented by Bacillus natto

  • Park Sang-Kyu;Bae Dong-Ho
    • Journal of Microbiology and Biotechnology
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    • v.16 no.7
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    • pp.1053-1059
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    • 2006
  • The effectiveness of a proteinaceous fibrous material formed during commercial fermentation of soy protein (PFSP) and cysteine addition were evaluated in order to improve on the properties of soy protein-based films. Nine types of films were prepared at pH 7, 9, and 11, with heat treatments at $70^{\circ}C\;and\;90^{\circ}C$ for 30 min, by casting 5% (w/w) PFSP aqueous solution, containing 2.25% (w/w) glycerol, on to polystyrene plates. The tensile strength (TS) of films ranged from 3.88 to 6.87 MPa. The highest puncture strength (PS) was observed with pH 7.0 films prepared from PFSP solution heated at $70^{\circ}C$ (P<0.05). Alkaline pH and temperature caused a decrease in both the TS and PS of the films. The thickness of films ranged from $58\;to\;74{\mu}m$. Water vapor permeabilities of the films decreased with increasing pH and temperature. To produce films from PFSP, pH value of 7.0 to 9.0 and heat treatment of $70^{\circ}C\;to\;90^{\circ}C$ were needed. A soluble nature of PFSP films in water might be useful for preparation of hot water-soluble pouches. Cysteine addition could be necessary to produce films with increased TS and enhanced barrier properties. The combination treatment that provided the best combination of barrier and mechanical properties was the PFSP film prepared at pH 7.0 with addition of 1% cysteine. The films were good oxygen barriers.