• Title/Summary/Keyword: Via etching

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A Study of Field-Ring Design using a Variety of Analysis Method in Insulated Gate Bipolar Transistor (IGBT)

  • Jung, Eun Sik;Kyoung, Sin-Su;Chung, Hunsuk;Kang, Ey Goo
    • Journal of Electrical Engineering and Technology
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    • v.9 no.6
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    • pp.1995-2003
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    • 2014
  • Power semiconductor devices have been the major backbone for high-power electronic devices. One of important parameters in view of power semiconductor devices often characterize with a high breakdown voltage. Therefore, many efforts have been made, since the development of the Insulated Gate Bipolar Transistor (IGBT), toward having higher level of breakdown voltage, whereby the typical design thereof is focused on the structure using the field ring. In this study, in an attempt to make up more optimized field-ring structure, the characteristics of the field ring were investigated with the use of theoretical arithmetic model and methodologically the design of experiments (DOE). In addition, the IGBT having the field-ring structure was designed via simulation based on the finding from the above, the result of which was also analyzed. Lastly, the current study described the trench field-ring structure taking advantages of trench-etching process having the improved field-ring structure, not as simple as the conventional one. As a result of the simulation, it was found that the improved trench field-ring structure leads to more desirable voltage divider than relying on the conventional field-ring structure.

Oil Retention Experiments and Evaluations for Electrochemically Etched Porous Stainless Steel Surface (전기화학적으로 에칭된 다공성 스테인리스 스틸 표면의 오일 보존 실험 및 성능 평가)

  • Lee, Chan;Kim, Aeree;Kim, Joonwon
    • Journal of the Korean Society for Precision Engineering
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    • v.31 no.12
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    • pp.1171-1176
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    • 2014
  • Oil retention experiments were conducted and the performance was characterized for electrochemically etched stainless steels. The 304 stainless steels were electrochemically etched in dilute Aqua Regia to form porous structures. The structures were also hierarchical, which provides very large area for oils to adhere. Also the structures had deep valleys, which act as reservoir and are able to resist against oil-detaching forces. Several commercial oils were dispensed to characterize oil retention properties via rotating disk experiment method. The results showed that the etched surfaces have superior oil retention performance in every conditions. Also the retention enhancement ratio went particularly higher as the environments became more severe. This surface modification technique could be applied to other steel products for pretreatments of various kinds of coatings.

Diagnostics of Magnetron Sputtering Plasmas: Distributions of Density and Velocity of Sputtered Metal Atoms

  • Sasaki, Koichi
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.98-99
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    • 2012
  • Deposition of thin films using magnetron sputtering plasmas is a well-developed, classical technology. However, detailed investigations using advanced diagnostics are insufficient in magnetron sputtering, in comparison with plasma-aided dry etching and plasma-enhanced chemical vapor deposition. In this talk, we will show examples of diagnostic works on magnetron sputtering employing metal targets. Diagnostic methods which have fine spatial resolutions are suitable for magnetron sputtering plasmas since they have significant spatial distributions. We are using two-dimensional laser-induced fluorescence spectroscopy, in which the plasma space is illuminated by a tunable laser beam with a planer shape. A charge-coupled device camera with a gated image intensifier is used for taking the picture of the image of laser-induced fluorescence formed on the planer laser beam. The picture of laser-induced fluorescence directly represents the two-dimensional distribution of the atom density probed by the tunable laser beam, when an intense laser with a relatively wide line-width is used. When a weak laser beam with a relatively narrow linewidth is used, the laser-induced fluorescence represents the density distribution of atoms which feel the laser wavelength to be resonant via the Doppler shift corresponding to their velocities. In this case, we can obtain the velocity distribution function of atoms by scanning the wavelength of the laser beam around the line center.

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Optoacoustic Ultrasound Generator Based on Nanostructured Germanium (광음향효과를 이용한 게르마늄 나노구조 기반의 초음파 발생 소자 연구)

  • Yoon, Sang-Hyuk;Heo, Junseok
    • Korean Journal of Optics and Photonics
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    • v.26 no.5
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    • pp.255-260
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    • 2015
  • We have fabricated an optoacoustic ultrasound generator based on nanostructured germanium (Ge). Ge thin films were deposited via e-beam evaporation and then etched using a metal-assisted chemical (MAC) method to form nanostructured Ge films. The measured intensity of ultrasound from the nanostructured Ge covered with PDMS was about 3 times stronger than that of 100-nm-thick chromium (Cr). When the nanostructured Ge was embedded in the PDMS, the intensity of ultrasound became 8.5 times as strong compared to the 100-nm-thick Cr.

Cu CMP Characteristics and Electrochemical plating Effect (Cu 배선 형성을 위한 CMP 특성과 ECP 영향)

  • Kim, Ho-Youn;Hong, Ji-Ho;Moon, Sang-Tae;Han, Jae-Won;Kim, Kee-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.252-255
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    • 2004
  • 반도체는 high integrated, high speed, low power를 위하여 design 뿐만 아니라 재료 측면에서도 많은 변화를 가져오고 있으며, RC delay time을 줄이기 위하여 Al 배선보다 비저항이 낮은 Cu와 low-k material 적용이 그 대표적인 예이다. 그러나, Cu 배선의 경우 dry etching이 어려우므로, 기존의 공정으로는 그 한계를 가지므로 damascene 또는 dual damascene 공정이 소개, 적용되고 있다. Damascene 공정은 절연막에 photo와 RIE 공정을 이용하여 trench를 형성시킨 후 electrochemical plating 공정을 이용하여 trench에 Cu를 filling 시킨다. 이후 CMP 공정을 이용하여 절연막 위의 Cu와 barrier material을 제거함으로서 Cu 배선을 형성하게 된다. Dual damascene 공정은 trench와 via를 동시에 형성시키는 기술로 현재 대부분의 Cu 배선 공정에 적용되고 있다. Cu CMP는 기존의 metal CMP와 마찬가지로 oxidizer를 이용한 Cu film의 화학반응과 연마 입자의 기계가공이 기본 메커니즘이다. Cu CMP에서 backside pressure 영향이 uniformity에 미치는 영향을 살펴보았으며, electrochemical plating 공정에서 발생하는 hump가 CMP 결과에 미치는 영향과 dishing 결과를 통하여 그 영향을 평가하였다.

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Fabrication of sub-micron sized organic field effect transistors

  • Park, Seong-Chan;Heo, Jeong-Hwan;Kim, Gyu-Tae;Ha, Jeong-Suk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.84-84
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    • 2010
  • In this study, we report on the novel lithographic patterning method to fabricate organic-semiconductor devices based on photo and e-beam lithography with well-known silicon technology. The method is applied to fabricate pentacene-based organic field effect transistors. Owing to their solubility, sub-micron sized patterning of P3HT and PEDOT has been well established via micromolding in capillaries (MIMIC) and inkjet printing techniques. Since the thermally deposited pentacene cannot be dissolved in solvents, other approach was done to fabricate pentacene FETs with a very short channel length (~30nm), or in-plane orientation of pentacene molecules by using nanometer-scale periodic groove patterns as an alignment layer for high-performance pentacene devices. Here, we introduce the atomic layer deposition of $Al_2O_3$ film on pentacene as a passivation layer. $Al_2O_3$ passivation layer on OTFTs has some advantages in preventing the penetration of water and oxygen and obtaining the long-term stability of electrical properties. AZ5214 and ma N-2402 were used as a photo and e-beam resist, respectively. A few micrometer sized lithography patterns were transferred by wet and dry etching processes. Finally, we fabricated sub-micron sized pentacene FETs and measured their electrical characteristics.

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Fabrication and Characterization of Direct-Patternable PZT Film Prepared by Photochemical Metal-Organic Deposition (광화학증착법에 의한 직접패턴 PZT 박막의 제조 및 특성)

  • Park, Hyeong-Ho;Park, Hyung-Ho;Kim, Tae-Song;Hill, Ross-H.
    • Korean Journal of Materials Research
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    • v.18 no.2
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    • pp.98-102
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    • 2008
  • The ferroelectric properties of UV irradiated and non-irradiated PZT films prepared via photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through UV exposure of the spin-coated PZT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated PZT films after annealing at $650^{\circ}C$ were 29 and $23\;{\mu}C/cm^2$, respectively. The UV irradiation was found to be effective for the enhancement of the <111> growth orientation and ferroelectric property of PZT film and in the direct patterning in the fabrication of micro-patterned systems without dry etching.

TSV Formation using Pico-second Laser and CDE (피코초 레이저 및 CDE를 이용한 TSV가공기술)

  • Shin, Dong-Sig;Suh, Jeong;Cho, Yong-Kwon;Lee, Nae-Eung
    • Laser Solutions
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    • v.14 no.4
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    • pp.14-20
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    • 2011
  • The advantage of using lasers for through silicon via (TSV) drilling is that they allow higher flexibility during manufacturing because vacuums, lithography, and masks are not required; furthermore, the lasers can be applied to metal and dielectric layers other than silicon. However, conventional nanosecond lasers have disadvantages including that they can cause heat affection around the target area. In contrast, the use of a picosecond laser enables the precise generation of TSVs with a smaller heat affected zone. In this study, a comparison of the thermal and crystallographic defect around laser-drilled holes when using a picosecond laser beam with varing a fluence and repetition rate was conducted. Notably, the higher fluence and repetition rate picosecond laser process increased the experimentally recast layer, surface debris, and dislocation around the hole better than the high fluence and repetition rate. These findings suggest that even the picosecond laser has a heat accumulation effect under high fluence and short pulse interval conditions. To eliminate these defects under the high speed process, the CDE (chemical downstream etching) process was employed and it can prove the possibility to applicate to the TSV industry.

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Electrical Variable Capacitor based on Symmetrical Switch Structure for RF Plasma System (대칭적인 스위치 구조 기반 RF 플라즈마 시스템 적용 전기적 가변 커패시터)

  • Min, Juhwa;Chae, Beomseok;Kim, Hyunbae;Suh, Yongsug
    • The Transactions of the Korean Institute of Power Electronics
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    • v.24 no.3
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    • pp.161-168
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    • 2019
  • This study introduces a new topology to decrease the voltage stress experienced by a 13.56 MHz electrical variable capacitor (EVC) circuit with an asymmetrical switch structure applied to the impedance matching circuit of a radio frequency (RF) plasma system. The method adopts a symmetrical switch structure instead of an asymmetrical one in each of the capacitor's leg in the EVC circuit. The proposed topology successfully reduces voltage stress in the EVC circuit due to the symmetrical charging and discharging mode. This topology can also be applied to the impedance matching circuit of a high-power and high-frequency RF etching system. The target features of the proposed circuit topology are investigated via simulation and experiment. Voltage stress on the switch of the EVC circuit is successfully reduced by more than 40%.

Synthesis and Formation Mechanism of ZnO Nanotubes via an Electrochemical Method (전기화학적 방법에 의한 산화아연 나노튜브의 합성과 형성 기구)

  • Moon, Jin Young;Kim, Hyunghoon;Lee, Ho Seong
    • Korean Journal of Metals and Materials
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    • v.49 no.5
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    • pp.400-405
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    • 2011
  • ZnO nanotube arrays were synthesized by a two-step process: electrodeposition and selective dissolution. In the first step, ZnO nanorod arrays were grown on an Au/Si substrate by using a homemade electrodeposition system. ZnO nanorod arrays were then selectively dissolved in an etching solution composed of 0.125 M NaOH, resulting in hollow ZnO nanotube arrays. It is suggested that the formation mechanism of the ZnO nanotube arrays might be attributed to the preferred surface adsorption of hydroxide ion ($OH^{-1}$) on a positive polar surface followed by selective dissolution of the metastable Zn-terminated ZnO (0001) polar surface caused by the difference in the surface energy per unit area between the ZnO nanorod and nanotube.