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http://dx.doi.org/10.3740/MRSK.2008.18.2.098

Fabrication and Characterization of Direct-Patternable PZT Film Prepared by Photochemical Metal-Organic Deposition  

Park, Hyeong-Ho (School of Advanced Materials Science and Engineering, Yonsei University)
Park, Hyung-Ho (School of Advanced Materials Science and Engineering, Yonsei University)
Kim, Tae-Song (Microsystem Research Center, Korea Institute of Science and Technology)
Hill, Ross-H. (4D Labs and Department of Chemistry, Simon Fraser University)
Publication Information
Korean Journal of Materials Research / v.18, no.2, 2008 , pp. 98-102 More about this Journal
Abstract
The ferroelectric properties of UV irradiated and non-irradiated PZT films prepared via photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through UV exposure of the spin-coated PZT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated PZT films after annealing at $650^{\circ}C$ were 29 and $23\;{\mu}C/cm^2$, respectively. The UV irradiation was found to be effective for the enhancement of the <111> growth orientation and ferroelectric property of PZT film and in the direct patterning in the fabrication of micro-patterned systems without dry etching.
Keywords
PZT; UV-irradiation; photochemical metal-organic deposition; direct-patterning;
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