• Textile Coloration and Finishing
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• v.20 no.1
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• pp.8-15
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• 2008

We presented the modified decal-transfer lithography (DTL) and light stamping lithography (LSL) as new powerful methods to generate patterns of poly(dimethylsiloxane) (PDMS) on the substrate. The microstructures of PDMS fabricated by covalent binding between PDMS and substrate had played as barrier to locally control wettability. The transfer mechanism of PDMS is cohesive mechanical failure (CMF) in DTL method. In the LSL method, the features of patterned PDMS are physically torn and transferred onto a substrate via UV-induced surface reaction that results in bonding between PDMS and substrate. Additionally we have exploited to generate the patterning of rhodamine B and quantum dots (QDs), which was accomplished by hydrophobic interaction between dyes and PDMS micropatterns. The topological analysis of micropatterning of PDMS were performed by atomic force microscopy (AFM), and the patterning of rhodamine B and quantum dots was clearly shown by optical and fluorescence microscope. Furthermore, it could be applied to surface guided flow patterns in microfluidic device because of control of surface wettability. The advantages of these methods are simple process, rapid transfer of PDMS, modulation of surface wettability, and control of various pattern size and shape. It may be applied to the fabrication of chemical sensor, display units, and microfluidic devices.

• Journal of Sensor Science and Technology
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• v.15 no.1
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• pp.53-57
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• 2006

This paper describes a novel processing technique for fabrication of polymer-derived SiCN (silicone carbonitride) microstructures for super-temperature MEMS applications. PDMS (polydimethylsiloxane) mold is fabricated on SU-8 photoresist using standard UV photolithographic process. Liquid precursor is injected into the PDMS mold. Finally, solid polymer structure is cross-linked using HIP (hot isostatic pressure) at $400^{\circ}C$, 205 bar. Optimum pyrolysis and annealing conditions are determined to form a ceramic microstructure capable of withstanding over $1400^{\circ}C$. The fabricated SiCN ceramic microstructure has excellent characteristics, such as shear strength (15.2 N), insulation resistance ($2.163{\times}10^{14}{\Omega}$) and BDV (min. 1.2 kV) under optimum process condition. These fabricated SiCN ceramic microstructures have greater electric and physical characteristics than bulk Si wafer. The fabricated SiCN microstructures would be applied for supertemperature MEMS applications such as heat exchanger and combustion chamber.

• Journal of Sensor Science and Technology
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• v.15 no.6
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• pp.391-396
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• 2006

Free-standing multilayer distributed Bragg reflectors (DBR) porous silicon dielectric mirrors, prepared by electrochemical etching of crystalline silicon using square wave currents are treated with polystyrene to produce flexible, stable composite materials in which the porous silicon matrix is covered with caffeine-impregnated polystyrene. Optically encoded DBR PSi/polystyrene composite films retain the optical reflectivity. Optical characteristics of DBR PSi/polystyrene composite films are stable and robust for 2 hrs in a pH=7 aqueous buffer solution. The appearance of caffeine and change of DBR peak were simultaneously measured by UV-vis spectrometer and Ocean optics 2000 spectrometer, respectively.

• Proceedings of the KIEE Conference
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• 2001.04a
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• pp.209-212
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• 2001

A flame detector responds either to radiant energy visible to the human eye or outside the range of human vision. Such a detector is sensitive to glowing embers, coals, or flames which radiate energy of sufficient intensity and spectral quality to actuate the alarm. An infra-red detectors can respond to the total IR component of the flame alone or in combination with flame flicker in the frequency range of 5 to 30 Hz. A major problem in the use of infrared detectors receiving total IR radiation is the possible interference of solar radiation in the infrared region. When detectors are located in places shielded from the sun, such as vaults, filtering or shielding the unit from the sun's rays is unnecessary. In this study, we proposed method for redue a false alarm with using filtering & sensor technology for distinguish of causes of raise a false alarm and pure flame.

• Journal of the Institute of Electronics Engineers of Korea SC
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• v.48 no.4
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• pp.10-16
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• 2011

A cabinet is an outer frame of a TV, which is usually made of poly-carbonate. Cabinets are apt to be deformed because of applied heat during injection molding process and UV joining process. Severely deformed cabinets cause a falling-off in quality of the final product. Therefore cabinets should be inspected and only the good ones should be delivered to the following process. We implemented an experimental system for shape recognition of a cabinet and proposed several indices to characterize the shape of a cabinet. We also proposed algorithms to eliminate the possible bias present in measured data and to check the goodness of a cabinet. Experimental results show the feasibility of the propose algorithms.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.5
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• pp.379-384
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• 1999

Langmuir-Blodgett(LB) films which have high ordered orientation and ordering structure are fabricated by LB method which deposit the ultra-thin films of organic materials at a molecular level. The electrical characteristics of stearic acid LB ultra-thin films for the horizontal direction were investigated to develop the gas sensor using LB ultra-thin films. The optimal deposition condition to deposit the LB ultra-thin films was obtained from $\pi-A$ isotherms and the deposition status of stearic acid LB ultra-thin films was verified by the measurement of deposition ratio, UV-absorbance, and electrical properties for LB ultra-thin films. The conductivity of stearic acid LB ultra-thin films for horizontal direction was about $10_{-8}[S/cm]$. The activation energy for LB ultra-thin films with respect to variation of temperature was about 1.0[eV], which was correspond to semiconductor material. The response characteristics for organic gas were confirmed by measuring the response time, recovery time, and reproducibility of the LB ultra-thin to each organic gas. Also, the penetration and adsorption behavior of gas molecule were confirmed through the organic gas response characteristics of LB ultra-thin films with respect to temperature.

• Journal of the Korean Magnetic Resonance Society
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• v.10 no.2
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• pp.141-154
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• 2006

A solid-state reaction of $V_2O_5$ with AlMCM-41 followed by calcinations generated $V^{5+}$ species in the mesoporous materials. Dehydration results in the formation of a vanadyl species, $VO^{2+}$, that can be characterized by electron spin resonance (ESR). The chemical environment of the vanadium centers in V-AlMCM-41 was investigated by XRD, EDX, diffuse reflectance UV-VIS, ESR, $^{29}Si,\;^{27}Al,\;and\;^{51}V$ NMR. It was found that the vanadium species on the wall surface and inside the wall of the hexagonal tubular wall of the V-AlMCM-41 were completely oxidized to tetrahedral $V^{5+}$ and transformed to square pyramidal by additional coordination to water molecules upon hydration. The oxidized $V^{5+}$ species on the wall surfaces and inside the wall were also reversibly reduced to $VO^{2+}$ species or lower valences by thermal process.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.22 no.6
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• pp.148-155
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• 2008

This study presents a process control of the wafer edge exposure (WEE) used in 300[mm] wafer environment. WEE, as a key module of the overall track system (coater and developer) for making patterns on wafer, is a system to expose the UV-ray on the wafer to remove a photo resist around edge of the wafer. It can measure, memorize and control the distance and angles from wafer center to edge. Recently in the 300[mm] semiconductor fabrication, the track system strongly requires that WEE station has a controller with high throughput and accuracy to increase process efficiency. We have designed and developed the controller, and present here a WEE control algorithm and experimental results.

• Journal of the Korean Applied Science and Technology
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• v.14 no.3
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• pp.89-95
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• 1997

It is well known that the metallo-phthalocyanine(MPcs) are sensitive to toxic gaseous molecules such as $NO_2$ and also chemically and thermally stable. Therefore, lots of MPcs have been studied for the potential chemical sensor for $NO_2$ gas using quartz crystal microbalance or electrical conductivity. In this study, 2,3,9,10,16,17,23,24-[octa-(dodecyloxy)] copper phthalocyanine and 2,3,9,10,16,17,23,24-[octa-(octyloxy)] copper phthalocyanine were synthesized and their possibility of LB film preparation were tested. It was confirmed by using FT-IR, DSC, NMR, UV-Vis absorption spectroscopy and Elemental Analysis that CuPc derivatives were successfully synthesized. From the ${\pi}$-A characteristics and limiting areas of two CuPc derivatives it was found that the preparation of LB films with these CuPc derivatives is possible.

• Journal of Sensor Science and Technology
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• v.28 no.4
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• pp.251-255
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• 2019

We propose a two-step lithography process to minimize edge-bead issues caused by thick photoresist (PR) coating. In the conventional PR process, the edge bead can be efficiently removed by applying an edge-bead removal (EBR) process while rotating the silicon wafer at a high speed. However, applying conventional EBR to the production of desired PR mold with unique negative patterns cannot be used because a lower rpm of spin coating and a lower temperature in the soft bake process are required. To overcome this problem, a two-step lithography process was developed in this study and applied to the fabrication of a polydimethylsiloxane (PDMS) film having super-hydrophobic characteristics. Following UV exposure with a first photomask, the exposed part of the silicon wafer was selectively removed by applying a PR developer while rotating at a low rpm. Then, unique PR mold structures were prepared by employing an additional under-exposure process with a second mask, and the mold patterns were transferred to the PDMS. Results showed that the fabricated PDMS film based on the two-step lithography process reduced the height difference from 23% to 5%. In addition, the water contact angle was greatly improved by spraying of hydrophobic nanosilica on the dual-scaled PDMS surface.