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http://dx.doi.org/10.5764/TCF.2008.20.1.008

Rapid Topological Patterning of Poly(dimethylsiloxane) Microstructure  

Kim, Bo-Yeol (Department of Chemical Engineering, Chungnam National University)
Song, Hwan-Moon (Department of Chemical Engineering, Chungnam National University)
Son, Young-A (Department of Textile Engineering, Chungnam National University)
Lee, Chang-Soo (Department of Chemical Engineering, Chungnam National University)
Publication Information
Textile Coloration and Finishing / v.20, no.1, 2008 , pp. 8-15 More about this Journal
Abstract
We presented the modified decal-transfer lithography (DTL) and light stamping lithography (LSL) as new powerful methods to generate patterns of poly(dimethylsiloxane) (PDMS) on the substrate. The microstructures of PDMS fabricated by covalent binding between PDMS and substrate had played as barrier to locally control wettability. The transfer mechanism of PDMS is cohesive mechanical failure (CMF) in DTL method. In the LSL method, the features of patterned PDMS are physically torn and transferred onto a substrate via UV-induced surface reaction that results in bonding between PDMS and substrate. Additionally we have exploited to generate the patterning of rhodamine B and quantum dots (QDs), which was accomplished by hydrophobic interaction between dyes and PDMS micropatterns. The topological analysis of micropatterning of PDMS were performed by atomic force microscopy (AFM), and the patterning of rhodamine B and quantum dots was clearly shown by optical and fluorescence microscope. Furthermore, it could be applied to surface guided flow patterns in microfluidic device because of control of surface wettability. The advantages of these methods are simple process, rapid transfer of PDMS, modulation of surface wettability, and control of various pattern size and shape. It may be applied to the fabrication of chemical sensor, display units, and microfluidic devices.
Keywords
patterning; PDMS; wettability; quantum dots; microfluid;
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