• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.30-30
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• 2008

Lead-free piezoelectric ceramics 0.97$(Na_{0.5}K_{0.5})NbO_3$-0.03Ba$(Ti_{1-x}Sn_x)O_3$ [NKN-BTS-x] ceramics doped with 1 mol% $MnO_2$ have been fabricated by a sintering technique with muffling. The $MnO_2$-doped NKN-BTS-x ceramics with x$\leq$0.2 have pure orthorhombic perovskite structure at room temperature. The dense microstructure was developed with grain growth as an increase of amount of Sn. Moreover, the addition of Sn was found to have a significant influence on piezoelectric properties. In particular, the $MnO_2$-doped NKN-BTS-0.1 ceramics showed improved piezoelectric properties of piezoelectric constant ($d_{33}$=145pC/N), relatively large electromechanical coupling factor ($k_p$=43%), dielectic constant (${\varepsilon}^T_{33}/{\varepsilon}_0$=676) dielectric loss (tan$\delta$=1.3%).

• Korean Journal of Materials Research
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• v.13 no.11
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• pp.737-741
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• 2003

Polycrystalline $Ti_{l-x}$ $Co_{x}$ $O_2$thin films on $SiO_2$ (200 nm)/Si (100) substrates were prepared using liquid-delivery metalorganic chemical vapor deposition. Microstructures and ferromagnetic properties were investigated as a function of doped Co concentration. Ferromagnetic behaviors of polycrystalline films were observed at room temperature, and the magnetic and structural properties strongly depended on the Co distribution, which varied widely with doped Co concentration. The annealed $Ti_{l-x}$ $Co_{x}$ $O_2$thin films with $x\leq$0.05 showed a homogeneous structure without any clusters, and pure ferromagnetic properties of thin films are only attributed to the X$l-x_{l-x}$ $Co_{x}$X$O_2$phases. On the other hand, in case of thin films above x = 0.05, Co-rich clusters formed in a homogeneous $Ti_{l-x}$ $Co_{x}$ $O_2$phase, and the overall ferromagnetic (FM) properties depended on both FMTCO and FMCo. Co-rich clusters with about 10-150 nm size decreased the value of Mr (the remanent magnetization) and increased the saturation magnetic field.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.342.1-342.1
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• 2014

The electrical, optical and structural properties of Ti doped $In_2O_3$ (TIO) ohmic contacts to p-type GaN were investigated using linear facing target sputtering (LFTS) system. Sheet resistance and resistivity of TIO films are decreased with increasing rapid thermal annealing (RTA) temperature. Although the $400^{\circ}C$ and $500^{\circ}C$ annealed samples showed rectifying behavior, the $600^{\circ}C$ and $700^{\circ}C$ annealed samples showed linear I-V characteristics indicative of the formation of an ohmic contact between TIO and p-GaN. The annealing of the contact at $700^{\circ}C$ resulted in the lowest specific contact resistivity of $9.5{\times}10^{-4}{\Omega}cm^2$. Based on XPS depth profiling and synchrotron X-ray scattering analysis, we suggested a possible mechanism to explain the annealing dependence of the properties of TIO layer on rapid thermal annealing temperature.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.04a
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• pp.61-62
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• 2006

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.04a
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• pp.64-65
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• 2006

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2005.11a
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• pp.52-52
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• 2005

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2005.11a
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• pp.54-55
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• 2005

• JSTS:Journal of Semiconductor Technology and Science
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• v.1 no.4
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• pp.202-208
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• 2001

In Recent results suggested that doping $Ta_2O_5$ with a small amount of $TiO_2$ using standard ceramic processing techniques can increase the dielectric constant of $Ta_2O_5$ significantly. In this paper, this concept is studied using RTCVD (Rapid Thermal Chemical Vapor Deposition). Ti-doped $Ta_2O_5$ films are deposited using $TaC_{12}H_{30}O_5N$, $C_8H_{24}N_4Ti$, and $O_2$ on both Si and $NH_3$-nitrided Si substrates. An $NH_3$-based interface layer at the Si surface is used to prevent interfacial oxidation during the CVD process and post deposition annealing is performed in $H_2/O_2$ ambient to improve film quality and reduce leakage current. A sputtered TiN layer is used as a diffusion barrier between the Al gate electrode and the $TaTi_xO_y$ dielectric. XPS analyses confirm the formation of a ($Ta_2O_5)_{1-x}(TiO_2)_x$ composite oxide. A high quality $TaTi_xO_y$ gate stack with EOT (Equivalent Oxide Thickness) of $7{\AA}$ and leakage current $Jg=O.5A/textrm{cm}^2$ @ Vg=-1.0V has been achieved. We have also succeeded in forming a $TaTi_x/O_y$ composite oxide by rapid thermal oxidation of the as-deposited CVD TaTi films. The electrical properties and Jg-EOT characteristics of these composite oxides are remarkably similar to that of RTCVD $Ta_2O_5, suggesting that the dielectric constant of $Ta_2O_5$ is not affected by the addition of $TiO_2$.

• Journal of Environmental Science International
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• v.13 no.6
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• pp.537-542
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• 2004

$V_{2}O_{5}/TiO_{2}$ catalysts promoted with Mn were prepared and tested for selective catalytic reduction of NOx in $NH_3.$ The effects of promoter content, degree of catalyst loading were investigated for NOx activity while changing temperatures, mole ratio, space velocity and $O_2$ concentration. Among the various $V-{2}O_{5}$ catalysts having different metal loadings, $V-{2}O_{5}$(1 wt.%) catalyst showed the highest activity(98%) under wide temperature range of $200-250^{\circ}C.$ When the $V-{2}O_{5}$ catalyst was further modified with 5 wt.% Mn as a promoter, the highest activity(90-47%) was obtained over the low temperature windows of $100-200^{\circ}C.$ From Mn-$V_{2}O_{5}/TiO_{2}$, it was found that by addition of 5 wt.% Mn on $V_{2}O_{5}/TiO_{2}$ catalyst, reduction activity of catalyst was improved, which resulted in the increase of catalytic activity and NOx reduction. According to the results, NOx removal decreased for 10%, but the reaction temperature down to $100^{\circ}C.$

• Proceedings of the Korean Society of Soil and Groundwater Environment Conference
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• 2005.04a
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• pp.163-166
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• 2005

[ $TiO_2$ ] 광촉매에 의한 분해 반응의 활성을 높이기 위한 다양한 연구가 진행되었다. 광촉매 반응은 1차 반응을 따랐으며 초기농도가 높을수록 분해효율이 감소하는 경향을 보였다. 본 연구에서는 산화제로 과산화수소가 주입되었을 경우 분해효율을 조사하였으며, 과산화수소를 주입하였을 경우가 그렇지 않은 경우보다 더 높은 분해효율을 보였다. 또한 과산화수소 주입량을 달리했을 때, 주입량이 증가할수록 효율이 높아지다가 일정량 이상에서는 오히려 효율이 감소하는 것으로 나타났다. 따라서 과산화수소 최적첨가량이 존재함을 알 수 있었다. 한편 $TiO_2$에 전이금속을 첨가하여 전이금속이 $TiO_2$ 촉매의 분해효율에 미치는 영향을 알아보았다. Pt(0.5%)-$TiO_2$가 가장 높은 분해효을을 보였으며, Pt첨가함량이 더 큰 Pt(2%)-$TiO_2$는 함량이 증가했음에도 불구하고 큰 차이는 아니지만 오히려 효율이 감소하였다. 따라서 촉매표면에서 전자와 정공이 생성되었을 때, Pt가 전자를 포획함으로써 전자와 정공의 재결합율을 감소시켜 OH라디칼을 생성할 수 있는 정공이 많아져 반응효율을 증가되는 것을 알 수 있었고, 금속에 따른 최적 첨가함량이 존재함을 알 수 있다. 반면에 Pd를 첨가했을 경우는 첨가 함량에 관계없이 모두 분해효율이 오히려 감소하는 경향을 나타냈으며 이는 전이금속 고유의 성질이나, 또는 대상물질에 따라 각기 다른 경향이 존재함을 나타내며 추가적인 연구가 필요하다고 사료된다.