• Title/Summary/Keyword: Thin layer

Search Result 5,287, Processing Time 0.03 seconds

Optimization of active layer for the fabrication of transparent thin film transistor based on ZnO (ZnO 기반의 투명 박막 트랜지스터 제작을 위한 Active-layer의 최적화에 대한 연구)

  • Chang, Seong-Pil;Lee, Sang-Gyu;Son, Chang-Wan;Leem, Jae-Hyeon;Song, Yong-Won;Ju, Byung-Kwon;Lee, Sang-Yeol
    • Proceedings of the KIEE Conference
    • /
    • 2007.11a
    • /
    • pp.94-95
    • /
    • 2007
  • We have observed electrical properties of ZnO thin films for the fabrication of transparent thin film transistor. ZnO thin films were deposited on $Al_2O_3$(0001) substrate at various temperatures by pulsed laser deposition(PLD). The third of harmonic(355nm) Nd:YAG laser was used for pulsed laser deposition. X-ray diffraction(XRD), field emission-scanning electron microscope(FE-SEM), and photoluminescence were used to characterize physical and optical properties of ZnO thin film.. The results indicated the ZnO film showed good optical properties as increasing temperatures, with low FWHM of exciton-related peak and XRD(0002) peak.

  • PDF

Thin Film Passivation of Organic Light Emitting Diodes by Catalyzer Enhanced Chemical Vapor Deposition (CECVD) (촉매반응 화학기상증착법을 이용한 유기발광소자의 박막 봉지)

  • Kim, Han-Ki;Moon, J.M.;Bae, J.H.;Jeong, S.W.;Kim, M.S.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2006.06a
    • /
    • pp.71-72
    • /
    • 2006
  • We report on plasma damage free chemical vapor deposition technique for the thin film passivation of organic light emitting diodes (OLEDs), organic thin film transistor (OTFT) and flexible displays using catalyzer enhanced chemical vapor deposition (CECVD). Specially designed CECVD system has a ladder-shaped tungsten catalyzer and movable electrostatic chuck for low temperature deposition process. The top emitting OLED with thin film $SiN_x$ passivation layer shows electrical and optical characteristics comparable to those of the OLED with glass encapsulation. This indicates that the CECVD technique is a promising candidate to grow high-quality thin film passivation layer on OLED, OTFT, and flexible displays.

  • PDF

Patterning of poly(3,4-ethylenedioxythiophene)(PEDOT) Thin Films by Using Self-assembled Monolayers(SAMs) Patterns Formed by Ultra-violet(UV) Lithography (UV를 사용한 SAMs 패터닝과 PEDOT의 선택적 증착에 관한 연구)

  • Kwon, T.W.;Lee, J.;Lee, J.G.
    • Korean Journal of Materials Research
    • /
    • v.16 no.10
    • /
    • pp.619-623
    • /
    • 2006
  • Selective vapor deposition of conductive poly(3,4-ethylenedioxythiophene) (PEDOT), thin films has been carried out on self assembled monolayers patterned oxide substrate. Since the 3,4-ethylenedioxythiophene(EDOT) monomer can be polymerized only in the presence of oxidant such as $FeCl_3$, the PEDOT thin film is selectively deposited on patterned $FeCl_3$, which only adsorbs on the partly removed SAMs region due to the inability of $FeCl_3$ to adsorb on SAMs. Therefore, the partly removed SAMs can act as an adsorption layer for the $FeCl_3$ and also as a glue layer for the deposition of PEDOT, resulting in the significantly increased adhesion of PEDOT to $SiO_2$ substrate. The use of UV lithography and Cr patterned quartz mask provided the formation of SAMs patterns on oxide substrates, which allowed for the selective deposition of conductive PEDOT thin films.$^{oo}The$ new process was successfully developed for the selective deposition of PEDOT thin films on SAMs patterned oxide substrate, providing a new way for the patterning of vapor phase deposition of PEDOT thin films with accurate alignment and addressing the inherent adhesion issues between PEDOT and dielectrics.

Characterization of Al-Doped ZnO Thin Film Grown on Buffer Layer with RF Magnetron Sputtering Method (버퍼 층을 이용한 RF 마그네트론 스퍼터 방법에 의한 Al:ZnO 박막의 성장)

  • No, Young-Soo;Park, Dong-Hee;Kim, Tae-Whan;Choi, Ji-Won;Choi, Won-Kook
    • Journal of the Korean Vacuum Society
    • /
    • v.18 no.3
    • /
    • pp.213-220
    • /
    • 2009
  • The optimal condition of low temperature deposition of transparent conductive Al-doped zinc oxide (AZO) films is studied by RF magnetron sputtering method. To achieve enhanced-electrical property and good crystallites quality, we tried to deposit on glass using a two-step growth process. This process was to deposit AZO buffer layer with optimal growth condition on glass in-situ state. The AZO film grown at rf 120 W on buffer layer prepared at RF $50{\sim}60\;W$ shows the electrical resistivity $3.9{\times}10^{-4}{\Omega}cm$, Carrier concentration $1.22{\times}10^{21}/cm^3$, and mobility $9.9\;cm^2/Vs$ in these results, The crystallinity of AZO film on buffer layer was similar to that of AZO film on glass with no buffer later but the electrical properties of the AZO film were 30% improved than that of the AZO film with no buffer layer. Therefore, the cause of enhanced electrical properties was explained to be dependent on degree of crystallization and on buffer layer's compressive stress by variation of $Ar^+$ ion impinging energy.

Thin Layer Drying Model of Sorghum

  • Kim, Hong-Sik;Kim, Oui-Woung;Kim, Hoon;Lee, Hyo-Jai;Han, Jae-Woong
    • Journal of Biosystems Engineering
    • /
    • v.41 no.4
    • /
    • pp.357-364
    • /
    • 2016
  • Purpose: This study was performed to define the drying characteristics of sorghum by developing thin layer drying equations and evaluating various grain drying equations. Thin layer drying equations lay the foundation characteristics to establish the thick layer drying equations, which can be adopted to determine the design conditions for an agricultural dryer. Methods: The drying rate of sorghum was measured under three levels of drying temperature ($40^{\circ}C$, $50^{\circ}C$, and $60^{\circ}C$) and relative humidity (30%, 40%, and 50%) to analyze the drying process and investigate the drying conditions. The drying experiment was performed until the weight of sorghum became constant. The experimental constants of four thin layer drying models were determined by developing a non-linear regression model along with the drying experiment results. Result: The half response time (moisture ratio = 0.5) of drying, which is an index of the drying rate, was increased as the drying temperature was high and relative humidity was low. When the drying temperature was $40^{\circ}C$ at a relative humidity (RH) of 50%, the maximum half response time of drying was 2.8 h. Contrastingly, the maximum half response time of drying was 1.2 h when the drying temperature was $60^{\circ}C$ at 30% RH. The coefficient of determination for the Lewis model, simplified diffusion model, Page model, and Thompson model was respectively 0.9976, 0.9977, 0.9340, and 0.9783. The Lewis model and the simplified diffusion model satisfied the drying conditions by showing the average coefficient of determination of the experimental constants and predicted values of the model as 0.9976 and Root Mean Square Error (RMSE) of 0.0236. Conclusion: The simplified diffusion model was the most suitable for every drying condition of drying temperature and relative humidity, and the model for the thin layer drying is expected to be useful to develop the thick layer drying model.

Effect of MWCNTs/PSf support layer on the performance of polyamide reverse osmosis membrane (탄소나노튜브가 첨가된 폴리술폰 지지체가 폴리아미드 역삼투막의 성능에 미치는 영향)

  • Min, Choong-Sik;Kim, Seung-Hyun
    • Journal of Korean Society of Water and Wastewater
    • /
    • v.34 no.2
    • /
    • pp.127-137
    • /
    • 2020
  • In this study, a MWCNT(multi-wall carbon nanotube) was added to polysulfone(PSf) support layer to improve flux of TFC(thin film composite) RO(reverse osmosis) membrane. Two different kinds of MWCNT were used. Surfaces of some MWCNTs were modified hydrophilically through acid treatment, while those of other MWCNTs were modified through heat treatment to maintain their hydrophobicity. MWCNT/PSf support layer was prepared by adding PSf to the NMP mixed solvent containing 0.1 wt% MWCNTs using a phase inversion method. The surface porosity of the MWCNT/PSf support increased by 42~46% while its surface pore size being maintained. The TFC RO membrane made of MWCNT/PSf support layer showed a 20% flux increase while its salt rejection characteristics is sustained. In addition, the MWCNT/PSf support layer has better mechanical stability than the PSf support layer, there resulting in an increased resistance of flux reduction due to physical pressure.

The Effect of Diffusion Barrier and thin Film Deposition Temperature on Change of Carbon Nanotubes Length (탄소나노튜브 길이 변화에 대한 확산방지층과 박막 증착 온도의 영향)

  • Hong, Soon-kyu;Lee, Hyung Woo
    • Journal of Powder Materials
    • /
    • v.24 no.3
    • /
    • pp.248-253
    • /
    • 2017
  • In this study, we investigate the effect of the diffusion barrier and substrate temperature on the length of carbon nanotubes. For synthesizing vertically aligned carbon nanotubes, thermal chemical vapor deposition is used and a substrate with a catalytic layer and a buffer layer is prepared using an e-beam evaporator. The length of the carbon nanotubes synthesized on the catalytic layer/diffusion barrier on the silicon substrate is longer than that without a diffusion barrier because the diffusion barrier prevents generation of silicon carbide from the diffusion of carbon atoms into the silicon substrate. The deposition temperature of the catalyst and alumina are varied from room temperature to $150^{\circ}C$, $200^{\circ}C$, and $250^{\circ}C$. On increasing the substrate temperature on depositing the buffer layer on the silicon substrate, shorter carbon nanotubes are obtained owing to the increased bonding force between the buffer layer and silicon substrate. The reason why different lengths of carbon nanotubes are obtained is that the higher bonding force between the buffer layer and the substrate layer prevents uniformity of catalytic islands for synthesizing carbon nanotubes.

Resistance Distribution in Thin Film Type SFCL Elements with Shunt Layers of Different Thicknes

  • Kim, Hye-Rim;Hyun, Ok-Bae;Lee, Seung-Yup;Yu, Kwon-Kyu;Kim, In-Seon
    • Progress in Superconductivity and Cryogenics
    • /
    • v.5 no.2
    • /
    • pp.41-45
    • /
    • 2003
  • Resistance distribution in thin film type SFCL elements of different shunt layer thickness was investigated. The 300 nm thick film of 2 inch diameter was coated with a gold layer and patterned into 2 mm wide meander lines. The shunt layer thickness was varied by ion milling the shunt layer with Ar ions, and also by having the shunt layer grown in different thickness. The SFCL element was subjected to simulated AC fault current for measurements. It was immersed in liquid nitrogenduring the experiment. The resistance distribution was not affected by the shunt layer thickness at applied voltages that brought the temperature of the elements to similar values. This result could be explained with the concept of heat transfer from the film to the surroundings. The resistance distribution was independent of the shunt layer thickness because thick sapphire substrates of high thermal conductivity dominated the thermal conductance of the elements.

Effect of $Al_2O_3$ capping layer on properties of MgO protection layer for plasma display panel

  • Eun, Jae-Hwan;Lee, Jung-Heon;Kim, Soo-Gil;Kim, Hyeong-Joon
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2002.08a
    • /
    • pp.628-631
    • /
    • 2002
  • $Al_2O_3$ capping layer and MgO protective layer were deposited by electron beam evaporation method using single crystal source. Thickness of the capping layer, $Al_2O_3$, was varied from 5 nm to 10 nm. Surface morphology was observed by SEM and AFM before and after hydration. And microstructure of deposited $Al_2O_3$ layer and chemical shift of electron binding energy were also observed by high resolution TEM and XPS, respectively, after hydration. From these results, it was found that Mg atoms diffused into $Al_2O_3$ layer, reacted with moisture and formed $Mg(OH)_2$ during hydration. As thickness of $Al_2O_3$ increased, extent of hydration increased. $Al_2O_3$ capped MgO thin films and uncapped MgO thin films were deposited on AC-PDP test panel to characterize discharge properties. Although $Al_2O_3$ has poor discharge properties rather than MgO, because of many hydrated species on the surface of MgO, similar discharge properties were observed.

  • PDF

Limit-current type zirconia oxygen sensor with porous diffusion layer (다공성 확산층을 이용한 한계전류형 지르코니아 산소센서)

  • Oh, Young-Jei;Lee, Chil-Hyoung
    • Journal of Sensor Science and Technology
    • /
    • v.17 no.5
    • /
    • pp.329-337
    • /
    • 2008
  • Simple, small and portable oxygen sensors were fabricated by tape casting technique. Yttria stabilized zirconia containing cordierite ceramics (YSZC) were used as a porous diffused layer of oxygen in pumping cell. Yttria stabilized zirconia (YSZ) solid electrolyte, YSZC porous diffusion layer and heater-patterned ceramic sheets were prepared by co- firing method. Limit current characteristics and the linear relationship of current to oxygen concentration were observed. Viscosity variation of the slurries both YSZ and YSZC showed a similar behavior, but micro pores in the fired sheet were increased with increasing of the cordierite amount. Molecular diffusion was dominated due to the formation of large pores in porous diffusion layer. The plateau range of limit current in porous-type oxygen sensor was narrow than the one of aperture-type oxygen sensor. However limit current curve was appeared in porous-type oxygen sensor even at the lower applied voltage. The plateau range of limit-current was widen as increasing the thickness of porous diffusion layer of the YSZ containing cordierite. Measuring temperature of $600{\sim}650^{\circ}C$ was recommended for limit-current oxygen sensor. Porous diffusion layer-type oxygen sensor showed faster response than the aperture-type one and was stable up to 30 days running without any crack at interface between the layers.