• 공업화학
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• 제26권3호
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• pp.362-365
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• 2015

본 연구에서는 polyoxyethylenenonylphenylether (NP5) 계면활성제와 sodium bis(2-ethylhexyl) sulfosuccinate (AOT) 계면활성제가 형성하는 두 종류의 W/O 마이크로에멀젼을 이용해서 실리카에 담지된 ZnSe 양자점을 제조하였다. 본 방법으로 3 nm 크기의 cubic zinc blende 결정 구조를 갖는 ZnSe 입자를 합성하였으며 약 20 nm 크기의 실리카 입자에 효과적으로 담지 시킬 수 있었다. 합성된 입자의 photoluminescence (PL) 주변 온도 의존성을 $30^{\circ}C$에서 $60^{\circ}C$ 범위에서 확인한 결과, 온도가 증가함에 따라 PL intensity가 감소하였으며 PL intensity와 온도와는 높은 상관관계를 나타내었다. 아울러 PL intensity와 온도의 상관관계는 온도를 낮은 곳에서 올려가며 측정한 경우와 반대로 낮추며 측정한 경우 같은 상관도를 나타내어 온도 의존성이 가역적임을 알 수 있었다. 그 결과 실리카에 담지된 ZnSe 양자점이 온도 센서로 사용될 수 있는 잠재적인 매체임을 확인하였다.

• 한국진공학회지
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• 제8권4A호
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• pp.450-455
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• 1999

We present Photoluminescence (PL) and Atomic Force Microscopy (AFM) image on InAs quantum dots (QDs) having different size which grown by Molecualr Beam Epitaxy (MBE). For different size QDs, analysis of the AFM profiles show that the density of QDs was the maximum value $(1.1\times10^{11}\textrm{/cm}^2)$ at 2.0 ML. In the spectra of QDs, it is found that the peak energy decreases with increasing dot size due to the effect of quantum confinement. Temperature dependence of PL intensities show that the PL is quenching and Red shift as the temperature increase. The FWHM range of 20K~180K is narrowing with increasing temperature. When temperature is over 180K, the line-width starts to in creases with increasing temperature. At last, temperature dependence of the integrated intensities were fit using the Arrehenius-type function for the activation energy. Fit value of the activation energy was increased with increasing QDs-size.

• Applied Science and Convergence Technology
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• 제27권5호
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• pp.109-112
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• 2018

Optical properties of InAs/GaAs submonolayer-quantum dot (SML-QD) have been investigated using excitation intensity ($I_{ex}$)- and temperature-dependent photoluminescence (PL). At a low temperature (13 K) strong PL was observed at 1.420 eV with a very narrow full-width at half maximum, of 7.09 meV. The results of the $I_{ex}$ dependence show that the PL intensities increase with increasing $I_{ex}$. The enhancement factors (k) of PL increment as a function of $I_{ex}$ are 3.3 and 1.22 at low and high $I_{ex}$ regime, respectively. The high k value at low $I_{ex}$, implies that the activation energy of the SML-QDs is low. The calculated activation energy of the SML-QDs from temperature dependence is 30 meV.

• 한국진공학회지
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• 제10권2호
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• pp.247-251
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• 2001

실리콘산화막에 $Si^+$이온을 주입하여 열처리를 한 후 상온에서 8K까지 온도를 변화시키며 PL을 측정하였다. 상온에서 50~80K까지는 PL intensity가 전체적으로 증가하였으며 50K 이하에서는 감소하였다. PL intensity가 증가하는 동안 peaks는 blue-shift가 일어났다. PL spectrum에서 peak를 보이는 파장에서 PL의 온도의존성을 측정하였다. 첫 번째 peak가 온도변화에 가장 민감하며 크기가 작은 peak일수록 온도의 영향을 적게 받는다. PL peak의 온도의존성을 분석하였다. 상온에서 50K 범위에서 PL intensity 대 1000/T그림에서 온도역수의 3차 함수로 fitting할 수 있었다. 온도가 내려갈수록 PL intensity가 증가하는 것을 nanocrystal 보다도 O위주 결함(Si-O-O)이나 Si위주 결함(Si-Si-O)들의 quantum size effect로 설명할 수 있었다.

• 한국결정성장학회지
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• 제9권2호
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• pp.141-148
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• 1999

Ir 도가니에서 PbO와 $WO_{3}$를 50 %~50 % 혼합한 시료로 부터 쵸코랄스키 성장방법에 의해 고품질의 순수한 $PbWO_{4}$와 Nb 도핑한 $PbWO_{4}$를 성장 시켰다. 결정은 성분의 선택적 결손에 부합하는 화학양론적 변화는 $PbWO_{4}$의 노란색 형성에 원인이 되었다. X선 회절 실험을 통해서 각 $PbWO_{4}$ 결정의 격자상수 변화를 조사하였으며 광발광, 광흡수 및 라만 스펙트럼에 대한 특성들에 대해 조사를 하였다. 광발광은 10 K~300 K 온도 영역에서 측정 되었으며 낮은 온도 영역에서는 미흡한 온도의존성을 보였으며 200 K 온도 이상에서는 열적소광에 의한 광발광 강도의 감소를 보였다. PL 강도와 반치폭의 온도 의존성으로 부터 각 PWO 시료에 대한 활성화 에너지, Huang-Rhys 결합상수, 비균질선폭계수를 구하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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• pp.102-102
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• 1999

Visible photoluminescence(PL) in si-implanted SiO2 films on crystaline silicon were observed. Thermal oxide films of 1 ${\mu}{\textrm}{m}$ thickness on P-type crystal silicon were made and si+ ions were implanted with 200keV acceleration voltage on ti. Argon laser (wavelength 488nm) and PM tube were used for PL measurements. As annealing time increased at low temperature, the visible PL intensity are increased and the peak positions are changed. On the other hand, with increasing annealing time at high temperature, the visible PL intensity are disappeared. From the PL peaks and intensity changes, XRD results, and TEM observations, we will discuss the origin of PL in Si+-implanted SiO2 films with oxygen righ defects and silicon rich defects.

• Transactions on Electrical and Electronic Materials
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• 제1권3호
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• pp.6-9
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• 2000

Selectively excited photoluminescence(PL) spectroscopy has been carried out on the ~1540 nm $^{4}$I$_{13}$ 3/ to $^{4}$I/wub 15/2/ emissions of the multiple Er$^{3+}$ centers observed in Er-implante undoped and Mg-doped GAN at temperatures ranging from 6K to 295K. The temperature dependence of the Er$^{3+}$ PL spectra selectively excited by below -gap light demonstrates different quenching rates for the distinct Er$^{3+}$ centers, and indicates that the PL spectra with the most rapid thermal quenching rats do not contribute to the room temperature, above-p-pumped Er$^{3+}$ spectrum. In addition, selective PL spectroscopy has ben carried out on the Er$^{3+}$ emission in Er-implanted undoped and Mg-doped GaN at temperatures ranging 6K to 295K. The results indicate that the previously reported enhancement of the violet-pumped centers contribution to the low temperature above excited Er$^{3+}$ PL in Mg-doped GaN is also evident at room temperature.temperature.

• 한국재료학회지
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• 제16권3호
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• pp.183-187
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• 2006

We present the effects of rapid thermal annealing (RTA) temperature on the structural and optical properties of self-assembled InAs quantum dot (QD) structures grown on GaAs substrates by molecular beam epitaxy (MBE). The photoluminescence (PL) measurements are performed in a closed-cycle refrigerator as a function of temperature for the unannealed and annealed samples. RTA at higher temperature results in the increase in island size, the corresponding decrease in the density of islands, and the redshift in the PL emission from the islands. The temperature dependence of the PL peak energy for the InAs QDs is well expressed by the Varshni equation. The thermal quenching activation energies for the samples unannealed and annealed at $600^{\circ}C$ are found to be $25{\pm}5meV$ and $47{\pm}5$ meV, respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.151-152
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• 2005

ZnO films were deposited on MgO substrates (ZnO/MgO) by ultrasonic spray pyrolysis. Substrate temperature varied from $250^{\circ}C$ to $350^{\circ}C$. The crystallographic properties and surface morphologies of the ZnO/MgO films were studied by X ray diffraction and scanning electron microscopy. The properties of photoluminescence (PL) for the films were investigated by dependence of PL spectra on the substrate temperature and the annealing temperature. The ZnO/MgO films prepared at $350^{\circ}C$ showed the strongest UV emission peak at 18 K and 300 K among the films in this study.

• Transactions on Electrical and Electronic Materials
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• 제11권4호
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• pp.170-173
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• 2010

Nanocrystalline cadmium sulfide (CdS) thin films were prepared using chemical bath deposition in a solution bath containing $CdSO_4$, $SC(NH_2)_2$, and $NH_4OH$. The CdS thin films were investigated using X-ray diffraction (XRD), photoluminescence (PL), and Fourier transform infrared spectroscopy (FTIR). The as-deposited CdS thin film prepared at $80^{\circ}C$ for 60 min had a cubic phase with homogeneous and small grains. In the PL spectrum of the 2,900 A-thick CdS thin film, the broad red band around 1.7 eV and the broad high-energy band around 2.7 eV are attributed to the S vacancy and the band-to-band transition, respectively. As the deposition time increases to over 90 min, the PL intensity from the band-to-band transition significantly increases. The temperature dependence of the PL intensity for the CdS thin films was studied from 16 to 300 K. The $E_A$ and $E_B$ activation energies are obtained by fitting the temperature dependence of the PL intensity. The $E_A$ and $E_B$ are caused by the deep trap and shallow surface traps, respectively. From the FTIR analysis of the CdS thin films, a broad absorption band of the OH stretching vibration in the range $3,000-3,600\;cm^{-1}$ and the peak of the CN stretching vibration at $2,000\;cm^{-1}$ were found.